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Unveiling key descriptors for electrical resistivity of alloys using high-throughput experiments and explainable AI
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作者 Taeyeop Kim Dongwoo Lee 《npj Computational Materials》 2025年第1期3296-3303,共8页
This study examines the electrical resistivity of metals and binary,ternary alloy thin films across a broad range of compositions and microstructures through data-driven approaches.Electrical resistivity values for ov... This study examines the electrical resistivity of metals and binary,ternary alloy thin films across a broad range of compositions and microstructures through data-driven approaches.Electrical resistivity values for over 70,000 alloy compositions were measured through high-throughput experiments on combinatorially synthesized specimens.A machine learning prediction model was developed,and an explainable artificial intelligence(XAI)algorithm was utilized to identify the key features influencing electrical resistivity.The results demonstrate that the average valence electron concentration(VECavg)is the most significant descriptor governing the electrical resistivity of these alloys.Electronegativity difference(ΔEN)and mixing entropy(ΔS)were identified as collaborative features contributing to resistivity.The relationships between these features and resistivity are discussed in the context of traditional theoretical frameworks to provide a comprehensive understanding of the electrical behavior of alloys. 展开更多
关键词 explainable artificial identify key features influencing electrical resis machine learning prediction model ALLOYS high throughput experiments explainable artificial intelligence electrical resistivity thin films
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