Type-II Dirac semimetal PtTe2is a promising candidate for various electronic device applications due to its high carrier mobility,high conductivity,and air stability.In this work,we report on the growth of large-scale...Type-II Dirac semimetal PtTe2is a promising candidate for various electronic device applications due to its high carrier mobility,high conductivity,and air stability.In this work,we report on the growth of large-scale PtTe_(2)films by the pulsed laser deposition(PLD)and the comparison of the magnetotransport properties with the PtTe2films grown by the chemical vapor deposition(CVD).The low-temperature Hall curves of the PLD-grown films exhibit a linear behavior,in contrast with the nonlinear characteristic of the Hall behavior observed in CVD-grown films,in which a defect gradient is introduced.Meanwhile,both PtTe2films show weak antilocalization at low temperatures,which is attributed to the strong spin–orbit coupling.展开更多
Nickel oxide(NiO)based gas sensors have at-tracted intense attention due to its high re-sponse to hydrogen sulfide(H_(2)S)gas.It has been demonstrated that the NiO sensors with exposed(111)facet exhibit excellent perf...Nickel oxide(NiO)based gas sensors have at-tracted intense attention due to its high re-sponse to hydrogen sulfide(H_(2)S)gas.It has been demonstrated that the NiO sensors with exposed(111)facet exhibit excellent perfor-mance,but the single-orientation NiO sensors with exposed(111)facet have rarely been studied.In this work,high quality(111)-ori-ented NiO epitaxial films were fabricated by pulsed laser deposition.Detailed crystalline structural information was revealed by using synchrotron based X-ray diffraction(XRD)technology.These NiO thin films show good se-lectivity for H_(2)S gas detection.Without further modification,the highest response to 100 ppm H_(2)S was measured to be 13.07 at 300℃,and limit of detection(LOD)could be as low as 186 ppb.Fitting of the electrical response curves during adsorption and desorption of H_(2)S gas indicates the two-site Langmuir kinetic processes.Combining with XPS and XAS measure-ments,the mechanism was discussed.Density functional theory(DFT)calculations show that NiO with exposed(111)facets has the most negative adsorption energy,indicating more sen-sitive to H_(2)S.These results could inspire more studies of metal oxide semiconductor-based gas sensors with specific surface.展开更多
Bi_(2)Se_(3)-based flexible thin film with high thermoelectric performance is promising for the waste heat recovery technology.In this work,a novel post-selenization method is employed to prepare n-type Bi_(2)Se_(3)fl...Bi_(2)Se_(3)-based flexible thin film with high thermoelectric performance is promising for the waste heat recovery technology.In this work,a novel post-selenization method is employed to prepare n-type Bi_(2)Se_(3)flexible thin films with highly textured structure.The strengthened texture and Se vacancy optimization can be simultaneously achieved by optimizing the selenization temperature.The highly oriented texture leads to the increased carrier mobility and results in a high electric conductivity of~290.47 S·cm^(-1)at 623 K.Correspondingly,a high Seebeck coefficient(>110μW·K-1)is obtained due to the reduced carrier concentration,induced by optimizing vacancy engineering.Consequently,a high power factor of 3.49μW·cm^(-1)·K^(-2)at 623 K has been achieved in asprepared highly-bendable Bi_(2)Se_(3)flexible thin films selenized at 783 K.This study introduces an effective post-selenization method to tune the texture structure and vacancies of Bi_(2)Se_(3)flexible thin films,and correspondingly achieves high thermoelectric performance.展开更多
With the intensification of lunar exploration,the failure risk caused by the adsorption of lunar dust on the spacecraft surface cannot be ignored.Therefore,three types of typical spatial solid lubrication films,namely...With the intensification of lunar exploration,the failure risk caused by the adsorption of lunar dust on the spacecraft surface cannot be ignored.Therefore,three types of typical spatial solid lubrication films,namely polytetrafluoroethylene(PTFE),amorphous carbon(a-C)and molybdenum disulfide(MoS2),were prepared as test samples.Firstly,the surface free energy parameters of the material were measured using a contact Angle measuring instrument.At the same time,atomic force microscopy(AFM)was used to quantify the adhesion of the film samples based on the lunar dust micro-adsorption model.In order to investigate the influence of the test environment,the environmental pressure was adjusted to normal pressure environment and high vacuum environment with a vacuum degree of 10−6 Pa for testing.The results indicate a positive correlation between surface energy and adhesion.As surface energy increases,molecules