The analytical model of voltage-controlled MOS capacitance of tapered through silicon via （TSV） is derived. To capture the frequency-dependent behavior of tapered TSV, the conventional analytical equations of RLCG f...The analytical model of voltage-controlled MOS capacitance of tapered through silicon via （TSV） is derived. To capture the frequency-dependent behavior of tapered TSV, the conventional analytical equations of RLCG for two-wire transmission lines are revised. With the adoption of MOS capacitance model and the revised RLCG analytical equations, a transmission line-type electrical model for tapered TSV is proposed finally. All the proposed models are validated by simulation tools, and a good correlation is obtained between the proposed models and simulations up to 100 GHz. With the proposed model, both the semiconductor phenomenon and frequency- dependent behavior of tapered TSV can be fully captured at high frequency, and the performance of tapered TSV can be evaluated accurately and conveniently prior to 3D IC design.展开更多
The fundamental momentum conservation requirement q - 0 for the Raman process is relaxed in the nanocrystal- lites （NCs）, and phonons away from the Brillouin-zone center will be involved in the Raman scattering, whi...The fundamental momentum conservation requirement q - 0 for the Raman process is relaxed in the nanocrystal- lites （NCs）, and phonons away from the Brillouin-zone center will be involved in the Raman scattering, which is well-known as the phonon confinement effect in NCs. This usually gives a downshift and asymmetric broadening of the Raman peak in various NCs. Recently, the A1 mode of 1L MoS2 NCs is found to exhibit a blue shift and asymmetric broadening toward the high-frequency side [Chem. Soc. Rev. 44 （2015） 2757 and Phys. Rev. B 91 （2015） 195411]. In this work, we carefully check this issue by studying Raman spectra of lL MoS2 NCs prepared by the ion implantation technique in a wide range of ion-implanted dosage. The same confinement coefficient is used for both E＇ and A＇1 modes in 1L MoS2 NCs since the phonon uncertainty in an NC is mainly determined by its domain size. The asymmetrical broadening near the A＇1 and E＇ modes is attributed to the appearance of defect-activated phonons at the zone edge and the intrinsic asymmetrical broadening of the two modes, where the anisotropy of phonon dispersion curves along Г-K and Г- M is also considered. The photoluminescence spectra confirm the formation of small domain size of 1L MoS2 nanocrystallites in the ion-implanted 1L MoS2. This study provides not only an approach to quickly probe phonon dispersion trends of 2D materials away from Г by the Raman scattering of the corresponding NCs, but also a reference to completely understand the confinement effect of different modes in various nanomaterials.展开更多
A two-dimensional electrical SiC MOS interface model including interface and near-interface traps is established based on the relevant tunneling and interface Shockley–Read–Hall model. The consistency between simula...A two-dimensional electrical SiC MOS interface model including interface and near-interface traps is established based on the relevant tunneling and interface Shockley–Read–Hall model. The consistency between simulation results and measured data in the different temperatures shows that this interface model can accurately describe the capture and emission performance for near-interface oxide traps, and can well explain the hysteresis-voltage response with increasing temperature, which is intensified by the interaction between deep oxide traps and shallow oxide traps. This also indicates that the near-interface traps result in an increase of threshold-voltage shift in SiC MOSFET with increasing temperature.展开更多
The mechanism of improving the TID radiation hardened ability of partially depleted silicon-oninsulator（SOI） devices by using the back-gate phosphorus ion implantation technology is studied. The electron traps intro...The mechanism of improving the TID radiation hardened ability of partially depleted silicon-oninsulator（SOI） devices by using the back-gate phosphorus ion implantation technology is studied. The electron traps introduced in Si O2 near back Si O2/Si interface by phosphorus ions implantation can offset positive trapped charges near the back-gate interface. The implanted high concentration phosphorus ions can greatly reduce the back-gate effect of a partially depleted SOI NMOS device, and anti-total-dose radiation ability can reach the level of 1 Mrad（Si） for experimental devices.展开更多
Recently,two-dimensional materials have been attracting increasing attention because of their novel properties and promising applications.However,the impurity doping remains a significant challenge owing to the lack o...Recently,two-dimensional materials have been attracting increasing attention because of their novel properties and promising applications.However,the impurity doping remains a significant challenge owing to the lack of the doping strategy in the atomically thin layers.Here we report on the chromium（Cr） and manganese（Mn）doping in atomically-thin MoS_2 crystals grown by chemical vapor deposition.The Cr/Mn doped MoS_2 samples are characterized by a peak at 1.76 and 1.79 eV in photoluminescence spectra,respectively,compared with the undoped one at 1.85 eV.The field-effect transistor（FET） devices based on the Mn doping show a higher threshold voltage than that of the pure MoS_2 while the Cr doping exhibits the opposite behavior.Importantly,the carrier concentration in these samples displays a remarkable difference arising from the doping effect,consistent with the evolution of the FET performance.The temperature-dependent conductivity measurements further demonstrate a large variation in activation energy.The successful incorporation of the Mn and Cr impurities into the monolayer MoS_2 paves the way towards the high Curie temperature two-dimensional dilute magnetic semiconductors.展开更多
基金Project supported by the National Defense Basic Scientific Research Program of China(No.A0320132012)
文摘The analytical model of voltage-controlled MOS capacitance of tapered through silicon via （TSV） is derived. To capture the frequency-dependent behavior of tapered TSV, the conventional analytical equations of RLCG for two-wire transmission lines are revised. With the adoption of MOS capacitance model and the revised RLCG analytical equations, a transmission line-type electrical model for tapered TSV is proposed finally. All the proposed models are validated by simulation tools, and a good correlation is obtained between the proposed models and simulations up to 100 GHz. With the proposed model, both the semiconductor phenomenon and frequency- dependent behavior of tapered TSV can be fully captured at high frequency, and the performance of tapered TSV can be evaluated accurately and conveniently prior to 3D IC design.
