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A novel double-node-upset-resilient radiation-hardened latch 被引量:1
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作者 Wang Qijun Yan Aibin 《Journal of Southeast University(English Edition)》 EI CAS 2018年第2期182-186,共5页
To effectively tolerate a double-node upset,a novel double-node-upset-resilient radiation-hardened latch is proposed in 22 nm complementary-metal-oxide-semiconductor technology.Using three interlocked single-node-upse... To effectively tolerate a double-node upset,a novel double-node-upset-resilient radiation-hardened latch is proposed in 22 nm complementary-metal-oxide-semiconductor technology.Using three interlocked single-node-upset-resilient cells,which are identically mainly constructed from three mutually feeding back 2-input C-elements,the latch achieves double-node-upset-resilience.Using smaller transistor sizes,clock-gating technology,and high-speed transmission-path,the cost of the latch is effectively reduced.Simulation results demonstrate the double-node-upset-resilience of the latch and also show that compared with the up-to-date double-node-upset-resilient latches,the proposed latch reduces the transmission delay by 72.54%,the power dissipation by 33.97%,and the delay-power-area product by 78.57%,while the average cost of the silicon area is only increased by 16.45%. 展开更多
关键词 radiation hardening circuit reliability soft error double-node upset single-node upset
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Multiple bit upsets mitigation in memory by using improved hamming codes and parity codes 被引量:1
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作者 祝名 肖立伊 田欢 《Journal of Harbin Institute of Technology(New Series)》 EI CAS 2010年第5期726-730,共5页
This paper combines improved Hamming codes and parity codes to assure the reliability of memory in presence of multiple bit upsets with low cost overhead.The redundancy bits of improved Hamming codes will be appended ... This paper combines improved Hamming codes and parity codes to assure the reliability of memory in presence of multiple bit upsets with low cost overhead.The redundancy bits of improved Hamming codes will be appended at the end of data bits,which eliminates the overhead of interspersing the redundancy bits at the encoder and decoder.The reliability of memory is further enhanced by the layout architecture of redundancy bits and data bits.The proposed scheme has been implemented in Verilog and synthesized using the Synopsys tools.The results reveal that the proposed method has about 19% less area penalties and 13% less power consumption comparing with the current two-dimensional error codes,and its latency of encoder and decoder is 63% less than that of Hamming codes. 展开更多
关键词 MEMORY multiple bit upsets improved hamming codes two-dimensional error codes
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Influences of supply voltage on single event upsets and multiple-cell upsets in nanometer SRAM across a wide linear energy transfer range 被引量:1
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作者 Yin-Yong Luo Wei Chen +1 位作者 Feng-Qi Zhang Tan Wang 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第4期596-604,共9页
