In this report, the effect of temperature on the In As/Al Sb heterojunction and high-electron-mobility transistors（HEMTs） with a gate length of 2 μm are discussed comprehensively. The results indicate that device p...In this report, the effect of temperature on the In As/Al Sb heterojunction and high-electron-mobility transistors（HEMTs） with a gate length of 2 μm are discussed comprehensively. The results indicate that device performance is greatly improved at cryogenic temperatures. It is also observed that the device performance at 90 K is significantly improved with 27% lower gate leakage current, 12% higher maximum drain current, and 22.5% higher peak transconductance compared to 300 K. The temperature dependence of mobility and the two-dimensional electron gas concentration in the In As/Al Sb heterojunction for the temperature range 90 K-300 K is also investigated. The electron mobility at 90 K（42560 cm2/V·s）is 2.5 times higher than its value at 300 K（16911 cm^2/V·s） because of the weaker lattice vibration and the impurity ionization at cryogenic temperatures, which corresponds to a reduced scattering rate and higher mobility. We also noted that the two-dimensional electron gas concentration decreases slightly from 1.99 × 10^（12） cm^（-2） at 300 K to 1.7 × 10^（12） cm^（-2） at 90 K with a decrease in temperature due to the lower ionization at cryogenic temperature and the nearly constant ？Ec.展开更多
基金Advanced Research Foundation of China(914xxx803-051xxx111)National Defense Advanced Research project(315xxxxx301)National Defense Innovation Program(48xx4).
基金Project supported by the Advanced Research Foundation of China(Grant No.914xxx803-051xxx111)the National Defense Advanced Research Project of China(Grant No.315xxxxx301)the National Defense Innovation Program of China(Grant No.48xx4)
文摘In this report, the effect of temperature on the In As/Al Sb heterojunction and high-electron-mobility transistors（HEMTs） with a gate length of 2 μm are discussed comprehensively. The results indicate that device performance is greatly improved at cryogenic temperatures. It is also observed that the device performance at 90 K is significantly improved with 27% lower gate leakage current, 12% higher maximum drain current, and 22.5% higher peak transconductance compared to 300 K. The temperature dependence of mobility and the two-dimensional electron gas concentration in the In As/Al Sb heterojunction for the temperature range 90 K-300 K is also investigated. The electron mobility at 90 K（42560 cm2/V·s）is 2.5 times higher than its value at 300 K（16911 cm^2/V·s） because of the weaker lattice vibration and the impurity ionization at cryogenic temperatures, which corresponds to a reduced scattering rate and higher mobility. We also noted that the two-dimensional electron gas concentration decreases slightly from 1.99 × 10^（12） cm^（-2） at 300 K to 1.7 × 10^（12） cm^（-2） at 90 K with a decrease in temperature due to the lower ionization at cryogenic temperature and the nearly constant ？Ec.
