Innovative use of HfO_(2)-based high-dielectric-permittivity materials could enable their integration into few-nanometre-scale devices for storing substantial quantities of electrical charges,which have received wides...Innovative use of HfO_(2)-based high-dielectric-permittivity materials could enable their integration into few-nanometre-scale devices for storing substantial quantities of electrical charges,which have received widespread applications in high-storage-density dynamic random access memory and energy-efficient complementary metal-oxide-semiconductor devices.During bipolar high electric-field cycling in numbers close to dielectric breakdown,the dielectric permittivity suddenly increases by 30 times after oxygen-vacancy ordering and ferroelectric-to-nonferroelectric phase transition of near-edge plasma-treated Hf_(0.5)Zr_(0.5)O_(2) thin-film capacitors.Here we report a much higher dielectric permittivity of 1466 during downscaling of the capacitor into the diameter of 3.85μm when the ferroelectricity suddenly disappears without high-field cycling.The stored charge density is as high as 183μC cm^(−2) at an operating voltage/time of 1.2 V/50 ns at cycle numbers of more than 10^(12) without inducing dielectric breakdown.The study of synchrotron X-ray micro-diffraction patterns show missing of a mixed tetragonal phase.The image of electron energy loss spectroscopy shows the preferred oxygen-vacancy accumulation at the regions near top/bottom electrodes as well as grain boundaries.The ultrahigh dielectric-permittivity material enables high-density integration of extremely scaled logic and memory devices in the future.展开更多
Amorphous Ga_(2)O_(3)(a-Ga_(2)O_(3))thin films were prepared on flexible polyimide,rigid quartz glass,and Si substrates via radio frequency magnetron sputtering at room temperature.The effect of oxygen/Ar flow rate ra...Amorphous Ga_(2)O_(3)(a-Ga_(2)O_(3))thin films were prepared on flexible polyimide,rigid quartz glass,and Si substrates via radio frequency magnetron sputtering at room temperature.The effect of oxygen/Ar flow rate ratio on the structure,optical property,surface morphology,and chemical bonding properties of the a-Ga_(2)O_(3) films was investigated.Results show that the average optical transmittance of the a-Ga_(2)O_(3) films is over 80%within the wavelength range of 300-2000 nm.The extracted optical band gap of the a-Ga_(2)O_(3) films is increased from 4.97 eV to 5.13 eV with the increase in O_(2)/Ar flow rate ratio from 0 to 0.25,due to the decrease in concentration of oxygen vacancy defects in the film.Furthermore,the optical refractive index and surface roughness of the a-Ga_(2)O_(3) films are optimized when the O_(2)/Ar flow rate ratio reaches 0.25.X-ray photoelectron spectroscopy analysis also shows that the proportion of oxygen vacancies(VO)and Ga-O chemical bonds in the O 1s peak is gradually decreased with the increase in O_(2)/Ar flow rate ratio from 0 to 0.25,proving that increasing the O_(2)/Ar flow rate ratio during film growth can reduce the concentration of oxygen vacancy defects in a-Ga_(2)O_(3) films.In this case,a-Ga_(2)O_(3) with optimal properties can be obtained.This work provides a research basis for high-performance flexible and rigid deep ultraviolet solar-blind detection devices based on a-Ga_(2)O_(3) films.展开更多
Type-II Dirac semimetal PtTe2is a promising candidate for various electronic device applications due to its high carrier mobility,high conductivity,and air stability.In this work,we report on the growth of large-scale...Type-II Dirac semimetal PtTe2is a promising candidate for various electronic device applications due to its high carrier mobility,high conductivity,and air stability.In this work,we report on the growth of large-scale PtTe_(2)films by the pulsed laser deposition(PLD)and the comparison of the magnetotransport properties with the PtTe2films grown by the chemical vapor deposition(CVD).The low-temperature Hall curves of the PLD-grown films exhibit a linear behavior,in contrast with the nonlinear characteristic of the Hall behavior observed in CVD-grown films,in which a defect gradient is introduced.Meanwhile,both PtTe2films show weak antilocalization at low temperatures,which is attributed to the strong spin–orbit coupling.展开更多
Nickel oxide(NiO)based gas sensors have at-tracted intense attention due to its high re-sponse to hydrogen sulfide(H_(2)S)gas.It has been demonstrated that the NiO sensors with exposed(111)facet exhibit excellent perf...Nickel oxide(NiO)based gas sensors have at-tracted intense attention due to its high re-sponse to hydrogen sulfide(H_(2)S)gas.It has been demonstrated that the NiO sensors with exposed(111)facet exhibit excellent perfor-mance,but the single-orientation NiO sensors with exposed(111)facet have rarely been studied.In this work,high quality(111)-ori-ented NiO epitaxial films were fabricated by pulsed laser deposition.Detailed crystalline structural information was revealed by using synchrotron based X-ray diffraction(XRD)technology.These NiO thin films show good se-lectivity for H_(2)S gas detection.Without further modification,the highest response to 100 ppm H_(2)S was measured to be 13.07 at 300℃,and limit of detection(LOD)could be as low as 186 ppb.Fitting of the electrical response curves during adsorption and desorption of H_(2)S gas indicates the two-site Langmuir kinetic processes.Combining with XPS and XAS measure-ments,the mechanism was discussed.Density functional theory(DFT)calculations show that NiO with exposed(111)facets has the most negative adsorption energy,indicating more sen-sitive to H_(2)S.These results could inspire more studies of metal oxide semiconductor-based gas sensors with specific surface.展开更多