The influences of reducing the supply voltage on single event upset(SEU) and multiple-cell upset(MCU) in two kinds of 65-nm static random access memories(SRAMs) are characterized across a wide linear energy transfer(L... The influences of reducing the supply voltage on single event upset(SEU) and multiple-cell upset(MCU) in two kinds of 65-nm static random access memories(SRAMs) are characterized across a wide linear energy transfer(LET) range.The results show that the influence of the voltage variation on SEU cross section clearly depends on the LET value which is above heavy ion LET threshold no matter whether the SRAM is non-hardened 6 T SRAM or radiation-hardened double dual interlocked cells(DICE) SRAM.When the LET value is lower than the LET threshold of MCU,the SEU only manifests single cell upset,the SEU cross section increases with the decrease of voltage.The lower the LET value,the higher the SEU sensitivity to the voltage variation is.Lowering the voltage has no evident influence on SEU cross section while the LET value is above the LET threshold of MCU.Moreover,the reduction of the voltage can result in a decrease in the highest-order MCU event cross section due to the decrease of charge collection efficiency of the outer sub-sensitive volume within a certain voltage range.With further scaling the feature size of devices down,it is suggested that the dependence of SEU on voltage variation should be paid special attention to for heavy ions with very low LET or the other particles with very low energy for nanometer commercial off-the-shelf(COTS) SRAM. 展开更多
关键词 supply voltage single event upsets multiple-cell upsets 65-nm SRAM double DICE SRAM
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Azimuthal dependence of single-event and multiple-bit upsets in SRAM devices with anisotropic layout 被引量:2
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作者 张战刚 刘杰 +10 位作者 侯明东 孙友梅 苏弘 古松 耿超 姚会军 罗捷 段敬来 莫丹 习凯 恩云飞 《Nuclear Science and Techniques》 SCIE CAS CSCD 2015年第5期69-75,共7页
Experimental evidence is presented showing obvious azimuthal dependence of single event upsets(SEU) and multiple-bit upset(MBU) patterns in radiation hardened by design(RHBD) and MBU-sensitive static random access mem... Experimental evidence is presented showing obvious azimuthal dependence of single event upsets(SEU) and multiple-bit upset(MBU) patterns in radiation hardened by design(RHBD) and MBU-sensitive static random access memories(SRAMs), due to the anisotropic device layouts. Depending on the test devices, a discrepancy from 24.5% to 50% in the SEU cross sections of dual interlock cell(DICE) SRAMs is shown between two perpendicular ion azimuths under the same tilt angle. Significant angular dependence of the SEU data in this kind of design is also observed, which does not fit the inverse-cosine law in the effective LET method. Ion trajectory-oriented MBU patterns are identified, which is also affected by the topological distribution of sensitive volumes. Due to that the sensitive volumes are periodically isolated by the BL/BLB contacts along the Y-axis direction, double-bit upsets along the X-axis become the predominant configuration under normal incidence.Predominant triple-bit upset and quadruple-bit upset patterns are the same under different ion azimuths(Lshaped and square-shaped configurations, respectively). Those results suggest that traditional RPP/IRPP model should be promoted to consider the azimuthal and angular dependence of single event effects in certain designs.During earth-based evaluation of SEE sensitivity, worst case beam direction, i.e., the worst case response, should be revealed to avoid underestimation of the on-orbit error rate. 展开更多
