化学复合镀RE Ni Mo P WC合金镀层具有良好的硬度、耐蚀、耐磨、抗氧化性能 ,但沉积速度对镀层性能有很大的影响。采用增重法研究了稀土元素、镀液温度、pH值、钼酸钠浓度对化学复合镀RE Ni Mo P WC合金镀层沉积速度的影响 ,并探讨了稀...化学复合镀RE Ni Mo P WC合金镀层具有良好的硬度、耐蚀、耐磨、抗氧化性能 ,但沉积速度对镀层性能有很大的影响。采用增重法研究了稀土元素、镀液温度、pH值、钼酸钠浓度对化学复合镀RE Ni Mo P WC合金镀层沉积速度的影响 ,并探讨了稀土元素的作用机理。结果表明 ,稀土元素的加入增大了复合镀层的沉积速度 ,其中混合稀土的作用最为明显 ;稀土元素的加入能促进反应离子在金属基体表面的吸附 ,增大阴极极化 ,改变界面双电层结构 ,从而使沉积速率加快。RE Ni Mo P WC最佳工艺条件为 :混合稀土浓度 4 g/L ,镀液温度 80℃ ,pH值 7.0～ 7 5 ,钼酸钠浓度≤ 0 .3g/L。展开更多
研究了非晶Ni Mo P沉积层的应力、成分及气孔率,它们对镀层在5%NaCl中的抗腐蚀性能的影响,同时研究了气孔、应力产生的原因。研究结果表明:在合适的Na2MoO4浓度及pH值下获得的非晶Ni Mo P沉积层具有最佳抗腐蚀性。随着镀液中Na2MoO4... 研究了非晶Ni Mo P沉积层的应力、成分及气孔率,它们对镀层在5%NaCl中的抗腐蚀性能的影响,同时研究了气孔、应力产生的原因。研究结果表明:在合适的Na2MoO4浓度及pH值下获得的非晶Ni Mo P沉积层具有最佳抗腐蚀性。随着镀液中Na2MoO4含量的增加,镀层应力很快从压应力向拉应力转变,镀层的气孔率增加。当Na2MoO4浓度大约为0.05g/L时,容易获得低孔隙率、低应力的非晶镀层。镀层气孔率、应力增加,镀层的耐蚀性显著降低。试样的长期腐蚀抵抗主要取决于镀层的应力,短期腐蚀抵抗则取决于镀层的气孔率。镀层具有低应力无气孔时,非晶镀层中Mo的含量越高,镀层在5%NaCl中的抗腐蚀性越好,而P含量的变化对镀层抗腐蚀性能无明显影响。镀层的应力采用X射线应力仪测定,并通过观察试样在5%HCl中浸泡25d后的外观进一步验证。采用浸泡腐蚀测试、硝酸变黑腐蚀测试、气孔率贴滤纸测试及电化学腐蚀测试技术对比研究了沉积层的腐蚀行为。展开更多
对不同热处理温度与Ni Mo P、Ni Mo P/Al2O3及Ni Mo P/PPS合金镀层的耐蚀性的影响进行了对比;并对Ni Mo P/PPS镀层进行表面复合涂敷,观察了涂敷层的截面的形貌并测定其耐蚀性。结果表明,Ni Mo P/PPS镀层具有良好的耐蚀性,在85℃的腐蚀...对不同热处理温度与Ni Mo P、Ni Mo P/Al2O3及Ni Mo P/PPS合金镀层的耐蚀性的影响进行了对比;并对Ni Mo P/PPS镀层进行表面复合涂敷,观察了涂敷层的截面的形貌并测定其耐蚀性。结果表明,Ni Mo P/PPS镀层具有良好的耐蚀性,在85℃的腐蚀速率为Ni Mo P镀层的1/3;与化学镀层相比,复合涂敷层具有极其良好的耐蚀性,涂敷层与镀层之间结合致密、无间隙。展开更多
The diffusion barrier Ni-Mo-P film for Cu interconnects was prepared on SiO2/Si substrate using electroless method. The surface morphology and composition during the formation process of electroless Ni-Mo-P film were ...The diffusion barrier Ni-Mo-P film for Cu interconnects was prepared on SiO2/Si substrate using electroless method. The surface morphology and composition during the formation process of electroless Ni-Mo-P film were investigated through analyzing samples of different deposition time. Induced nucleation, induced co-deposition, and self-induced growth mechanisms involved in electroless process were confirmed by field-emission scanning electron microscopy （FE-SEM）, energy dispersive spectrometry and atomic force microscopy （AFM）. Firstly, the preceding palladium particles as catalysts induce the nucleation of nickel. Secondly, the nickel particles induce the deposition of molybdenum and phosphorus, which attributes to induced co-deposition. Thirdly, former deposited Ni-Mo-P induces deposition of the latter Ni-Mo-P particles. Moreover, the reaction mechanism was proposed with the oxydate of 3-4PO .展开更多