tend to move closer,forming a stronger attraction and thus enhancing surface adhesion.In addition,AFM was used to measure the adhesion force under atmospheric pressure and vacuum conditions,revealing that parameters measured in atmospheric environment were generally higher than those measured in vacuum,which effectively verified the existence of capillary force in the microscopic adsorption model and its influence on the adhesion effect.Through the test comparison of three groups of typical solid lubricating films,it is found that MoS2 has a lower adhesion effect than the other two groups of films,which can effectively reduce the adhesion phenomenon of lunar dust on the surface of the material,and provide suitable materials for future lunar exploration and manned lunar missions.展开更多
Optimizing the orientation of β-Ga_(2)O_(3) has emerged as an effective strategy to design high-performance β-Ga_(2)O_(3) device,but the orientation growth mechanism and approach have not been revealed yet.Herein,by...Optimizing the orientation of β-Ga_(2)O_(3) has emerged as an effective strategy to design high-performance β-Ga_(2)O_(3) device,but the orientation growth mechanism and approach have not been revealed yet.Herein,by employing AlN buffer layer,the highly preferred orientation of β-Ga_(2)O_(3)(100)film rather than(-201)film is realized on 4H-SiC substrate at low sputtering power and temperature.Because β-Ga_(2)O_(3)(100)film exhibits a slower growth speed than(-201)film,the former possesses the higher dangling bond density and the lower nucleation energy,and a large conversion barrier exists between these two ori-entations.Moreover,the AlN buffer layer can suppress the surface oxidation of the 4H-SiC substrate and eliminate the strain of β-Ga_(2)O_(3)(100)film,which further reduces the nucleation energy and en-larges the conversion barrier.Meanwhile,the AlN buffer layer can increase the oxygen vacancy formation energy and decrease the oxygen vacancy concentration of β-Ga_(2)O_(3)(100)film.Consequently,the solar-blind photodetector based on the oriented film exhibits the outstanding detectivity of 1.22×10^(12) Jones and photo-to-dark current ratio of 1.11×10^(5),which are the highest among the reported β-Ga_(2)O_(3) solar-blind photodetector on the SiC substrate.Our results offer in-depth insights into the preferred orientation growth mechanism,and provide an effective way to design high-quality β-Ga_(2)O_(3)(100)orientation film and high-performance solar-blind photodetector.展开更多
Innovative use of HfO_(2)-based high-dielectric-permittivity materials could enable their integration into few-nanometre-scale devices for storing substantial quantities of electrical charges,which have received wides...Innovative use of HfO_(2)-based high-dielectric-permittivity materials could enable their integration into few-nanometre-scale devices for storing substantial quantities of electrical charges,which have received widespread applications in high-storage-density dynamic random access memory and energy-efficient complementary metal-oxide-semiconductor devices.During bipolar high electric-field cycling in numbers close to dielectric breakdown,the dielectric permittivity suddenly increases by 30 times after oxygen-vacancy ordering and ferroelectric-to-nonferroelectric phase transition of near-edge plasma-treated Hf_(0.5)Zr_(0.5)O_(2) thin-film capacitors.Here we report a much higher dielectric permittivity of 1466 during downscaling of the capacitor into the diameter of 3.85μm when the ferroelectricity suddenly disappears without high-field cycling.The stored charge density is as high as 183μC cm^(−2) at an operating voltage/time of 1.2 V/50 ns at cycle numbers of more than 10^(12) without inducing dielectric breakdown.The study of synchrotron X-ray micro-diffraction patterns show missing of a mixed tetragonal phase.The image of electron energy loss spectroscopy shows the preferred oxygen-vacancy accumulation at the regions near top/bottom electrodes as well as grain boundaries.The ultrahigh dielectric-permittivity material enables high-density integration of extremely scaled logic and memory devices in the future.展开更多