关键词 SRAM 各向异性 方位角 单事件 翻转 静态随机存取存储器 器件 设计模式
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Stability and performance analysis of a jump linear control system subject to digital upsets
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作者 王蕊 孙辉 马振洋 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第4期6-15,共10页
This paper focuses on the methodology analysis for the stability and the corresponding tracking performance of a closed-loop digital jump linear control system with a stochastic switching signal. The method is applied... This paper focuses on the methodology analysis for the stability and the corresponding tracking performance of a closed-loop digital jump linear control system with a stochastic switching signal. The method is applied to a flight control system. A distributed recoverable platform is implemented on the flight control system and subject to independent digital upsets. The upset processes are used to stimulate electromagnetic environments. Specifically, the paper presents the scenarios that the upset process is directly injected into the distributed flight control system, which is modeled by independent Markov upset processes and independent and identically distributed (IID) processes. A theoretical performance analysis and simulation modelling are both presented in detail for a more complete independent digital upset injection. The specific examples are proposed to verify the methodology of tracking performance analysis. The general analyses for different configurations are also proposed. Comparisons among different configurations are conducted to demonstrate the availability and the characteristics of the design. 展开更多
关键词 stochastic process stability and performance analysis jump linear system digital upsets
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Impact of incident direction on neutron-induced single-bit and multiple-cell upsets in 14 nm FinFET and 65 nm planar SRAMs
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作者 Shao-Hua Yang Zhan-Gang Zhang +9 位作者 Zhi-Feng Lei Yun Huang Kai Xi Song-Lin Wang Tian-Jiao Liang Teng Tong Xiao-Hui Li Chao Peng Fu-Gen Wu Bin Li 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第12期375-381,共7页
Based on the BL09 terminal of China Spallation Neutron Source(CSNS),single event upset(SEU)cross sections of14 nm fin field-effect transistor(FinFET)and 65 nm quad data rate(QDR)static random-access memories(SRAMs)are... Based on the BL09 terminal of China Spallation Neutron Source(CSNS),single event upset(SEU)cross sections of14 nm fin field-effect transistor(FinFET)and 65 nm quad data rate(QDR)static random-access memories(SRAMs)are obtained under different incident directions of neutrons:front,back and side.It is found that,for both technology nodes,the“worst direction”corresponds to the case that neutrons traverse package and metallization before reaching the sensitive volume.The SEU cross section under the worst direction is 1.7-4.7 times higher than those under other incident directions.While for multiple-cell upset(MCU)sensitivity,side incidence is the worst direction,with the highest MCU ratio.The largest MCU for the 14 nm FinFET SRAM involves 8 bits.Monte-Carlo simulations are further performed to reveal the characteristics of neutron induced secondary ions and understand the inner mechanisms. 展开更多
