Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and comp...Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process o~ arc initiation during one shot. From the images it is conjectured that the lower voltage between the cathode and the anode may be the reason that leads to the lower transition speed of discharge at the moment of arc initiation.展开更多
基金Supported by the National Natural Science Foundation of China under Grant Nos 11105130 and 11475156
文摘Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process o~ arc initiation during one shot. From the images it is conjectured that the lower voltage between the cathode and the anode may be the reason that leads to the lower transition speed of discharge at the moment of arc initiation.
