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800nm Semiconductor Absorber with Low Temp erature Method and Surface State Method Combined Absorber for Kerr Lens Modelocking of Ti:Al_2O_3 Laser
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作者 王勇刚 马骁宇 +1 位作者 曹士英 张志刚 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第10期1233-1237,共5页
A novel 800nm Bragg mirror type of semiconductor saturable absorption mirror wit h low temperature method and surface state method combined absorber is presented .With which passive Kerr lens mode locking of Ti∶Al 2... A novel 800nm Bragg mirror type of semiconductor saturable absorption mirror wit h low temperature method and surface state method combined absorber is presented .With which passive Kerr lens mode locking of Ti∶Al 2O 3 laser pumped by argo n ion laser is realized,which produces pulses as short as 40fs.The spectrum band width is 56nm,which means that it can support the modelocking of 20fs.The pulse frequency is 97.5MHz;average output power is 300mW at the pump power of 4.45W. 展开更多
关键词 semiconductor saturable absorption mirror sur face states low temperature Bragg mirror
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