关键词 NEUTRON fin field-effect transistor(FinFET) single event upset(SEU) Monte-Carlo simulation
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Heavy ion energy influence on multiple-cell upsets in small sensitive volumes:from standard to high energies
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作者 Yang Jiao Li-Hua Mo +10 位作者 Jin-Hu Yang Yu-Zhu Liu Ya-Nan Yin Liang Wang Qi-Yu Chen Xiao-Yu Yan Shi-Wei Zhao Bo Li You-Mei Sun Pei-Xiong Zhao Jie Liu 《Nuclear Science and Techniques》 SCIE EI CAS CSCD 2024年第5期109-121,共13页
The 28 nm process has a high cost-performance ratio and has gradually become the standard for the field of radiation-hardened devices.However,owing to the minimum physical gate length of only 35 nm,the physical area o... The 28 nm process has a high cost-performance ratio and has gradually become the standard for the field of radiation-hardened devices.However,owing to the minimum physical gate length of only 35 nm,the physical area of a standard 6T SRAM unit is approximately 0.16μm^(2),resulting in a significant enhancement of multi-cell charge-sharing effects.Multiple-cell upsets(MCUs)have become the primary physical mechanism behind single-event upsets(SEUs)in advanced nanometer node devices.The range of ionization track effects increases with higher ion energies,and spacecraft in orbit primarily experience SEUs caused by high-energy ions.However,ground accelerator experiments have mainly obtained low-energy ion irradiation data.Therefore,the impact of ion energy on the SEU cross section,charge collection mechanisms,and MCU patterns and quantities in advanced nanometer devices remains unclear.In this study,based on the experimental platform of the Heavy Ion Research Facility in Lanzhou,low-and high-energy heavy-ion beams were used to study the SEUs of 28 nm SRAM devices.The influence of ion energy on the charge collection processes of small-sensitive-volume devices,MCU patterns,and upset cross sections was obtained,and the applicable range of the inverse cosine law was clarified.The findings of this study are an important guide for the accurate evaluation of SEUs in advanced nanometer devices and for the development of radiation-hardening techniques. 展开更多
关键词 28 nm static random access memory(SRAM) Energy effects Heavy ion Multiple-cell upset(MCU) Charge collection Inverse cosine law
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Back-gate bias and supply voltage dependency on the single-event upset susceptibility of 6 T CSOI-SRAM
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作者 Li-Wen Yao Jin-Hu Yang +12 位作者 Yu-Zhu Liu Bo Li Yang Jiao Shi-Wei Zhao Qi-Yu Chen Xin-Yu Li Tian-Qi Wang Fan-Yu Liu Jian-Tou Gao Jian-Li Liu Xing-Ji Li Jie Liu Pei-Xiong Zhao 《Nuclear Science and Techniques》 2025年第9期105-115,共11页