Tetravalent tin(Sn^(4+))-based inorganic perovskite semiconductors like Cs_(2)SnI_(6)are expected to replace lead-based perovskite counterparts due to advantages such as structural stability and environmental friendli...Tetravalent tin(Sn^(4+))-based inorganic perovskite semiconductors like Cs_(2)SnI_(6)are expected to replace lead-based perovskite counterparts due to advantages such as structural stability and environmental friendliness.In this paper,we reported the dopant compensation effect in the component-dependent self-doped(111)-oriented Cs_(2)SnI_(6)thin films grown with pulsed laser deposition(PLD)at room temperature.The films were grown on(100)-SrTiO_(3)(STO)substrates at room temperature by PLD.Hall results of the Cs_(2)SnI_(6)films with different components realizing by controlling the ratio of SnI_(4)/CsI in the targets demonstrate a clear change of conductivity type from N-type to P-type,while the carrier concentration decreases from 1018 to 1013 and accordingly the film resistivity increases significantly from 3.8 to 2506Ωcm.The defect-relatedopticalfingerprints of Cs_(2)SnI_(6)films werealsoinvestigated withtemperature-dependent photoluminescence spectroscopy.At low temperatures of 10 K,the Cs_(2)SnI_(6)films exhibit donor-bound(D^(0)X)and donor-acceptor pair(DAP)emission,respectively,due to the self-doping effect.These re-sults indicate that controlling the composition of the PLD target is a powerful way to tune the electrical properties of Cs_(2)SnI_(6)films for possible applications in solar cells or X-ray detectors.展开更多
The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical per...The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction （XRD） analysis shows that the monolayer TiB2 films exhibit （001） preferred orientation, and the preferred orientation of [Ti/TiB2], multilayered films transfers from （001） to （100） with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy （FESEM）. The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.展开更多
CuInSe2 （CIS） films with good crystalline quality were synthesized by electrodeposition followed by annealing in Se vapor at 530 ℃. The morphology, composition, crystal structure, optical and electrical properties ...CuInSe2 （CIS） films with good crystalline quality were synthesized by electrodeposition followed by annealing in Se vapor at 530 ℃. The morphology, composition, crystal structure, optical and electrical properties of the CIS films were investigated by scanning electron microscopy, energy dispersive spectroscopy, X-ray diffraction, Raman spectroscopy, UV-VISNIR spectroscopy, and admittance spectroscopy. The results revealed that the annealed CIS films had chalcopyrite structure and consisted of relatively large grains in the range of 500-1000 nm and single grain of films extend usually through the whole film thickness. The band gap of CIS films was 0.98 eV and carrier concentration was in the order of 1016 cm-3 after etching the Cu-Se compounds on the film surface. Solar cells with the structure of AZO/i-ZnO/CdS/CIS/Mo/glass were fabricated. Current density vs. voltage test under standard reported condition showed the solar cells with an area of 0.2 cm2 had a conversion efficiency of 0.96%. The underlying physics was also discussed.展开更多
In the present study,WB 2（N） films are fabricated on silicon and YG8 substrates at different N 2 pressures by reactive magnetron sputtering.The influence of N 2 partial pressure（P （N2）） on the film microstructur...In the present study,WB 2（N） films are fabricated on silicon and YG8 substrates at different N 2 pressures by reactive magnetron sputtering.The influence of N 2 partial pressure（P （N2）） on the film microstructure and characteristics is studied systematically,including the chemical composition,crystalline structure,residual stress,surface roughness as well as the surface and the cross-section morphology.Meanwhile,nano-indentation and ball-on-disk tribometer are performed to analyze the mechanical and tribological properties of the films.The results show that the addition of nitrogen apparently leads to the change of the structure from（1 0 1） to（0 0 1） orientation then to the amorphous structure with the formation of BN phase.And the addition of nitrogen can greatly refine the grain size and microstructure of the films.Furthermore,the residual stress of the film is also found to change from tensile to compressive stress as a function of P （N2）,and the compressive stress increases with P （N2）,The WB 2（N） films with small nitrogen content,which are deposited at P （N2） of 0.004 and 0.006 Pa,exhibit better mechanical,tribological and corrosion properties than those of other films.Further increase of nitrogen content accelerates the formation of BN phase and fast decreases the film hardness.In addition,the large N 2 partial pressure gives rise to the target poisoning accompanied by the increase of the target voltage and the decrease of the deposition rate.展开更多
The CulnSe2 absorber was synthesized by non-vacuum process with a simple and low-cost method, which fabricated absorber layer of thin-film solar cell. The extra amount of Se was added into the ink to help reduction of...The CulnSe2 absorber was synthesized by non-vacuum process with a simple and low-cost method, which fabricated absorber layer of thin-film solar cell. The extra amount of Se was added into the ink to help reduction of the oxide and solid Se fountain was used to provide Se atmosphere during the selenization progress. The influence of same factors was investigated, such as the time of reduction in H2, the time of selenization and the Se vapor pressure. The selenizaion, processed at 550 ℃ for 60 min with the Se vapor pressure at 1.90 kPa, resulted in high quality CulnSe2 layer with very good chemical composition.展开更多
