报道了激射波长为2.1μm的Ga In Sb/Al Ga As Sb双量子阱激光器。通过优化外延结构设计和欧姆接触,无镀膜的宽条激光器达到了9.8%的峰值功率转换效率,这比原来的值提高了1.5倍,室温下得到了615 m W的连续激射功率输出和1.5 W的脉冲激射...报道了激射波长为2.1μm的Ga In Sb/Al Ga As Sb双量子阱激光器。通过优化外延结构设计和欧姆接触,无镀膜的宽条激光器达到了9.8%的峰值功率转换效率,这比原来的值提高了1.5倍,室温下得到了615 m W的连续激射功率输出和1.5 W的脉冲激射功率输出。这些激光器的阈值电流密度低至126 A/cm2,斜率效率高达0.3 W/A。通过测试不同腔长的激光器,测得内损耗和内量子效率分别为6 cm-1和75.5%,均比原有器件有很大提升。激光器在连续工作3 000 h后,功率没有明显下降。展开更多
2μm InGaSb/AlGaAsSb strained quantum wells and a tellurium-doped GaSb buffer layer were grown by molecular beam epitaxy（MBE）.The growth parameters of strained quantum wells were optimized by AFM, XRD and PL at 77 K...2μm InGaSb/AlGaAsSb strained quantum wells and a tellurium-doped GaSb buffer layer were grown by molecular beam epitaxy（MBE）.The growth parameters of strained quantum wells were optimized by AFM, XRD and PL at 77 K.The optimal growth temperature of quantum wells is 440℃.The PL peak wavelength of quantum wells at 300 K is 1.98μm,and the FWHM is 115 nm.Tellurium-doped GaSb buffer layers were optimized by Hall measurement.The optimal doping concentration is 1.127×10^（18） cm^（-3） and the resistivity is 5.295×10^（-3）Ω·cm.展开更多
A high power GaSb-based laser diode with lasing wavelength at 2 μm was fabricated and optimized. With the optimized epitaxial laser structure, the internal loss and the threshold current density decreased and the int...A high power GaSb-based laser diode with lasing wavelength at 2 μm was fabricated and optimized. With the optimized epitaxial laser structure, the internal loss and the threshold current density decreased and the internal quantum efficiency increased. For uncoated broad-area lasers, the threshold current density was as low as 144 A/cm2 （72 A/cm^2 per quantum well）, and the slope efficiency was 0.2 W/A. The internal loss was 11 cm^-1 and the internal quantum efficiency was 27.1%. The maximum output power of 357 mW under continuous-wave operation at room temperature was achieved. The electrical and optical properties of the laser diode were improved.展开更多
The growth of AlGaAsSb quatornary alloys is described. In order to control the epimxial growth ofAIGaAsSb, emphasis is given on the deposition rates, growth temperatures and the relationship between growthconditions a...The growth of AlGaAsSb quatornary alloys is described. In order to control the epimxial growth ofAIGaAsSb, emphasis is given on the deposition rates, growth temperatures and the relationship between growthconditions and the distribution coefficients of Al and As. Whether the growth of AlGaAsSb epilayers is con-trolled by chemical reactions or by mass diffusion depends on the growth temperatures. This argument is veri-fied by kinetic considerations. Specular surfaces of AlGaAsSb on GaSb substrates were obtained. The composi-tional nonuniformities measured by electron probe micro-analysis (EPMA) are less than 0. 6% on area of 15× 15 mm￣2. The crystallinity is measured by double crystal X-ray diffraction (DCXD). The lattice mismatchbetween AlGaAsSb epilayer and GaSb subetrato is estimated to be less than 5. 5 × 10￣(-4).展开更多