This paper explores the impact of back-gate bias (V_(soi)) and supply voltage (V_(DD)) on the single-event upset (SEU) cross section of 0.18μm configurable silicon-on-insulator static random-access memory (SRAM) unde... This paper explores the impact of back-gate bias (V_(soi)) and supply voltage (V_(DD)) on the single-event upset (SEU) cross section of 0.18μm configurable silicon-on-insulator static random-access memory (SRAM) under high linear energy transfer heavyion experimentation.The experimental findings demonstrate that applying a negative back-gate bias to NMOS and a positive back-gate bias to PMOS enhances the SEU resistance of SRAM.Specifically,as the back-gate bias for N-type transistors(V_(nsoi)) decreases from 0 to-10 V,the SEU cross section decreases by 93.23%,whereas an increase in the back-gate bias for P-type transistors (V_(psoi)) from 0 to 10 V correlates with an 83.7%reduction in SEU cross section.Furthermore,a significant increase in the SEU cross section was observed with increase in supply voltage,as evidenced by a 159%surge at V_(DD)=1.98 V compared with the nominal voltage of 1.8 V.To explore the physical mechanisms underlying these experimental data,we analyzed the dependence of the critical charge of the circuit and the collected charge on the bias voltage by simulating SEUs using technology computer-aided design. 展开更多
关键词 Single-event upset(SEU) Static random-access memory(SRAM) Back-gate voltage Supply voltage
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基于级进延展冷镦工艺的大长径比薄壁管件成形优化
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作者 孙进 陈野 +1 位作者 朱兴龙 黄小建 《锻压技术》 北大核心 2026年第2期7-14,共8页
针对常见的大长径比薄壁管件热锻工艺存在的温度难以控制、尺寸精度低的问题,以长径比为5.3的气弹簧用油气缸为例,提出一种先镦粗后级进延展式冷镦成形方法。在搭建三维模型的基础上,利用Deform-3D软件对拟定工艺的金属流动规律、成形... 针对常见的大长径比薄壁管件热锻工艺存在的温度难以控制、尺寸精度低的问题,以长径比为5.3的气弹簧用油气缸为例,提出一种先镦粗后级进延展式冷镦成形方法。在搭建三维模型的基础上,利用Deform-3D软件对拟定工艺的金属流动规律、成形载荷和断裂趋势等进行分析,验证了工艺的可行性。结合仿真结果,以薄壁延伸最大成形载荷为优化目标,利用正交试验与极差分析,得出各因素对最大成形载荷的影响程度依次为:首次缩径值a>入模角λ>冲头下压速度v,并选取了最优工艺参数组合:冲头下压速度v=15 mm·s^(-1)、首次缩径值a=0.70 mm、入模角λ=7°。优化后的工艺参数使最大成形载荷降低了18.15%,提高了薄壁成形质量。研究结果为同类大长径比薄壁管件的研究提供了理论参考。 展开更多
关键词 大长径比薄壁管件 级进延展冷镦工艺 最大成形载荷 金属流动规律 损伤值
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Microstructure and mechanical properties of AZ31-Mg_2Si in situ composite fabricated by repetitive upsetting 被引量:4
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作者 郭炜 王渠东 +2 位作者 叶兵 周浩 刘鉴锋 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第12期3755-3761,共7页
AZ31-4.6% Mg2Si (mass fraction) composite was prepared by conventional casting method. Repetitive upsetting (RU) was applied to severely deforming the as-cast composite at 400 ℃ for 1, 3, and 5 passes. Finite ele... AZ31-4.6% Mg2Si (mass fraction) composite was prepared by conventional casting method. Repetitive upsetting (RU) was applied to severely deforming the as-cast composite at 400 ℃ for 1, 3, and 5 passes. Finite element analysis of the material flow indicates that deformation concentrates in the bottom region of the sample after 1 pass, and much more uniform deformation is obtained after 5 passes. During multi-pass RU process, both dendritic and Chinese script type Mg2Si phases are broken up into smaller particles owing to the shear stress forced by the matrix. With the increasing number of RU passes, finer grain size and more homogeneous distribution of Mg2Si particles are obtained along with significant enhancement in both strength and ductility. AZ31-4.6%Mg2Si composite exhibits tensile strength of 284 MPa and elongation of 9.8%after 5 RU passes at 400 ℃ compared with the initial 128 MPa and 5.4%of original AZ31-4.6%Mg2Si composite. 展开更多
关键词 AZ31-Mg2Si composite Mg2Si particle repetitive upsetting microstructure mechanical properties
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Multiple Node Upset in SEU Hardened Storage Cells 被引量:4