With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition process...With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.展开更多
Sb-doped SnO2(ATO)-(CeO2-TiO2) thin Films were deposited on glass substrates using the mixed solution including CeO2-TiO2 precursor and ATO particles by sol-gel dip coating process.ATO particles were prepared using lo...Sb-doped SnO2(ATO)-(CeO2-TiO2) thin Films were deposited on glass substrates using the mixed solution including CeO2-TiO2 precursor and ATO particles by sol-gel dip coating process.ATO particles were prepared using low-temperature hydrothermal process.The mixed molar ratio of ATO to(CeO2-TiO2) vs the properties of CeO2-TiO2 thin film was investigated.The optical properties of the films were characterized by UV-visible transmission and infrared reflection spectra,the sheet resistance of ATO particles and films were measured by rubber sheeter(MYI-50) and four-point probe(HisuperGroup Inc,SDY-5),the surface morphology and structure of the films were analyzed using 3D Digitale Mikroskop and X-ray diffraction(XRD),respectively.The results showed that the ATO precursor solution lost weight completely at about 500 oC,and the ATO particles was obtained,which indicated the same rutile lattice structure as SnO2.The glass substrates coated with ATO-(CeO2-TiO2) thin films showed better properties in antistatic electricity(104-106 Ω/),shielding UV(almost 100%),visible light transmission(70%) and infrared reflection(】30%).展开更多
Cu2ZnSnS4 (CZTS) thin films were successfully prepared by sulfurization of ion bean sputtered precursors on soda-lime glass substrate. The single phase of stannite-type structure CZTS films were obtained as revealed i...Cu2ZnSnS4 (CZTS) thin films were successfully prepared by sulfurization of ion bean sputtered precursors on soda-lime glass substrate. The single phase of stannite-type structure CZTS films were obtained as revealed in EDS and XRD analysis when the ratios of the constituents of CZTS thin films are close to stoichiometric by optimizing the conditions of precursor preparation and sulfurization. A low sheet resistivity as about 0.156 Ω·cm and a high absorption coefficient as 1×104 cm-1 were achieved in this method by Hall effect measurements and UV-VIS spectrophotometer. The optical band-gap energy of the CZTS sample is about 1.51 eV, which is very close to the optimum value for a solar-cell absorber.展开更多
TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-r...TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction（XRD）,atomic force microscopy（AFM） and ultraviolet spectrophotometer,respectively.The results indicated that working pressure was the key deposition parameter in？uencing the TiO2 film phase composition at room temperature,which directly affected its photocatalytic activity.With increasing working pressure,the target self-bias decreases monotonously.Therefore,low temperature TiO2 phase（anatase） could be deposited with high working pressure.The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution,which the degradation rate reached the maximum（35%） after irradiation by ultraviolet light for 1 h.展开更多
CuIn（S,Se）2 thin films were prepared by thermal crystallization of co-sputtered Cu-In alloy precursors in S/Se atmosphere. In-depth compositional uniformity is an important prereq- uisite for obtaining device-qualit...CuIn（S,Se）2 thin films were prepared by thermal crystallization of co-sputtered Cu-In alloy precursors in S/Se atmosphere. In-depth compositional uniformity is an important prereq- uisite for obtaining device-quality CuIn（S,Se）2 absorber thin films. In order to figure out the influence of heat treatments on in-depth composition uniformity of CuIn（S,Se）2 thin films, two kinds of reaction temperature profiles were investigated. One process is ＂one step profile＂, referring to formation of CuIn（S,Se）2 thin films just at elevated temperature （e.g. 500 ℃）. The other is ＂two step profile＂, which allows for slow diffusion of S and Se elements into the alloy precursors at a low temperature before the formation and re-crystallization of CuIn（S,Se）2 thin films at higher temperature （e.g. first 250 ℃ then 500 ℃）. X-ray diffrac- tion studies reveal that there is a discrepancy in the shape of （112） peak. Samples annealed with ＂one step profile＂ have splits on （112） peaks, while samples annealed with ＂two step profile＂ have relatively symmetrical （112） peaks. Grazing incident X-ray diffraction and en- ergy dispersive spectrum measurements of samples successively etched in bromine methanol show that CuIn（S,Se）2 thin films have better in-depth composition uniformity after ＂two step profile＂ annealing. The reaction mechanism during the two thermal processing was also investigated by X-ray diffraction and Raman spectra.展开更多
Mg films of various thicknesses were deposited on Si（111） substrates at room temperature by resistive thermal evaporation method, and then the Mg/Si samples were annealed at 40 ℃ for 4 h. The effects of Mg film thi...Mg films of various thicknesses were deposited on Si（111） substrates at room temperature by resistive thermal evaporation method, and then the Mg/Si samples were annealed at 40 ℃ for 4 h. The effects of Mg film thickness on the formation and structure of Mg2Si films were investigated. The results showed that the crystallization quality of Mg2Si films was strongly influenced by the thickness of Mg film. The XRD peak intensity of Mg2Si （220） gradually increased initially and then decreased with increasing Mg film thickness. The XRD peak intensity of Mg2Si （220） reached its maximum when the Mg film of 380 um was used. The thickness of the Mg2Si film annealed at 400℃ for 4 h was approximately 3 times of the Mg film.展开更多
