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Preparations of TiO_2 film coated on foam nickel substrate by sol-gel processes and its photocatalytic activity for degradation of acetaldehyde 被引量:11
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作者 HU Hai XIAO Wen-jun YUAN Jian SHI Jian-wei CHEN Ming-xia SHANG GUAN Wen-feng 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2007年第1期80-85,共6页
Anatase TiO2 films were successfully prepared on foam nickel substrates by sol-gel technique using tetrabutyl titanate as precursor. The characteristics of the TiO2 films were investigated by XPS, XRD, FE-SEM, TEM and... Anatase TiO2 films were successfully prepared on foam nickel substrates by sol-gel technique using tetrabutyl titanate as precursor. The characteristics of the TiO2 films were investigated by XPS, XRD, FE-SEM, TEM and UV-Vis absorption spectra. The photocatalytic activities of TiO2 films were investigated by photocatalytic degradation reactions of gaseous acetaldehyde, an indoor pollutant, under ultraviolet light irradiation. It was found that Ni^2+ doping into TiO2 films due to the foam nickel substrates resulted in the extension of absorption edges of TiO2 films from UV region to visible light region. The pre-heating for foam nickel substrates resulted in the formation of NiO layer, which prevented effectively the injection of photogenerated electrons from TiO2 films to metal nickel. The TiO2 films displayed high photocatalytic activity for the degradation of acetaldehyde, and were enhanced by calcining the substrates and coating TiO2 films repeatedly. The high activity was mainly attributed to the improvement of the characteristics of substrate surface and the increase of active sites on photocatalyst. 展开更多
关键词 PHOTOCATALYST tio2 films foam nickel SOL-GEL acetaldehyde degradation
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Zn/TiO_2/泡沫镍可见光光电催化氧化水体中As(Ⅲ)
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作者 任超艳 魏志钢 +2 位作者 潘湛昌 谢英豪 杜欣欣 《安全与环境工程》 CAS 北大核心 2014年第6期60-64,共5页
采用阴极电沉积法在泡沫镍上负载Zn掺杂TiO2,制得Zn/TiO2/泡沫镍光催化剂,利用X射线衍射仪(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)等对其进行了晶体结构、表观形貌、表面元素状态的分析,并研究了Zn/TiO2/泡沫镍在可见光照射和负偏... 采用阴极电沉积法在泡沫镍上负载Zn掺杂TiO2,制得Zn/TiO2/泡沫镍光催化剂,利用X射线衍射仪(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)等对其进行了晶体结构、表观形貌、表面元素状态的分析,并研究了Zn/TiO2/泡沫镍在可见光照射和负偏压作用下光电催化氧化水体中As(Ⅲ)的反应性能。试验结果表明:Zn成功以替代的形式进入TiO2晶体内,Zn/TiO2/泡沫镍在可见光照射和最佳偏压-0.4V作用下,光电催化氧化As(Ⅲ)的反应速率为TiO2/泡沫镍的1.5倍以上;当Zn2+掺杂量为0.52%,初始As(Ⅲ)浓度为1.0mg/L,pH值为7±0.05,光照3h,施加-0.4V偏压时,As(Ⅲ)的去除率高达92.6%,此时氧化As(Ⅲ)的主要物质为超氧自由基,超氧自由基在光照作用下进一步转化成羟基自由基氧化As(Ⅲ);负偏压同时起阴极保护作用,避免引起基材金属镍溶出,可应用于处理饮用水。 展开更多
关键词 砷污染 zn/tio2/泡沫镍 光电催化氧化 可见光 负偏压
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