基金Supported by the National Natural Science Foundation of China under Grant Nos 11225421,11474277,11434010 and 11574305the National Young 1000 Talent Plan
文摘The fundamental momentum conservation requirement q - 0 for the Raman process is relaxed in the nanocrystal- lites （NCs）, and phonons away from the Brillouin-zone center will be involved in the Raman scattering, which is well-known as the phonon confinement effect in NCs. This usually gives a downshift and asymmetric broadening of the Raman peak in various NCs. Recently, the A1 mode of 1L MoS2 NCs is found to exhibit a blue shift and asymmetric broadening toward the high-frequency side [Chem. Soc. Rev. 44 （2015） 2757 and Phys. Rev. B 91 （2015） 195411]. In this work, we carefully check this issue by studying Raman spectra of lL MoS2 NCs prepared by the ion implantation technique in a wide range of ion-implanted dosage. The same confinement coefficient is used for both E＇ and A＇1 modes in 1L MoS2 NCs since the phonon uncertainty in an NC is mainly determined by its domain size. The asymmetrical broadening near the A＇1 and E＇ modes is attributed to the appearance of defect-activated phonons at the zone edge and the intrinsic asymmetrical broadening of the two modes, where the anisotropy of phonon dispersion curves along Г-K and Г- M is also considered. The photoluminescence spectra confirm the formation of small domain size of 1L MoS2 nanocrystallites in the ion-implanted 1L MoS2. This study provides not only an approach to quickly probe phonon dispersion trends of 2D materials away from Г by the Raman scattering of the corresponding NCs, but also a reference to completely understand the confinement effect of different modes in various nanomaterials.
基金Supported by the Science Challenge Project under Grant No TZ2018003
文摘A two-dimensional electrical SiC MOS interface model including interface and near-interface traps is established based on the relevant tunneling and interface Shockley–Read–Hall model. The consistency between simulation results and measured data in the different temperatures shows that this interface model can accurately describe the capture and emission performance for near-interface oxide traps, and can well explain the hysteresis-voltage response with increasing temperature, which is intensified by the interaction between deep oxide traps and shallow oxide traps. This also indicates that the near-interface traps result in an increase of threshold-voltage shift in SiC MOSFET with increasing temperature.
基金Project supported by the Major Fund for the National Science and Technology Program,China(No.2009ZX02306-04)the Fund of SOI Research and Development Center(No.20106250XXX)
文摘The mechanism of improving the TID radiation hardened ability of partially depleted silicon-oninsulator（SOI） devices by using the back-gate phosphorus ion implantation technology is studied. The electron traps introduced in Si O2 near back Si O2/Si interface by phosphorus ions implantation can offset positive trapped charges near the back-gate interface. The implanted high concentration phosphorus ions can greatly reduce the back-gate effect of a partially depleted SOI NMOS device, and anti-total-dose radiation ability can reach the level of 1 Mrad（Si） for experimental devices.
基金Project supported by the National Young 1000 Talent Planthe Pujiang Talent Plan in Shanghai+1 种基金the National Natural Science Foundation of China(Nos.61322407,11474058,61674040)the Chinese National Science Fund for Talent Training in Basic Science(No.J1103204)
文摘Recently,two-dimensional materials have been attracting increasing attention because of their novel properties and promising applications.However,the impurity doping remains a significant challenge owing to the lack of the doping strategy in the atomically thin layers.Here we report on the chromium（Cr） and manganese（Mn）doping in atomically-thin MoS_2 crystals grown by chemical vapor deposition.The Cr/Mn doped MoS_2 samples are characterized by a peak at 1.76 and 1.79 eV in photoluminescence spectra,respectively,compared with the undoped one at 1.85 eV.The field-effect transistor（FET） devices based on the Mn doping show a higher threshold voltage than that of the pure MoS_2 while the Cr doping exhibits the opposite behavior.Importantly,the carrier concentration in these samples displays a remarkable difference arising from the doping effect,consistent with the evolution of the FET performance.The temperature-dependent conductivity measurements further demonstrate a large variation in activation energy.The successful incorporation of the Mn and Cr impurities into the monolayer MoS_2 paves the way towards the high Curie temperature two-dimensional dilute magnetic semiconductors.