Zn-doped TiO2 (Zn?TiO2) thin films were prepared by the sol?gel method on titanium substrates with heat treatment at different temperatures. The effects of heat treatment temperatures and Zn doping on the structure, p...Zn-doped TiO2 (Zn?TiO2) thin films were prepared by the sol?gel method on titanium substrates with heat treatment at different temperatures. The effects of heat treatment temperatures and Zn doping on the structure, photocathodic protection and photoelectrochemical properties of TiO2 thin films were investigated. It is indicated that the photoelectrical performance of the Zn?TiO2 films is enhanced with the addition of Zn element compared with the pure-TiO2 film and the largest decline by 897 mV in the electrode potential is achieved under 300 °C heat treatment. SEM?EDS analyses show that Zn element is unevenly distributed in Zn?TiO2 films; XRD patterns reveal that the grain size of Zn?TiO2 is smaller than that of pure-TiO2; FTIR results indicate that Zn - O bond forms on Zn?TiO2 surface. Ultraviolet visible absorption spectra prove that Zn?TiO2 shifts to visible light region.Mott?Shottky curves show that the flat-band potential of Zn?TiO2 is more negative and charge carrier density is bigger than that ofpure-TiO2, implying that under the synergy of the width of the space-charge layer, carrier density and flat-band potential, Zn?TiO2 with 300 °C heat treatment displays the best photocathodic protection performance.展开更多
CUIn1-xGaxSe2 （CIGS） films were prepared by a two-stage method, in which Cu-In-Ga metallic precursors were firstly deposited on unheated Mo-coated soda lime glass substrates by direct current sputtering CuGa （20%Ga...CUIn1-xGaxSe2 （CIGS） films were prepared by a two-stage method, in which Cu-In-Ga metallic precursors were firstly deposited on unheated Mo-coated soda lime glass substrates by direct current sputtering CuGa （20%Ga） and radio frequency sputtering In targets in an Ar atmosphere, followed by selenization at 520 ℃ for 40 min in Se vapor. By adjusting the sputtering thickness ratio of surface CuGa （20%Ga） and bottom CuGa （20%Ga） alloy layers in metal precursor, different CIGS thin films were fabricated. Through X-ray diffraction spectra, Raman spectra, local energy dispersive spectrometer, planar- and cross- sectional views of scanning electron microscopy measurements, it revealed that the CIGS thin films from selenization of metal precursor with CuGa：In：CuGa thickness ratio of 7：20：3 （sample-2-se） was of chalcopyrite structure with the preferred （112） orientation, and the grains sizes ranged from 0.5 μm to 2 μm, and sample-2-se had no binary compound phase of In-Se and order defect compound phase. Consequently, the results of illuminated current- voltage curve and quantum efficiency measurements showed that the CIGS film device made from sample-2-se had relative higher photo-electric conversion efficiency （3.59%） and good spectrum response.展开更多
The In 2 O 3 : W (IWO) films with different W content were deposited on glass substrate using direct current sputtering method. The structure, surface morphology, and optical and electrical properties were investigate...The In 2 O 3 : W (IWO) films with different W content were deposited on glass substrate using direct current sputtering method. The structure, surface morphology, and optical and electrical properties were investigated. Results showed that both the carrier concentration and carrier mobility were increased with the doping of W. The IWO film with the lowest resistivity of 1.0×10 3 cm, highest carrier mobilityof 43.7 cm 2 V 1 s 1 and carrier concentration of 1.4×10 20 cm 3 was obtained at the content of 2.8 wt.%. The average optical transmittance from 300 nm to 900 nm reached 87.6%.展开更多
Nano-structured SiO2 thin films were prepared on the surface of carbon steel for the first time by LPD. The compositions of the films were analyzed by XPS, and the surface morphology of the thin films were observed b...Nano-structured SiO2 thin films were prepared on the surface of carbon steel for the first time by LPD. The compositions of the films were analyzed by XPS, and the surface morphology of the thin films were observed by AFM. The thin films were constituted by compact particles of SiO2, and there was no Fe in the films. In the process of film forming, the SiO2 colloid particles were deposited or absorbed directly onto the surface of carbon steel substrates that were activated by acid solution containing inhibitor, and corrosion of the substrates was avoided. The nano-structured SiO2 thin films that were prepared had excellent protective efficiency to the carbon steel.展开更多
Y2O3：Er^3＋ films were prepared by a simple sol-gel process. The structural properties of Y2O3：Er^3＋ films were characterized with X-ray diffraction, Fourier transform infrared spectroscopy and field emission scann...Y2O3：Er^3＋ films were prepared by a simple sol-gel process. The structural properties of Y2O3：Er^3＋ films were characterized with X-ray diffraction, Fourier transform infrared spectroscopy and field emission scanning electron microscopy. The results indicated that the Y2O3：Er^3＋ films might have high upconversion efficiency because of their low vibrational energy. Under 785 and 980 nm laser excitation, the samples showed green （^2H11/2→^4I15/2, ^4S3/2→^4I15/2） and red （^4F9/2→^4I15/2） upconversion emissions. The upconversion mechanisms were studied in detail through laser power dependence. Excited state absorption and energy transfer process were discussed as possible upconversion mechanisms. The cross relaxation process in Er^3＋ was also investigated.展开更多