The pressing demand for ultrathin and flexible shields to counter electromagnetic interference(EMI)has sparked interest in Ti_(3)C_(2)T_(x)MXene materials due to their exceptional electrical conductivity,tunable surfa...The pressing demand for ultrathin and flexible shields to counter electromagnetic interference(EMI)has sparked interest in Ti_(3)C_(2)T_(x)MXene materials due to their exceptional electrical conductivity,tunable surface chemistry,and layered structure.However,pure Ti_(3)C_(2)T_(x)MXene films often lack the mechanical properties required for practical engineering applications,and traditional reinforcement methods tend to reduce electrical conductivity.This work demonstrates an effective strategy to enhance the alignment and densely packed layered structure of Ti_(3)C_(2)T_(x)MXene films by regulating the acidity and alkalinity of Ti_(3)C_(2)T_(x)MXene aqueous solutions.This approach simultaneously improves mechanical strength and electromagnetic interference shielding effectiveness(EMI SE).Compared with original Ti_(3)C_(2)T_(x)MXene films,MXene films modified with ammonia solution(NH_(3)·H_(2)O)via OH-show a significant improvement in tensile strength(27.7±1.9 MPa).Meanwhile,MXene films treated with hydrochloric acid(HCl)via H^(+)reach an even higher tensile strength of 39±1.5 MPa.Moreover,the EMI SE values of the treated MXene films increase significantly,each reaching 66.2 and 58.4 dB.The maximum improvements in EMI SE values for the acid-and alkali-treated samples are 17.9%and 4%,respectively.In conclusion,the simultaneous enhancement of mechanical strength and EMI shielding efficacy highlights the potential of acid-and alkali-treated Ti_(3)C_(2)T_(x)MXene films for applications in ultrathin and flexible EMI shielding materials.展开更多
In this work,flexible photothermal PVA/Ti_(2)O_(3) composite films with different amount(0 wt%,5 wt%,10 wt%,15 wt%)of Ti_(2)O_(3) particles modified by steric acid were prepared by a simple solution casting method.The...In this work,flexible photothermal PVA/Ti_(2)O_(3) composite films with different amount(0 wt%,5 wt%,10 wt%,15 wt%)of Ti_(2)O_(3) particles modified by steric acid were prepared by a simple solution casting method.The microstructures,XRD patterns,FTIR spectra,UV-Vis-NIR spectra thermo-conductivity,thermo-stability and photothermal effects of these composite films were all characterized.These results indicated that Ti_(2)O_(3) particles were well dispersed throughout the polyvinyl alcohol(PVA)matrix in the PVA/Ti_(2)O_(3) composite films.And Ti_(2)O_(3) particles could also effectively improve the photothermal properties of the composite films which exhibited high light absorption and generated a high temperature(about 57.4℃for film with 15 wt%Ti_(2)O_(3) amount)on the surface when it was irradiated by a simulated sunlight source(1 kW/m^(2)).展开更多
The structure–property relationship at interfaces is difficult to probe for thermoelectric materials with a complex interfacial microstructure.Designing thermoelectric materials with a simple,structurally-uniform int...The structure–property relationship at interfaces is difficult to probe for thermoelectric materials with a complex interfacial microstructure.Designing thermoelectric materials with a simple,structurally-uniform interface provides a facile way to understand how these interfaces influence the transport properties.Here,we synthesized Bi_(2−x)Sb_(x)Te_(3)(x=0,0.1,0.2,0.4)nanoflakes using a hydrothermal method,and prepared Bi_(2−x)Sb_(x)Te_(3) thin films with predominantly(0001)interfaces by stacking the nanoflakes through spin coating.The influence of the annealing temperature and Sb content on the(0001)interface structure was systematically investigated at atomic scale using aberration-corrected scanning transmission electron microscopy.Annealing and Sb doping facilitate atom diffusion and migration between adjacent nanoflakes along the(0001)interface.As such it enhances interfacial connectivity and improves the electrical transport properties.Interfac reactions create new interfaces that increase the scattering and the Seebeck coefficient.Due to the simultaneous optimization of electrical conductivity and Seebeck coefficient,the maximum power factor of the Bi_(1.8)Sb_(0.2)Te_(3) nanoflake films reaches 1.72 mW m^(−1)K^(−2),which is 43%higher than that of a pure Bi_(2)Te_(3) thin film.展开更多
We report the performances of a chalcopyrite Cu(In, Ga)Se<sub>2 </sub>CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the ...We report the performances of a chalcopyrite Cu(In, Ga)Se<sub>2 </sub>CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the 1D-Solar Cell Capacitance Simulator (1D-SCAPS) software program. The new device structure is based on the CIGS layer as the absorber layer, n-Si as the high conductive layer, i-In<sub>2</sub>S<sub>3</sub>, and i-ZnO as the buffer and window layers, respectively. The optimum CIGS bandgap was determined first and used to simulate and analyze the cell performance throughout the experiment. This analysis revealed that the absorber layer’s optimum bandgap value has to be 1.4 eV to achieve maximum efficiency of 22.57%. Subsequently, output solar cell parameters were analyzed as a function of CIGS layer thickness, defect density, and the operating temperature with an optimized n-Si layer. The newly modeled device has a p-CIGS/n-Si/In<sub>2</sub>S<sub>3</sub>/Al-ZnO structure. The main objective was to improve the overall cell performance while optimizing the thickness of absorber layers, defect density, bandgap, and operating temperature with the newly employed optimized n-Si layer. The increase of absorber layer thickness from 0.2 - 2 µm showed an upward trend in the cell’s performance, while the increase of defect density and operating temperature showed a downward trend in solar cell performance. This study illustrates that the proposed cell structure shows higher cell performances and can be fabricated on the lab-scale and industrial levels.展开更多
