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Determination of Average Wall Thickness of Mesoporous Silica 被引量:2
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作者 Zhi Hong LI Yan Jun GONG +4 位作者 Dong WU Yu Han SUN Jun WANG Yi LIU Bao Zhong DONG 《Chinese Chemical Letters》 SCIE CAS CSCD 2001年第8期741-744,共4页
Small Angle X-ray Scattering (SAXS) experiment using Synchrotron Radiation as X-ray source was used to determine the average wall thickness of mesoporous silica prepared by condensation of tetraethylorthosilicate (TEO... Small Angle X-ray Scattering (SAXS) experiment using Synchrotron Radiation as X-ray source was used to determine the average wall thickness of mesoporous silica prepared by condensation of tetraethylorthosilicate (TEOS) using non-ionic alkylpolyethyleneoxide (AEO(9)) surfactant as templates. The results agreed with that of high-resolution TEM (HRTEM) measurement. 展开更多
关键词 Small Angle X-ray Scattering(SAXS) mesoporous silica average wall thickness
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Evaluation of Average Wall Thickness of Organically Modified Mesoporous Silica
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作者 YanJunGONG ZhiHongLI BaoZhongDONG 《Chinese Chemical Letters》 SCIE CAS CSCD 2005年第1期139-142,共4页
The small angle X-ray scattering of organically modified MSU-X silica prepared by co-condensation of tetraethoxysilane (TEOS) and methyltriethoxysilane (MTES) show negative deviation from Debye’s theory due to the ... The small angle X-ray scattering of organically modified MSU-X silica prepared by co-condensation of tetraethoxysilane (TEOS) and methyltriethoxysilane (MTES) show negative deviation from Debye’s theory due to the existence of the organic interface layer. By exerting correction of the scattering negative deviation, Debye relation may be recovered, and the average wall thickness of the material may be evaluated. 展开更多
关键词 Organically modified mesoporous silica average wall thickness small angle X-ray scattering (SAXS).
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DETERMINATION OF THE AVERAGÈTHICKNESS OF INTERFACE LAYERWRAPPED ABOUT SiO2 SOLS BY SAXS
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作者 Li Zhihong Gong Yanjun +4 位作者 Wu Dong Sun Yuhan Wang Jun Liu Yi Dong Baozhong 《Beijing Synchrotron Radiation Facility》 2001年第2期43-46,共4页
The average thickncss of the interface layer wrapped about sols usually is determined by fitling the Porod curve that shuws anegative deviation from Porod's law.In this paper we show.that it could also be determin... The average thickncss of the interface layer wrapped about sols usually is determined by fitling the Porod curve that shuws anegative deviation from Porod's law.In this paper we show.that it could also be determined by a new method that includes the ful-lowing steps;(1)determining the average radius R,of the sol particles ineluding intlerface layer from the small angle X-ray scat-lering data in which shows negalive deviation from Porod's law;(2)detemining the average rardius R2 of the sol particlks not in-cluding the interface layer from the seattering daia in which las been correeted the negative deviation from P'orod'a law;(3)thedifference AR Lelwcen R1 and R2,i.e,AR=R1-R2,is just the average thieknoss of thr intcrfuce layer wrapperd alunt swuls,By using tlhe:above methol,the average thickness of tie interface layer wrapped about SiO2 wols prepared under dilferent runli-tions were determined. 展开更多
关键词 srmall angle X-ray seattering SOLS the average thickness of interface layer
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