基金supported by the National Key Basic Research Program of China (2022YFA1402904)Basic Research Project of Shanghai Science and Technology Innovation Action (grant number 24CL2900900)the National Natural Science Foundation of China (grant number 61904034)
文摘Innovative use of HfO_(2)-based high-dielectric-permittivity materials could enable their integration into few-nanometre-scale devices for storing substantial quantities of electrical charges,which have received widespread applications in high-storage-density dynamic random access memory and energy-efficient complementary metal-oxide-semiconductor devices.During bipolar high electric-field cycling in numbers close to dielectric breakdown,the dielectric permittivity suddenly increases by 30 times after oxygen-vacancy ordering and ferroelectric-to-nonferroelectric phase transition of near-edge plasma-treated Hf_(0.5)Zr_(0.5)O_(2) thin-film capacitors.Here we report a much higher dielectric permittivity of 1466 during downscaling of the capacitor into the diameter of 3.85μm when the ferroelectricity suddenly disappears without high-field cycling.The stored charge density is as high as 183μC cm^(−2) at an operating voltage/time of 1.2 V/50 ns at cycle numbers of more than 10^(12) without inducing dielectric breakdown.The study of synchrotron X-ray micro-diffraction patterns show missing of a mixed tetragonal phase.The image of electron energy loss spectroscopy shows the preferred oxygen-vacancy accumulation at the regions near top/bottom electrodes as well as grain boundaries.The ultrahigh dielectric-permittivity material enables high-density integration of extremely scaled logic and memory devices in the future.
基金Research Project of Shenzhen Science and Technology Innovation Committee(JCYJ20180306170801080)。
文摘Amorphous Ga_(2)O_(3)(a-Ga_(2)O_(3))thin films were prepared on flexible polyimide,rigid quartz glass,and Si substrates via radio frequency magnetron sputtering at room temperature.The effect of oxygen/Ar flow rate ratio on the structure,optical property,surface morphology,and chemical bonding properties of the a-Ga_(2)O_(3) films was investigated.Results show that the average optical transmittance of the a-Ga_(2)O_(3) films is over 80%within the wavelength range of 300-2000 nm.The extracted optical band gap of the a-Ga_(2)O_(3) films is increased from 4.97 eV to 5.13 eV with the increase in O_(2)/Ar flow rate ratio from 0 to 0.25,due to the decrease in concentration of oxygen vacancy defects in the film.Furthermore,the optical refractive index and surface roughness of the a-Ga_(2)O_(3) films are optimized when the O_(2)/Ar flow rate ratio reaches 0.25.X-ray photoelectron spectroscopy analysis also shows that the proportion of oxygen vacancies(VO)and Ga-O chemical bonds in the O 1s peak is gradually decreased with the increase in O_(2)/Ar flow rate ratio from 0 to 0.25,proving that increasing the O_(2)/Ar flow rate ratio during film growth can reduce the concentration of oxygen vacancy defects in a-Ga_(2)O_(3) films.In this case,a-Ga_(2)O_(3) with optimal properties can be obtained.This work provides a research basis for high-performance flexible and rigid deep ultraviolet solar-blind detection devices based on a-Ga_(2)O_(3) films.
基金Project supported by the National Key R&D Program of China(Grant No.2022YFA1402404)the National Natural Science Foundation of China(Grant Nos.T2394473,624B2070,and 62274085)。
文摘Type-II Dirac semimetal PtTe2is a promising candidate for various electronic device applications due to its high carrier mobility,high conductivity,and air stability.In this work,we report on the growth of large-scale PtTe_(2)films by the pulsed laser deposition(PLD)and the comparison of the magnetotransport properties with the PtTe2films grown by the chemical vapor deposition(CVD).The low-temperature Hall curves of the PLD-grown films exhibit a linear behavior,in contrast with the nonlinear characteristic of the Hall behavior observed in CVD-grown films,in which a defect gradient is introduced.Meanwhile,both PtTe2films show weak antilocalization at low temperatures,which is attributed to the strong spin–orbit coupling.
基金supported by the National Key Research and Development Program of China(No.2022YFA1603902)the National Natural Science Foundation of China(No.12175235,No.62271462,and No.12004407)。
文摘Nickel oxide(NiO)based gas sensors have at-tracted intense attention due to its high re-sponse to hydrogen sulfide(H_(2)S)gas.It has been demonstrated that the NiO sensors with exposed(111)facet exhibit excellent perfor-mance,but the single-orientation NiO sensors with exposed(111)facet have rarely been studied.In this work,high quality(111)-ori-ented NiO epitaxial films were fabricated by pulsed laser deposition.Detailed crystalline structural information was revealed by using synchrotron based X-ray diffraction(XRD)technology.These NiO thin films show good se-lectivity for H_(2)S gas detection.Without further modification,the highest response to 100 ppm H_(2)S was measured to be 13.07 at 300℃,and limit of detection(LOD)could be as low as 186 ppb.Fitting of the electrical response curves during adsorption and desorption of H_(2)S gas indicates the two-site Langmuir kinetic processes.Combining with XPS and XAS measure-ments,the mechanism was discussed.Density functional theory(DFT)calculations show that NiO with exposed(111)facets has the most negative adsorption energy,indicating more sen-sitive to H_(2)S.These results could inspire more studies of metal oxide semiconductor-based gas sensors with specific surface.