The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical per...The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction （XRD） analysis shows that the monolayer TiB2 films exhibit （001） preferred orientation, and the preferred orientation of [Ti/TiB2], multilayered films transfers from （001） to （100） with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy （FESEM）. The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.展开更多
基金Project supported by the National Key R&D Program of China(Grant No.2022YFA1402404)the National Natural Science Foundation of China(Grant Nos.T2394473,624B2070,and 62274085)。
文摘Type-II Dirac semimetal PtTe2is a promising candidate for various electronic device applications due to its high carrier mobility,high conductivity,and air stability.In this work,we report on the growth of large-scale PtTe_(2)films by the pulsed laser deposition(PLD)and the comparison of the magnetotransport properties with the PtTe2films grown by the chemical vapor deposition(CVD).The low-temperature Hall curves of the PLD-grown films exhibit a linear behavior,in contrast with the nonlinear characteristic of the Hall behavior observed in CVD-grown films,in which a defect gradient is introduced.Meanwhile,both PtTe2films show weak antilocalization at low temperatures,which is attributed to the strong spin–orbit coupling.
基金supported by the National Key Research and Development Program of China(No.2022YFA1603902)the National Natural Science Foundation of China(No.12175235,No.62271462,and No.12004407)。
文摘Nickel oxide(NiO)based gas sensors have at-tracted intense attention due to its high re-sponse to hydrogen sulfide(H_(2)S)gas.It has been demonstrated that the NiO sensors with exposed(111)facet exhibit excellent perfor-mance,but the single-orientation NiO sensors with exposed(111)facet have rarely been studied.In this work,high quality(111)-ori-ented NiO epitaxial films were fabricated by pulsed laser deposition.Detailed crystalline structural information was revealed by using synchrotron based X-ray diffraction(XRD)technology.These NiO thin films show good se-lectivity for H_(2)S gas detection.Without further modification,the highest response to 100 ppm H_(2)S was measured to be 13.07 at 300℃,and limit of detection(LOD)could be as low as 186 ppb.Fitting of the electrical response curves during adsorption and desorption of H_(2)S gas indicates the two-site Langmuir kinetic processes.Combining with XPS and XAS measure-ments,the mechanism was discussed.Density functional theory(DFT)calculations show that NiO with exposed(111)facets has the most negative adsorption energy,indicating more sen-sitive to H_(2)S.These results could inspire more studies of metal oxide semiconductor-based gas sensors with specific surface.
基金financially supported by the Natural Science Foundations of Shandong Province(No.ZR2023ME001)the China Postdoctoral Science Foundation(No.2023M732609)+1 种基金ShangRao City of Jiangxi Province(China)(No.2022A006)Doctoral Research Initiation Fund of Weifang University(No.2023BS01)。
文摘Bi_(2)Se_(3)-based flexible thin film with high thermoelectric performance is promising for the waste heat recovery technology.In this work,a novel post-selenization method is employed to prepare n-type Bi_(2)Se_(3)flexible thin films with highly textured structure.The strengthened texture and Se vacancy optimization can be simultaneously achieved by optimizing the selenization temperature.The highly oriented texture leads to the increased carrier mobility and results in a high electric conductivity of~290.47 S·cm^(-1)at 623 K.Correspondingly,a high Seebeck coefficient(>110μW·K-1)is obtained due to the reduced carrier concentration,induced by optimizing vacancy engineering.Consequently,a high power factor of 3.49μW·cm^(-1)·K^(-2)at 623 K has been achieved in asprepared highly-bendable Bi_(2)Se_(3)flexible thin films selenized at 783 K.This study introduces an effective post-selenization method to tune the texture structure and vacancies of Bi_(2)Se_(3)flexible thin films,and correspondingly achieves high thermoelectric performance.
基金Supported by National Nature Science Foundation of China(Grant Nos.52205225,U2330202)The Foundation Project of China(Grant No.2023-JCJQ-JJ-0958).