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作者 刘必慰 郝跃 陈书明 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第2期244-250,共7页
We study the problem of multiple node upset (MNU) using three-dimensional device simulation. The results show the transient floating node and charge lateral diffusion are the key reasons for MNU. We compare the MNU ... We study the problem of multiple node upset (MNU) using three-dimensional device simulation. The results show the transient floating node and charge lateral diffusion are the key reasons for MNU. We compare the MNU with multiple bit upset (MBU),and find that their characteristics are different. Methods to avoid MNU are also discussed. 展开更多
关键词 multiple node upset hardened cell charge collection
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大气中子在电荷俘获型3D NAND闪存中引起的单粒子翻转特性及机理研究
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作者 李鸿德 张鸿 +5 位作者 焦扬 雷志锋 杨炜坤 李惠 路国光 张战刚 《物理学报》 北大核心 2026年第3期368-375,共8页
基于中国散裂中子源大气中子辐照谱仪提供的meV-GeV宽能谱中子束流,对128层电荷俘获型(charge trap,CT)3D NAND闪存开展中子辐照实验和仿真.研究发现,CT型3D NAND闪存在宽能谱中子辐照下的主要失效模式为单位翻转(single bit upset,SBU... 基于中国散裂中子源大气中子辐照谱仪提供的meV-GeV宽能谱中子束流,对128层电荷俘获型(charge trap,CT)3D NAND闪存开展中子辐照实验和仿真.研究发现,CT型3D NAND闪存在宽能谱中子辐照下的主要失效模式为单位翻转(single bit upset,SBU)、多单元翻转(multiple cell upset,MCU),其中SBU占比为82.6%.通过构建单粒子翻转(single event upset,SEU)事件的三维空间分布图发现,不同于重离子SEU的“串型”分布,中子SEU表现出显著的随机空间分布特点,仅存在少量“串型”分布的MCU事件.在MCU事件中,2位MCU占比最高,达到MCU事件的83.6%,高于2位的大尺寸MCU占比为16.4%,最大的MCU位数为7位.MCU图形以沿中子入射方向分布为主.进一步的中子输运仿真结果表明,中子在器件灵敏区内产生的二次粒子主要为N离子和Si离子.其中,线性能量传输(linear energy transfer,LET)小于10 MeV·cm^(2)·mg^(–1)的短射程二次粒子占主导,是诱发SBU的主要因素.少量LET值大、射程长的二次粒子是MCU的产生诱因. 展开更多
关键词 3D NAND闪存 大气中子 单粒子翻转 多单元翻转
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小规格高强度TB9钛合金轴类零件缩杆成形数值模拟及优化
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作者 张晓斌 李海涛 +2 位作者 马叙 李贺龙 李晓林 《锻压技术》 北大核心 2026年第1期65-71,共7页
研究了某种航天用钛合金芯杆的缩杆成形工艺,并根据芯杆结构进行不同成形工序的模具设计。借助有限元软件Deform-3D对成形过程进行数值模拟,分析成形过程中的应力、应变和损伤值分布,以及载荷-行程曲线。结果表明,室温成形时第1步成形... 研究了某种航天用钛合金芯杆的缩杆成形工艺,并根据芯杆结构进行不同成形工序的模具设计。借助有限元软件Deform-3D对成形过程进行数值模拟,分析成形过程中的应力、应变和损伤值分布,以及载荷-行程曲线。结果表明,室温成形时第1步成形哪部分芯杆结构,台阶、卡环槽或头部,会显著影响最终的成形结果。最终基于数值模拟结果,确定了最优工艺方案。经生产工艺实验验证,采用最优工艺方案生产多台阶芯杆,其头部以及槽部位连接平滑,无裂纹,填充饱满。对比零件实际外形尺寸和模拟结果,各尺寸偏差均符合产品要求,证实缩杆成形工艺方案切实可行,极大提升了生产效益与产品品质。 展开更多
关键词 TB9钛合金 芯杆 冷镦挤 缩杆成形 台阶
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镦拔变形对100Cr6钢显微组织与硬度的影响
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作者 马帅 陈克飞 +2 位作者 李建文 贺乐君 杨立军 《热加工工艺》 北大核心 2026年第1期195-199,共5页
对100Cr6钢进行了镦拔变形,研究了镦拔道次对晶粒细化和硬度的影响,分析了水淬后钢的组织变化。结果表明:随镦拔道次从一镦一拔增加到三镦三拔,试样中心晶粒大小从122.1μm减小到24.1μm,减少了80.3%;试样边缘晶粒大小从93.0μm减小到2... 对100Cr6钢进行了镦拔变形,研究了镦拔道次对晶粒细化和硬度的影响,分析了水淬后钢的组织变化。结果表明:随镦拔道次从一镦一拔增加到三镦三拔,试样中心晶粒大小从122.1μm减小到24.1μm,减少了80.3%;试样边缘晶粒大小从93.0μm减小到22.1μm,减少了76.2%。试样加热淬火后组织为粗大的奥氏体,镦拔淬火后,微观组织为淬火针状马氏体+少量团块状淬火屈氏体。镦拔淬火后试样的中心硬度为54.2~56.2 HRC,边缘的硬度为54.8~57.8 HRC。 展开更多
关键词 镦拔变形 100Cr6钢 显微组织 硬度
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基于RISC-V的抗单粒子加固研究
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作者 徐文龙 李凯旋 +2 位作者 许峥 姚进 周昕杰 《电子与封装》 2026年第2期60-65,共6页
在现代电子器件和集成电路设计中,单粒子效应已成为一个不可忽视的问题。基于RISC-V精简指令集架构,采用三模冗余(TMR)和检错纠错(EDAC)技术进行多层次的抗辐射加固。对加固后的电路流片并开展辐照实验。实验结果表明该电路在地球静止轨... 在现代电子器件和集成电路设计中,单粒子效应已成为一个不可忽视的问题。基于RISC-V精简指令集架构,采用三模冗余(TMR)和检错纠错(EDAC)技术进行多层次的抗辐射加固。对加固后的电路流片并开展辐照实验。实验结果表明该电路在地球静止轨道(GEO)的单粒子翻转率<1×10^(-4)error/(device·d),单粒子闩锁阈值>75MeV·cm^(2)/mg,验证了抗单粒子翻转和单粒子闩锁加固措施的有效性。 展开更多
关键词 单粒子翻转 单粒子闩锁 抗辐射加固