基金financially supported by the National Key Re-search and Development Program of China(No.2022YFC3700801)the Key R&D Program of Shandong Province,China(No.2024SFGC0102),the Jinan Bureau of Education(No.JNSX2023015)the Jinan Bureau of Science and Technology(No.202333042).
文摘Tetravalent tin(Sn^(4+))-based inorganic perovskite semiconductors like Cs_(2)SnI_(6)are expected to replace lead-based perovskite counterparts due to advantages such as structural stability and environmental friendliness.In this paper,we reported the dopant compensation effect in the component-dependent self-doped(111)-oriented Cs_(2)SnI_(6)thin films grown with pulsed laser deposition(PLD)at room temperature.The films were grown on(100)-SrTiO_(3)(STO)substrates at room temperature by PLD.Hall results of the Cs_(2)SnI_(6)films with different components realizing by controlling the ratio of SnI_(4)/CsI in the targets demonstrate a clear change of conductivity type from N-type to P-type,while the carrier concentration decreases from 1018 to 1013 and accordingly the film resistivity increases significantly from 3.8 to 2506Ωcm.The defect-relatedopticalfingerprints of Cs_(2)SnI_(6)films werealsoinvestigated withtemperature-dependent photoluminescence spectroscopy.At low temperatures of 10 K,the Cs_(2)SnI_(6)films exhibit donor-bound(D^(0)X)and donor-acceptor pair(DAP)emission,respectively,due to the self-doping effect.These re-sults indicate that controlling the composition of the PLD target is a powerful way to tune the electrical properties of Cs_(2)SnI_(6)films for possible applications in solar cells or X-ray detectors.
基金Project(51175212)supported by the National Natural Science Foundation of China
文摘The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction （XRD） analysis shows that the monolayer TiB2 films exhibit （001） preferred orientation, and the preferred orientation of [Ti/TiB2], multilayered films transfers from （001） to （100） with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy （FESEM）. The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.
文摘CuInSe2 （CIS） films with good crystalline quality were synthesized by electrodeposition followed by annealing in Se vapor at 530 ℃. The morphology, composition, crystal structure, optical and electrical properties of the CIS films were investigated by scanning electron microscopy, energy dispersive spectroscopy, X-ray diffraction, Raman spectroscopy, UV-VISNIR spectroscopy, and admittance spectroscopy. The results revealed that the annealed CIS films had chalcopyrite structure and consisted of relatively large grains in the range of 500-1000 nm and single grain of films extend usually through the whole film thickness. The band gap of CIS films was 0.98 eV and carrier concentration was in the order of 1016 cm-3 after etching the Cu-Se compounds on the film surface. Solar cells with the structure of AZO/i-ZnO/CdS/CIS/Mo/glass were fabricated. Current density vs. voltage test under standard reported condition showed the solar cells with an area of 0.2 cm2 had a conversion efficiency of 0.96%. The underlying physics was also discussed.
基金supported by the National Key Basic Research Program of China (973 Program,No.2012CB625100)the Natural Science Foundation of Liaoning Province of China (No.2013020093)
文摘In the present study,WB 2（N） films are fabricated on silicon and YG8 substrates at different N 2 pressures by reactive magnetron sputtering.The influence of N 2 partial pressure（P （N2）） on the film microstructure and characteristics is studied systematically,including the chemical composition,crystalline structure,residual stress,surface roughness as well as the surface and the cross-section morphology.Meanwhile,nano-indentation and ball-on-disk tribometer are performed to analyze the mechanical and tribological properties of the films.The results show that the addition of nitrogen apparently leads to the change of the structure from（1 0 1） to（0 0 1） orientation then to the amorphous structure with the formation of BN phase.And the addition of nitrogen can greatly refine the grain size and microstructure of the films.Furthermore,the residual stress of the film is also found to change from tensile to compressive stress as a function of P （N2）,and the compressive stress increases with P （N2）,The WB 2（N） films with small nitrogen content,which are deposited at P （N2） of 0.004 and 0.006 Pa,exhibit better mechanical,tribological and corrosion properties than those of other films.Further increase of nitrogen content accelerates the formation of BN phase and fast decreases the film hardness.In addition,the large N 2 partial pressure gives rise to the target poisoning accompanied by the increase of the target voltage and the decrease of the deposition rate.
文摘The CulnSe2 absorber was synthesized by non-vacuum process with a simple and low-cost method, which fabricated absorber layer of thin-film solar cell. The extra amount of Se was added into the ink to help reduction of the oxide and solid Se fountain was used to provide Se atmosphere during the selenization progress. The influence of same factors was investigated, such as the time of reduction in H2, the time of selenization and the Se vapor pressure. The selenizaion, processed at 550 ℃ for 60 min with the Se vapor pressure at 1.90 kPa, resulted in high quality CulnSe2 layer with very good chemical composition.
