Electrical potentials up to 800 mV can be observed between different metallic dental restorations. These potentials produce fields in the mouth that may interfere with microbial communities. The present study focuses ...Electrical potentials up to 800 mV can be observed between different metallic dental restorations. These potentials produce fields in the mouth that may interfere with microbial communities. The present study focuses on the impact of different electric field strengths （EFS） on the growth of Staphylococcus aureus （ATCC 25923） and Escherichia coil （ATCC 25922） in vitro. Cultures of S. aureus and E. coil in fluid and gel medium were exposed to different EFS. Effects were determined by calculation of viable counts and measurement of inhibition zones. In gel medium, anodic inhibition zones for S. aureuswere larger than those for E. coliat all field strength levels. In fluid medium, the maximum decrease in the viable count of S. aureus cells was at 10 V.m-1. Field-treated S. aureus cells presented ruptured cell walls and disintegrated cytoplasm. Conclusively, S. aureus is more sensitive to increasing electric field strength than E. coll.展开更多
文摘Electrical potentials up to 800 mV can be observed between different metallic dental restorations. These potentials produce fields in the mouth that may interfere with microbial communities. The present study focuses on the impact of different electric field strengths （EFS） on the growth of Staphylococcus aureus （ATCC 25923） and Escherichia coil （ATCC 25922） in vitro. Cultures of S. aureus and E. coil in fluid and gel medium were exposed to different EFS. Effects were determined by calculation of viable counts and measurement of inhibition zones. In gel medium, anodic inhibition zones for S. aureuswere larger than those for E. coliat all field strength levels. In fluid medium, the maximum decrease in the viable count of S. aureus cells was at 10 V.m-1. Field-treated S. aureus cells presented ruptured cell walls and disintegrated cytoplasm. Conclusively, S. aureus is more sensitive to increasing electric field strength than E. coll.
