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Effects of the reciprocating parameters of the carrier on material removal rate and non-uniformity in CMP
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作者 王彩玲 康仁科 +1 位作者 金洙吉 郭东明 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第12期134-137,共4页
Based on the Preston equation, the mathematical model of the material removal rate (MRR), aiming at a line-orbit chemical mechanical polisher, is established. The MRR and the material removal non-uniformity (MRNU)... Based on the Preston equation, the mathematical model of the material removal rate (MRR), aiming at a line-orbit chemical mechanical polisher, is established. The MRR and the material removal non-uniformity (MRNU) are numerically calculated by MATLAB, and the effects of the reciprocating parameters on the MRR and the MRNU are discussed. It is shown that the smaller the inclination angle and the larger the amplitude, the higher the MRR and the lower the MRNU. The reciprocating speed of the carrier plays a minor role to improve the MRR and decrease the MRNU. The results provide a guide for the design of a polisher and the determination of a process in line-orbit chemical mechanical polishing. 展开更多
关键词 chemical mechanical polishing reciprocating parameters material removal rate material removal non-uniformity
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