文摘With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.
基金Project supported by the Changjiang Scholars and Innovative Research Team in University
文摘Sb-doped SnO2(ATO)-(CeO2-TiO2) thin Films were deposited on glass substrates using the mixed solution including CeO2-TiO2 precursor and ATO particles by sol-gel dip coating process.ATO particles were prepared using low-temperature hydrothermal process.The mixed molar ratio of ATO to(CeO2-TiO2) vs the properties of CeO2-TiO2 thin film was investigated.The optical properties of the films were characterized by UV-visible transmission and infrared reflection spectra,the sheet resistance of ATO particles and films were measured by rubber sheeter(MYI-50) and four-point probe(HisuperGroup Inc,SDY-5),the surface morphology and structure of the films were analyzed using 3D Digitale Mikroskop and X-ray diffraction(XRD),respectively.The results showed that the ATO precursor solution lost weight completely at about 500 oC,and the ATO particles was obtained,which indicated the same rutile lattice structure as SnO2.The glass substrates coated with ATO-(CeO2-TiO2) thin films showed better properties in antistatic electricity(104-106 Ω/),shielding UV(almost 100%),visible light transmission(70%) and infrared reflection(】30%).
基金This work was financially supported by the National Natural Science Foundation (No.10574106), the Science & Technology Plan of Guangdong Province (No.2003C105005) and the Scientific Research Foundation for the Returned Overseas Chinese Scholars of Chinese State Education Ministry (No.(2004)176).
文摘Cu2ZnSnS4 (CZTS) thin films were successfully prepared by sulfurization of ion bean sputtered precursors on soda-lime glass substrate. The single phase of stannite-type structure CZTS films were obtained as revealed in EDS and XRD analysis when the ratios of the constituents of CZTS thin films are close to stoichiometric by optimizing the conditions of precursor preparation and sulfurization. A low sheet resistivity as about 0.156 Ω·cm and a high absorption coefficient as 1×104 cm-1 were achieved in this method by Hall effect measurements and UV-VIS spectrophotometer. The optical band-gap energy of the CZTS sample is about 1.51 eV, which is very close to the optimum value for a solar-cell absorber.
基金supported by the Dalian Foundation for Development of Science and Technology (No.2006A13GX029)
文摘TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction（XRD）,atomic force microscopy（AFM） and ultraviolet spectrophotometer,respectively.The results indicated that working pressure was the key deposition parameter in？uencing the TiO2 film phase composition at room temperature,which directly affected its photocatalytic activity.With increasing working pressure,the target self-bias decreases monotonously.Therefore,low temperature TiO2 phase（anatase） could be deposited with high working pressure.The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution,which the degradation rate reached the maximum（35%） after irradiation by ultraviolet light for 1 h.
文摘CuIn（S,Se）2 thin films were prepared by thermal crystallization of co-sputtered Cu-In alloy precursors in S/Se atmosphere. In-depth compositional uniformity is an important prereq- uisite for obtaining device-quality CuIn（S,Se）2 absorber thin films. In order to figure out the influence of heat treatments on in-depth composition uniformity of CuIn（S,Se）2 thin films, two kinds of reaction temperature profiles were investigated. One process is ＂one step profile＂, referring to formation of CuIn（S,Se）2 thin films just at elevated temperature （e.g. 500 ℃）. The other is ＂two step profile＂, which allows for slow diffusion of S and Se elements into the alloy precursors at a low temperature before the formation and re-crystallization of CuIn（S,Se）2 thin films at higher temperature （e.g. first 250 ℃ then 500 ℃）. X-ray diffrac- tion studies reveal that there is a discrepancy in the shape of （112） peak. Samples annealed with ＂one step profile＂ have splits on （112） peaks, while samples annealed with ＂two step profile＂ have relatively symmetrical （112） peaks. Grazing incident X-ray diffraction and en- ergy dispersive spectrum measurements of samples successively etched in bromine methanol show that CuIn（S,Se）2 thin films have better in-depth composition uniformity after ＂two step profile＂ annealing. The reaction mechanism during the two thermal processing was also investigated by X-ray diffraction and Raman spectra.
基金Supported by the National Natural Science Foundation of China(No.61264004)the Special Fund for International Cooperation of the Ministry of Science and Technology of China(No.2008DFA52210)+5 种基金the Key Sci-Tech Research Project of Guizhou Province of China(No.20113015)the Special Fund for Construction of Sci-Tech Innovative Talents Team of Guizhou Province of China(No.20114002)the Fund for International Sci-Tech Cooperation of Guizhou Province of China(No.20127004)the National Natural Science Foundation of Guizhou Province of China(No.20112323)the Young Talents Training Project of Guizhou Province of China(No.2012152)the Introducing Talents Foundation for the Doctor of Guizhou University of China(No.2010032)
文摘Mg films of various thicknesses were deposited on Si（111） substrates at room temperature by resistive thermal evaporation method, and then the Mg/Si samples were annealed at 40 ℃ for 4 h. The effects of Mg film thickness on the formation and structure of Mg2Si films were investigated. The results showed that the crystallization quality of Mg2Si films was strongly influenced by the thickness of Mg film. The XRD peak intensity of Mg2Si （220） gradually increased initially and then decreased with increasing Mg film thickness. The XRD peak intensity of Mg2Si （220） reached its maximum when the Mg film of 380 um was used. The thickness of the Mg2Si film annealed at 400℃ for 4 h was approximately 3 times of the Mg film.
