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Improving the device performances of two-dimensional semiconducting transition metal dichalcogenides: Three strategies 被引量:2
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作者 Mo Cheng Junbo Yang +4 位作者 Xiaohui Li Hui Li Ruofan Du Jianping Shi Jun He 《Frontiers of physics》 SCIE CSCD 2022年第6期35-50,共16页
Two-dimensional(2D)semiconductors are emerging as promising candidates for the next-generation nanoelectronics.As a type of unique channel materials,2D semiconducting transition metal dichalcogenides(TMDCs),such as Mo... Two-dimensional(2D)semiconductors are emerging as promising candidates for the next-generation nanoelectronics.As a type of unique channel materials,2D semiconducting transition metal dichalcogenides(TMDCs),such as MoS2 and WS2,exhibit great potential for the state-of-the-art fieldeffect transistors owing to their atomically thin thicknesses,dangling-band free surfaces,and abundant band structures.Even so,the device performances of 2D semiconducting TMDCs are still failing to reach the theoretical values so far,which is attributed to the intrinsic defects,excessive doping,and daunting contacts between electrodes and channels.In this article,we review the up-to-date three strategies for improving the device performances of 2D semiconducting TMDCs:(i)the controllable synthesis of wafer-scale 2D semiconducting TMDCs single crystals to reduce the evolution of grain boundaries,(ii)the ingenious doping of 2D semiconducting TMDCs to modulate the band structures and suppress the impurity scatterings,and(iii)the optimization design of interfacial contacts between electrodes and channels to reduce the Schottky barrier heights and contact resistances.In the end,the challenges regarding the improvement of device performances of 2D semiconducting TMDCs are highlighted,and the further research directions are also proposed.We believe that this review is comprehensive and insightful for downscaling the electronic devices and extending the Moore’s law. 展开更多
关键词 2D semiconductor transition metal dichalcogenides waferscale single crystal ingenious doping interfacial contact device performance
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