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Simulation analysis of combined UV/blue photodetector in CMOS process by technology computer-aided design
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作者 Changping CHEN Xiangliang JIN +2 位作者 Lizhen TANG Hongjiao YANG Jun LUO 《Frontiers of Optoelectronics》 EI CSCD 2014年第1期69-73,共5页
A composite ultraviolet (UV)/blue photode- tector structure has been proposed, which is composed of P-type silicon substrate, Pwelb Nwell and N-channel metal- oxide-semiconductor field-effect transistor (NMOSFET) ... A composite ultraviolet (UV)/blue photode- tector structure has been proposed, which is composed of P-type silicon substrate, Pwelb Nwell and N-channel metal- oxide-semiconductor field-effect transistor (NMOSFET) realized in the PweH. In this photodetector, lateral ring- shaped Pwell-Nwell junction was used to separate the photogenerated carriers, and non-equilibrium excess hole was injected to the Pwell bulk for changing the bulk potential and shifting the NMOSFET's threshold voltage as well as the output drain current. By technology computer-aided design (TCAD) device, simulation and analysis of this proposed photodetector were carried out. Simulation results show that the combined photodetector has enhanced responsivity to UV/blue spectrum. More- over, it exhibits very high sensitivity to weak and especially ultral-weak optical light. A sensitivity of 7000 A/W was obtained when an incident optical power of 0.01 μW was illuminated to the photodetector, which is 35000 times higher than the responsivity of a conventional silicon-based UV photodiode (usually is about 0.2 A/W). As a result, this proposed combined photodetector has great potential values for UV applications. 展开更多
关键词 ultraviolet (UV)golue photodetector weaklight detection complimentary metal-oxide-semiconductor(CMOS) technology computer-aided design (TCAD)
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