基金Project(cstc2011jj A50008)supported by the Natural Science Foundation of Chongqing,ChinaProject(14ZB0025)supported by Education Department of Sichuan Province,China
文摘Zn-doped TiO2 (Zn?TiO2) thin films were prepared by the sol?gel method on titanium substrates with heat treatment at different temperatures. The effects of heat treatment temperatures and Zn doping on the structure, photocathodic protection and photoelectrochemical properties of TiO2 thin films were investigated. It is indicated that the photoelectrical performance of the Zn?TiO2 films is enhanced with the addition of Zn element compared with the pure-TiO2 film and the largest decline by 897 mV in the electrode potential is achieved under 300 °C heat treatment. SEM?EDS analyses show that Zn element is unevenly distributed in Zn?TiO2 films; XRD patterns reveal that the grain size of Zn?TiO2 is smaller than that of pure-TiO2; FTIR results indicate that Zn - O bond forms on Zn?TiO2 surface. Ultraviolet visible absorption spectra prove that Zn?TiO2 shifts to visible light region.Mott?Shottky curves show that the flat-band potential of Zn?TiO2 is more negative and charge carrier density is bigger than that ofpure-TiO2, implying that under the synergy of the width of the space-charge layer, carrier density and flat-band potential, Zn?TiO2 with 300 °C heat treatment displays the best photocathodic protection performance.
文摘CUIn1-xGaxSe2 （CIGS） films were prepared by a two-stage method, in which Cu-In-Ga metallic precursors were firstly deposited on unheated Mo-coated soda lime glass substrates by direct current sputtering CuGa （20%Ga） and radio frequency sputtering In targets in an Ar atmosphere, followed by selenization at 520 ℃ for 40 min in Se vapor. By adjusting the sputtering thickness ratio of surface CuGa （20%Ga） and bottom CuGa （20%Ga） alloy layers in metal precursor, different CIGS thin films were fabricated. Through X-ray diffraction spectra, Raman spectra, local energy dispersive spectrometer, planar- and cross- sectional views of scanning electron microscopy measurements, it revealed that the CIGS thin films from selenization of metal precursor with CuGa：In：CuGa thickness ratio of 7：20：3 （sample-2-se） was of chalcopyrite structure with the preferred （112） orientation, and the grains sizes ranged from 0.5 μm to 2 μm, and sample-2-se had no binary compound phase of In-Se and order defect compound phase. Consequently, the results of illuminated current- voltage curve and quantum efficiency measurements showed that the CIGS film device made from sample-2-se had relative higher photo-electric conversion efficiency （3.59%） and good spectrum response.
基金financially supported by the National Natural Science Foundation of China (No. 50902006)the National High Technology Development 863 Program of China (No. 2009AA03Z428)National Student Innovative Experiment Plan
文摘The In 2 O 3 : W (IWO) films with different W content were deposited on glass substrate using direct current sputtering method. The structure, surface morphology, and optical and electrical properties were investigated. Results showed that both the carrier concentration and carrier mobility were increased with the doping of W. The IWO film with the lowest resistivity of 1.0×10 3 cm, highest carrier mobilityof 43.7 cm 2 V 1 s 1 and carrier concentration of 1.4×10 20 cm 3 was obtained at the content of 2.8 wt.%. The average optical transmittance from 300 nm to 900 nm reached 87.6%.
文摘Nano-structured SiO2 thin films were prepared on the surface of carbon steel for the first time by LPD. The compositions of the films were analyzed by XPS, and the surface morphology of the thin films were observed by AFM. The thin films were constituted by compact particles of SiO2, and there was no Fe in the films. In the process of film forming, the SiO2 colloid particles were deposited or absorbed directly onto the surface of carbon steel substrates that were activated by acid solution containing inhibitor, and corrosion of the substrates was avoided. The nano-structured SiO2 thin films that were prepared had excellent protective efficiency to the carbon steel.
基金supported by the grants from the Nature Science Foundation of Zhejiang Province (Y406309)Research Program from Science and Technology Bureau of Jinhua City (2008-1-151)
文摘Y2O3：Er^3＋ films were prepared by a simple sol-gel process. The structural properties of Y2O3：Er^3＋ films were characterized with X-ray diffraction, Fourier transform infrared spectroscopy and field emission scanning electron microscopy. The results indicated that the Y2O3：Er^3＋ films might have high upconversion efficiency because of their low vibrational energy. Under 785 and 980 nm laser excitation, the samples showed green （^2H11/2→^4I15/2, ^4S3/2→^4I15/2） and red （^4F9/2→^4I15/2） upconversion emissions. The upconversion mechanisms were studied in detail through laser power dependence. Excited state absorption and energy transfer process were discussed as possible upconversion mechanisms. The cross relaxation process in Er^3＋ was also investigated.
