Optical proximity correction (OPC) systems require an accurate and fast way to predict how patterns will be transferred to the wafer.Based on Gabor's 'reduction to principal waves',a partially coherent ima...Optical proximity correction (OPC) systems require an accurate and fast way to predict how patterns will be transferred to the wafer.Based on Gabor's 'reduction to principal waves',a partially coherent imaging system can be represented as a superposition of coherent imaging systems,so an accurate and fast sparse aerial image intensity calculation algorithm for lithography simulation is presented based on convolution kernels,which also include simulating the lateral diffusion and some mask processing effects via Gaussian filter.The simplicity of this model leads to substantial computational and analytical benefits.Efficiency of this method is also shown through simulation results.展开更多
SU-8 thick resist lithography has become the mainstream technology for structures with high aspect ratio in the micro-electro-mechanical system(MEMS)and integrated circuits(ICs).So as to replace ex pensive and time-co...SU-8 thick resist lithography has become the mainstream technology for structures with high aspect ratio in the micro-electro-mechanical system(MEMS)and integrated circuits(ICs).So as to replace ex pensive and time-consuming lithographic experiments,lithography simulation becomes an increasingly valuable tool for predicting results and optimizing manufacture process.A three-dimensional(3D)lithography simula tion model is developed for the ultraviolet(UV)process of SU-8 resist.The model utilizes waveguide(WG)method based on rigorous electromagnetic field theory,which is more comprehensive than its two-dimension counterparts.Using this model,the light intensity distribution and morphology of photoresist after develop ment process can be stereoscopically predicted.A series of simulations and experiments have been conducted to verify the validity of the model.The study is carried out on SU-8 under UV source with 365 nm and 2.6 mW/cm^2.Simulation results are given by cross section image and stereogram combined with corresponding experi mental outcome.The results confirm the validity faster than other methods and remains accurate.of the simulation model and prove that the 3D hybrid model is faster than other methods and remains accurate.展开更多
文摘Optical proximity correction (OPC) systems require an accurate and fast way to predict how patterns will be transferred to the wafer.Based on Gabor's 'reduction to principal waves',a partially coherent imaging system can be represented as a superposition of coherent imaging systems,so an accurate and fast sparse aerial image intensity calculation algorithm for lithography simulation is presented based on convolution kernels,which also include simulating the lateral diffusion and some mask processing effects via Gaussian filter.The simplicity of this model leads to substantial computational and analytical benefits.Efficiency of this method is also shown through simulation results.
基金supported by the Natural Science Foundation in Jiangsu Province(BK2012324)
文摘SU-8 thick resist lithography has become the mainstream technology for structures with high aspect ratio in the micro-electro-mechanical system(MEMS)and integrated circuits(ICs).So as to replace ex pensive and time-consuming lithographic experiments,lithography simulation becomes an increasingly valuable tool for predicting results and optimizing manufacture process.A three-dimensional(3D)lithography simula tion model is developed for the ultraviolet(UV)process of SU-8 resist.The model utilizes waveguide(WG)method based on rigorous electromagnetic field theory,which is more comprehensive than its two-dimension counterparts.Using this model,the light intensity distribution and morphology of photoresist after develop ment process can be stereoscopically predicted.A series of simulations and experiments have been conducted to verify the validity of the model.The study is carried out on SU-8 under UV source with 365 nm and 2.6 mW/cm^2.Simulation results are given by cross section image and stereogram combined with corresponding experi mental outcome.The results confirm the validity faster than other methods and remains accurate.of the simulation model and prove that the 3D hybrid model is faster than other methods and remains accurate.
