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Inductive Type Impedance of High Sensitivity Silicon Avalanche Photodiodes with Deeply Buried Micropixels
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《Journal of Electrical Engineering》 2017年第4期181-186,共6页
There have been investigated reactive properties of silicon avalanche photodiodes (MAPD---micropixel avalanche photodiode) with deeply buried micropixels (amplification channels) within AC signal frequencies f = 5... There have been investigated reactive properties of silicon avalanche photodiodes (MAPD---micropixel avalanche photodiode) with deeply buried micropixels (amplification channels) within AC signal frequencies f = 50-500 kHz. By experiment it is found out that measured capacitance of structures involving three p-n junctions in section passing through the pixels increases exponentially with Ufor (negative potential is applying to n-Si substrate) reaches maximum and at certain value Ufor = Uinv changes the sign becoming the negative capacitance (equivalent inductance). The magnitude of active component of complete conduction G grows with the applied voltage and reaches maximum value -70 mS at Ufor = 1.0 V (f = 500 kHz). There has been calculated difference in phase tp appearing between current and voltage and it is shown that at Ufor = 0 V the q = 80 and passes through the zero at Ufor = 0.55 V. The magnitude of negative capacitance recalculated to the inductance value with the growth of forward bias being decreased sharply tends to the saturation. 展开更多
关键词 Micro-pixel avalanche photodiode p-n junction capacitance p-n junction inductance inversion voltage.
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Analytical threshold voltage model for strained silicon GAA-TFET
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作者 康海燕 胡辉勇 王斌 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第11期640-644,共5页
Tunnel field effect transistors(TFETs) are promising devices for low power applications.An analytical threshold voltage model,based on the channel surface potential and electric field obtained by solving the 2D Pois... Tunnel field effect transistors(TFETs) are promising devices for low power applications.An analytical threshold voltage model,based on the channel surface potential and electric field obtained by solving the 2D Poisson's equation,for strained silicon gate all around TFETs is proposed.The variation of the threshold voltage with device parameters,such as the strain(Ge mole fraction x),gate oxide thickness,gate oxide permittivity,and channel length has also been investigated.The threshold voltage model is extracted using the peak transconductance method and is verified by good agreement with the results obtained from the TCAD simulation. 展开更多
关键词 strained TCAD drain permittivity verified junction Poisson length capacitance dielectric
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