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超大型储能飞轮锻件晶粒细化工艺研究
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作者 杨小涵 陈太辉 +1 位作者 时立佳 张金珠 《金属加工(热加工)》 2026年第2期131-137,共7页
针对轴身直径近3m的30Cr2Ni4MoV钢大型储能飞轮锻件,因大镦粗比锻造导致难变形区晶粒粗大、组织遗传严重的问题,采用传统多次正火工艺难以实现该类锻件的晶粒细化,且较难满足无损检测要求,为此通过试验测定材料的等温转变“鼻尖”温度,... 针对轴身直径近3m的30Cr2Ni4MoV钢大型储能飞轮锻件,因大镦粗比锻造导致难变形区晶粒粗大、组织遗传严重的问题,采用传统多次正火工艺难以实现该类锻件的晶粒细化,且较难满足无损检测要求,为此通过试验测定材料的等温转变“鼻尖”温度,进而有针对性地开发专用等温转变工艺并应用于工程实践,有效提升了锻件晶粒细化效果与经济性,为同类超大型锻件的质量控制提供了关键技术支撑。 展开更多
关键词 储能飞轮锻件 大镦粗比 晶粒细化 等温转变
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22 nm FDSOI工艺触发器电路单粒子翻转的温度-电压协同影响研究
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作者 李同德 朱永钦 +2 位作者 孙雨 王亮 赵元富 《原子能科学技术》 北大核心 2026年第3期752-758,共7页
温度和电源电压是全耗尽绝缘体上硅(FDSOI)工艺电路单粒子翻转响应的关键影响因素,二者的协同作用需深入分析。本文通过高能重离子试验,获取了不同电源电压测试条件下,22 nm FDSOI工艺触发器电路单粒子翻转截面随温度的变化规律。等效... 温度和电源电压是全耗尽绝缘体上硅(FDSOI)工艺电路单粒子翻转响应的关键影响因素,二者的协同作用需深入分析。本文通过高能重离子试验,获取了不同电源电压测试条件下,22 nm FDSOI工艺触发器电路单粒子翻转截面随温度的变化规律。等效线性能量传输(LET)值为75.4 MeV·cm^(2)/mg的Ta粒子试验结果表明,当温度由27℃升高至125℃,触发器的单粒子翻转截面在两种电源电压条件下均显著增加,且在较低电源电压条件下,单粒子翻转截面与温度的相关性更大。通过TCAD仿真,研究了温度-电压的协同作用机制。相较于饱和电流,辐射诱导的电荷收集量主导了温度和电源电压协同影响结果。本文研究为纳米FDSOI工艺集成电路在温度和电压作用下的辐射响应评估和加固设计提供依据。 展开更多
关键词 全耗尽绝缘体上硅 温度-电压 协同影响 单粒子翻转截面 电荷收集
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辅助热源搅拌摩擦焊技术研究现状
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作者 赵尉辰 岳玉梅 赵华夏 《航空制造技术》 北大核心 2026年第3期117-135,共19页
搅拌摩擦焊(Friction stir welding,FSW)作为先进固相连接技术,广泛应用于航空航天等领域,但高熔点合金连接对搅拌摩擦焊的发展提出了新的挑战。辅助热源的外加能场辅助搅拌摩擦焊技术可以有效解决高熔点合金搅拌摩擦焊过程中存在的问题... 搅拌摩擦焊(Friction stir welding,FSW)作为先进固相连接技术,广泛应用于航空航天等领域,但高熔点合金连接对搅拌摩擦焊的发展提出了新的挑战。辅助热源的外加能场辅助搅拌摩擦焊技术可以有效解决高熔点合金搅拌摩擦焊过程中存在的问题,同时该技术也具有扩展工艺窗口、提高力学性能、降低焊接顶锻力与减少搅拌头磨损等优势。本文总结了迄今为止针对高熔点合金辅助热源搅拌摩擦焊的各类研究工作,涵盖感应辅助、激光辅助、电流辅助、电弧辅助及背部加热辅助等多种辅助方式;梳理了这些研究取得的主要成果,包括增加热输入、降低焊接顶锻力、改善微观结构以及提高接头力学性能等,并对该领域未来的研究方向进行了展望。 展开更多
关键词 搅拌摩擦焊(Friction stir welding FSW) 高熔点合金 辅助热源 焊接顶锻力 力学性能 微观结构
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针对数字延迟锁相环模块的单粒子翻转容错设计
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作者 涂子归 吴丽娟 李振涛 《微电子学与计算机》 2026年第1期165-174,共10页
研究了数字延迟锁相环的设计以及其单粒子翻转的容错设计,并提出一种电路级SEU(Single Event Upset,单粒子翻转)仿真方法。首先,提出了一款基于延迟线的数字延迟锁相环,探究了单粒子翻转效应的产生与现象,并通过开关电容的方式来引入节... 研究了数字延迟锁相环的设计以及其单粒子翻转的容错设计,并提出一种电路级SEU(Single Event Upset,单粒子翻转)仿真方法。首先,提出了一款基于延迟线的数字延迟锁相环,探究了单粒子翻转效应的产生与现象,并通过开关电容的方式来引入节点电平的翻转来模拟这一效应。其次,对不同的模块提出了不同的加固方法,在延迟链路中加入冗余链路配合表决器来抑制SEU的影响。再次,在TSPC触发器中设计了双模冗余搭配双输入反相器来增强触发器的抗SEU能力。最后,为了进一步提高系统的稳定性,设计了失锁恢复机制,使其在SEU发生后能够快速恢复锁定状态。仿真结果表明:设计的DDLL工作频率范围为200~600 MHz,加固前锁定时间为123.785 6~872.450 5 ns,加固后锁定时间为117.524 8~849.597 3 ns,且容错设计能够有效地抑制SEU引起的信号错误,为辐射环境中的延迟锁相环电路设计提供了有效的解决方案。 展开更多
关键词 数字延迟锁相环 单粒子翻转 辐射加固设计
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宇航环境下基于RHBD的SRAM抗双节点翻转研究综述
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作者 帅威 蔡烁 +4 位作者 陈俊伊 陈俊哲 梁鑫杰 黄珠 魏懋萱 《集成电路与嵌入式系统》 2026年第3期20-33,共14页
在宇航等高可靠性应用环境中,由辐射引发的多节点翻转已成为影响静态随机存储器稳定性的关键因素。近年来,针对双节点翻转问题,基于辐射加固设计策略的多种抗干扰结构被提出并得到广泛研究,典型的如S8P8N、QUCCE12T、SARP12T、HRLP16T、... 在宇航等高可靠性应用环境中,由辐射引发的多节点翻转已成为影响静态随机存储器稳定性的关键因素。近年来,针对双节点翻转问题,基于辐射加固设计策略的多种抗干扰结构被提出并得到广泛研究,典型的如S8P8N、QUCCE12T、SARP12T、HRLP16T、RH20T、S6P8N与RH14T等。文中系统回顾了现有RHBD型SRAM结构在DNU容错方面的设计理念与关键性能指标,梳理其在可靠性、功耗、面积、访问速度及静态稳定性等方面的优势与局限,并对比分析不同设计策略的适用场景。最后,指出当前RHBD结构在细粒度容错控制与综合性能平衡方面仍面临的挑战,未来设计可在电荷传播路径抑制、反馈机制优化等方向进一步突破。 展开更多
关键词 SRAM RHBD 双节点翻转 加固结构 S8P8N QUCCE12T SARP12T HRLP16T RH20T S6P8N RH14T
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