在GaSb衬底上用LPE法生长了晶格匹配的AlGaAsSb外延层。用室温光致发光和X射线双晶衍射分别测量了材料的禁带宽度和晶格常数,并与用内插法计算的结果进行了比较。用C-V和van der Pauw法测量了样品的电学参数。用激光喇曼散射和低温光致...在GaSb衬底上用LPE法生长了晶格匹配的AlGaAsSb外延层。用室温光致发光和X射线双晶衍射分别测量了材料的禁带宽度和晶格常数,并与用内插法计算的结果进行了比较。用C-V和van der Pauw法测量了样品的电学参数。用激光喇曼散射和低温光致发光研究了材料的光学性质,观察到了类GaSb的LO模和类AlSb的LO模以及LO声子与等离子激元的耦合模L_-;对x=0.2,y=0.025的样品,由低温到室温的变温光致发光测量确定的禁带宽度的温度系数为-3.2×10^(-4)eV/K。此外对于晶格失配,P型的原因以及PL谱峰的展宽等问题进行了讨论。展开更多
文摘报道了激射波长为2.1μm的Ga In Sb/Al Ga As Sb双量子阱激光器。通过优化外延结构设计和欧姆接触,无镀膜的宽条激光器达到了9.8%的峰值功率转换效率,这比原来的值提高了1.5倍,室温下得到了615 m W的连续激射功率输出和1.5 W的脉冲激射功率输出。这些激光器的阈值电流密度低至126 A/cm2,斜率效率高达0.3 W/A。通过测试不同腔长的激光器,测得内损耗和内量子效率分别为6 cm-1和75.5%,均比原有器件有很大提升。激光器在连续工作3 000 h后,功率没有明显下降。
基金Project supported by the Beijing Natural Science Foundation(No.4112058)the Science Foundation of the Chinese Academy of Sciences(No.CXJJ-11-M20)
文摘2μm InGaSb/AlGaAsSb strained quantum wells and a tellurium-doped GaSb buffer layer were grown by molecular beam epitaxy（MBE）.The growth parameters of strained quantum wells were optimized by AFM, XRD and PL at 77 K.The optimal growth temperature of quantum wells is 440℃.The PL peak wavelength of quantum wells at 300 K is 1.98μm,and the FWHM is 115 nm.Tellurium-doped GaSb buffer layers were optimized by Hall measurement.The optimal doping concentration is 1.127×10^（18） cm^（-3） and the resistivity is 5.295×10^（-3）Ω·cm.
基金supported by the Beijing Natural Science Foundation, China (Grant No. 4112058)
文摘A high power GaSb-based laser diode with lasing wavelength at 2 μm was fabricated and optimized. With the optimized epitaxial laser structure, the internal loss and the threshold current density decreased and the internal quantum efficiency increased. For uncoated broad-area lasers, the threshold current density was as low as 144 A/cm2 （72 A/cm^2 per quantum well）, and the slope efficiency was 0.2 W/A. The internal loss was 11 cm^-1 and the internal quantum efficiency was 27.1%. The maximum output power of 357 mW under continuous-wave operation at room temperature was achieved. The electrical and optical properties of the laser diode were improved.
文摘The growth of AlGaAsSb quatornary alloys is described. In order to control the epimxial growth ofAIGaAsSb, emphasis is given on the deposition rates, growth temperatures and the relationship between growthconditions and the distribution coefficients of Al and As. Whether the growth of AlGaAsSb epilayers is con-trolled by chemical reactions or by mass diffusion depends on the growth temperatures. This argument is veri-fied by kinetic considerations. Specular surfaces of AlGaAsSb on GaSb substrates were obtained. The composi-tional nonuniformities measured by electron probe micro-analysis (EPMA) are less than 0. 6% on area of 15× 15 mm￣2. The crystallinity is measured by double crystal X-ray diffraction (DCXD). The lattice mismatchbetween AlGaAsSb epilayer and GaSb subetrato is estimated to be less than 5. 5 × 10￣(-4).
文摘在GaSb衬底上用LPE法生长了晶格匹配的AlGaAsSb外延层。用室温光致发光和X射线双晶衍射分别测量了材料的禁带宽度和晶格常数,并与用内插法计算的结果进行了比较。用C-V和van der Pauw法测量了样品的电学参数。用激光喇曼散射和低温光致发光研究了材料的光学性质,观察到了类GaSb的LO模和类AlSb的LO模以及LO声子与等离子激元的耦合模L_-;对x=0.2,y=0.025的样品,由低温到室温的变温光致发光测量确定的禁带宽度的温度系数为-3.2×10^(-4)eV/K。此外对于晶格失配,P型的原因以及PL谱峰的展宽等问题进行了讨论。