文摘化学复合镀RE Ni Mo P WC合金镀层具有良好的硬度、耐蚀、耐磨、抗氧化性能 ,但沉积速度对镀层性能有很大的影响。采用增重法研究了稀土元素、镀液温度、pH值、钼酸钠浓度对化学复合镀RE Ni Mo P WC合金镀层沉积速度的影响 ,并探讨了稀土元素的作用机理。结果表明 ,稀土元素的加入增大了复合镀层的沉积速度 ,其中混合稀土的作用最为明显 ;稀土元素的加入能促进反应离子在金属基体表面的吸附 ,增大阴极极化 ,改变界面双电层结构 ,从而使沉积速率加快。RE Ni Mo P WC最佳工艺条件为 :混合稀土浓度 4 g/L ,镀液温度 80℃ ,pH值 7.0～ 7 5 ,钼酸钠浓度≤ 0 .3g/L。
文摘 研究了非晶Ni Mo P沉积层的应力、成分及气孔率,它们对镀层在5%NaCl中的抗腐蚀性能的影响,同时研究了气孔、应力产生的原因。研究结果表明:在合适的Na2MoO4浓度及pH值下获得的非晶Ni Mo P沉积层具有最佳抗腐蚀性。随着镀液中Na2MoO4含量的增加,镀层应力很快从压应力向拉应力转变,镀层的气孔率增加。当Na2MoO4浓度大约为0.05g/L时,容易获得低孔隙率、低应力的非晶镀层。镀层气孔率、应力增加,镀层的耐蚀性显著降低。试样的长期腐蚀抵抗主要取决于镀层的应力,短期腐蚀抵抗则取决于镀层的气孔率。镀层具有低应力无气孔时,非晶镀层中Mo的含量越高,镀层在5%NaCl中的抗腐蚀性越好,而P含量的变化对镀层抗腐蚀性能无明显影响。镀层的应力采用X射线应力仪测定,并通过观察试样在5%HCl中浸泡25d后的外观进一步验证。采用浸泡腐蚀测试、硝酸变黑腐蚀测试、气孔率贴滤纸测试及电化学腐蚀测试技术对比研究了沉积层的腐蚀行为。
文摘对不同热处理温度与Ni Mo P、Ni Mo P/Al2O3及Ni Mo P/PPS合金镀层的耐蚀性的影响进行了对比;并对Ni Mo P/PPS镀层进行表面复合涂敷,观察了涂敷层的截面的形貌并测定其耐蚀性。结果表明,Ni Mo P/PPS镀层具有良好的耐蚀性,在85℃的腐蚀速率为Ni Mo P镀层的1/3;与化学镀层相比,复合涂敷层具有极其良好的耐蚀性,涂敷层与镀层之间结合致密、无间隙。
文摘The diffusion barrier Ni-Mo-P film for Cu interconnects was prepared on SiO2/Si substrate using electroless method. The surface morphology and composition during the formation process of electroless Ni-Mo-P film were investigated through analyzing samples of different deposition time. Induced nucleation, induced co-deposition, and self-induced growth mechanisms involved in electroless process were confirmed by field-emission scanning electron microscopy （FE-SEM）, energy dispersive spectrometry and atomic force microscopy （AFM）. Firstly, the preceding palladium particles as catalysts induce the nucleation of nickel. Secondly, the nickel particles induce the deposition of molybdenum and phosphorus, which attributes to induced co-deposition. Thirdly, former deposited Ni-Mo-P induces deposition of the latter Ni-Mo-P particles. Moreover, the reaction mechanism was proposed with the oxydate of 3-4PO .
