Exact doubly periodic standing wave patterns of the Davey-Stewartson （DS） equations are derived in terms of rational expressions of elliptic functions.In fluid mechanics,DS equations govern the evolution of weakly n...Exact doubly periodic standing wave patterns of the Davey-Stewartson （DS） equations are derived in terms of rational expressions of elliptic functions.In fluid mechanics,DS equations govern the evolution of weakly nonlinear,free surface wave packets when long wavelength modulations in two mutually perpendicular,horizontal directions are incorporated.Elliptic functions with two different moduli （periods） are necessary in the two directions.The relation between the moduli and the wave numbers constitutes the dispersion relation of such waves.In the long wave limit,localized pulses are recovered.展开更多
With the economic integration all over the world, it is necessary to establish the free trade area of central Asia, including Xinjiang. This paper analyses the demands on establishing free trade area in central Asia. ...With the economic integration all over the world, it is necessary to establish the free trade area of central Asia, including Xinjiang. This paper analyses the demands on establishing free trade area in central Asia. According to the present statues of Xinjiang and five countries of central Asia, the developmental patterns are suggested. Furthermore, some policies and suggestions are proposed about the existing problems.展开更多
The chemical mechanical polishing/planarization（CMP） performance of an inhibitor-free alkaline copper slurry is investigated.The results of the Cu dissolution rate（DR） and the polish rate（PR） show that the alkal...The chemical mechanical polishing/planarization（CMP） performance of an inhibitor-free alkaline copper slurry is investigated.The results of the Cu dissolution rate（DR） and the polish rate（PR） show that the alkaline slurry without inhibitors has a relatively high copper removal rate and considerable dissolution rate.Although the slurry with inhibitors has a somewhat low DR,the copper removal rate was significantly reduced due to the addition of inhibitors（Benzotriazole,BTA）.The results obtained from pattern wafers show that the alkaline slurry without inhibitors has a better planarization efficacy;it can planarize the uneven patterned surface during the excess copper removal.These results indicate that the proposed inhibitor-free copper slurry has a considerable planarization capability for CMP of Cu pattern wafers,it can be applied in the first step of Cu CMP for copper bulk removal.展开更多
基金support of the Hong Kong Research Grants Council through contracts 711807E and 712008E
文摘Exact doubly periodic standing wave patterns of the Davey-Stewartson （DS） equations are derived in terms of rational expressions of elliptic functions.In fluid mechanics,DS equations govern the evolution of weakly nonlinear,free surface wave packets when long wavelength modulations in two mutually perpendicular,horizontal directions are incorporated.Elliptic functions with two different moduli （periods） are necessary in the two directions.The relation between the moduli and the wave numbers constitutes the dispersion relation of such waves.In the long wave limit,localized pulses are recovered.
文摘With the economic integration all over the world, it is necessary to establish the free trade area of central Asia, including Xinjiang. This paper analyses the demands on establishing free trade area in central Asia. According to the present statues of Xinjiang and five countries of central Asia, the developmental patterns are suggested. Furthermore, some policies and suggestions are proposed about the existing problems.
基金supported by the Major National Science and Technology Special Projects,China(No.2009ZX02308)the Tianjin Natural Science Foundation of China(No.lOJCZDJC 15500)+1 种基金the National Natural Science Foundation of China(No.10676008)the Fund Project of Hebei Provincial Department of Education,China(No.2011128)
文摘The chemical mechanical polishing/planarization（CMP） performance of an inhibitor-free alkaline copper slurry is investigated.The results of the Cu dissolution rate（DR） and the polish rate（PR） show that the alkaline slurry without inhibitors has a relatively high copper removal rate and considerable dissolution rate.Although the slurry with inhibitors has a somewhat low DR,the copper removal rate was significantly reduced due to the addition of inhibitors（Benzotriazole,BTA）.The results obtained from pattern wafers show that the alkaline slurry without inhibitors has a better planarization efficacy;it can planarize the uneven patterned surface during the excess copper removal.These results indicate that the proposed inhibitor-free copper slurry has a considerable planarization capability for CMP of Cu pattern wafers,it can be applied in the first step of Cu CMP for copper bulk removal.