文摘With the intensification of lunar exploration,the failure risk caused by the adsorption of lunar dust on the spacecraft surface cannot be ignored.Therefore,three types of typical spatial solid lubrication films,namely polytetrafluoroethylene(PTFE),amorphous carbon(a-C)and molybdenum disulfide(MoS2),were prepared as test samples.Firstly,the surface free energy parameters of the material were measured using a contact Angle measuring instrument.At the same time,atomic force microscopy(AFM)was used to quantify the adhesion of the film samples based on the lunar dust micro-adsorption model.In order to investigate the influence of the test environment,the environmental pressure was adjusted to normal pressure environment and high vacuum environment with a vacuum degree of 10−6 Pa for testing.The results indicate a positive correlation between surface energy and adhesion.As surface energy increases,molecules tend to move closer,forming a stronger attraction and thus enhancing surface adhesion.In addition,AFM was used to measure the adhesion force under atmospheric pressure and vacuum conditions,revealing that parameters measured in atmospheric environment were generally higher than those measured in vacuum,which effectively verified the existence of capillary force in the microscopic adsorption model and its influence on the adhesion effect.Through the test comparison of three groups of typical solid lubricating films,it is found that MoS2 has a lower adhesion effect than the other two groups of films,which can effectively reduce the adhesion phenomenon of lunar dust on the surface of the material,and provide suitable materials for future lunar exploration and manned lunar missions.
基金supported by the National Key Research and Development Program of China(No.2021YFA0715600)the National Natural Science Foundation of China(Nos.62274125,52192611)+2 种基金the Guangdong Basic and Applied Basic Research Fund(No.2023A1515030084)the Key Research and Development Program of Shaanxi Province(Grant No.2024GX-YBXM-410)the fund of the State Key Laboratory of Solidification Processing in NWPU(No.SKLSP202220).
文摘Optimizing the orientation of β-Ga_(2)O_(3) has emerged as an effective strategy to design high-performance β-Ga_(2)O_(3) device,but the orientation growth mechanism and approach have not been revealed yet.Herein,by employing AlN buffer layer,the highly preferred orientation of β-Ga_(2)O_(3)(100)film rather than(-201)film is realized on 4H-SiC substrate at low sputtering power and temperature.Because β-Ga_(2)O_(3)(100)film exhibits a slower growth speed than(-201)film,the former possesses the higher dangling bond density and the lower nucleation energy,and a large conversion barrier exists between these two ori-entations.Moreover,the AlN buffer layer can suppress the surface oxidation of the 4H-SiC substrate and eliminate the strain of β-Ga_(2)O_(3)(100)film,which further reduces the nucleation energy and en-larges the conversion barrier.Meanwhile,the AlN buffer layer can increase the oxygen vacancy formation energy and decrease the oxygen vacancy concentration of β-Ga_(2)O_(3)(100)film.Consequently,the solar-blind photodetector based on the oriented film exhibits the outstanding detectivity of 1.22×10^(12) Jones and photo-to-dark current ratio of 1.11×10^(5),which are the highest among the reported β-Ga_(2)O_(3) solar-blind photodetector on the SiC substrate.Our results offer in-depth insights into the preferred orientation growth mechanism,and provide an effective way to design high-quality β-Ga_(2)O_(3)(100)orientation film and high-performance solar-blind photodetector.
基金supported by the National Key Basic Research Program of China (2022YFA1402904)Basic Research Project of Shanghai Science and Technology Innovation Action (grant number 24CL2900900)the National Natural Science Foundation of China (grant number 61904034)
文摘Innovative use of HfO_(2)-based high-dielectric-permittivity materials could enable their integration into few-nanometre-scale devices for storing substantial quantities of electrical charges,which have received widespread applications in high-storage-density dynamic random access memory and energy-efficient complementary metal-oxide-semiconductor devices.During bipolar high electric-field cycling in numbers close to dielectric breakdown,the dielectric permittivity suddenly increases by 30 times after oxygen-vacancy ordering and ferroelectric-to-nonferroelectric phase transition of near-edge plasma-treated Hf_(0.5)Zr_(0.5)O_(2) thin-film capacitors.Here we report a much higher dielectric permittivity of 1466 during downscaling of the capacitor into the diameter of 3.85μm when the ferroelectricity suddenly disappears without high-field cycling.The stored charge density is as high as 183μC cm^(−2) at an operating voltage/time of 1.2 V/50 ns at cycle numbers of more than 10^(12) without inducing dielectric breakdown.The study of synchrotron X-ray micro-diffraction patterns show missing of a mixed tetragonal phase.The image of electron energy loss spectroscopy shows the preferred oxygen-vacancy accumulation at the regions near top/bottom electrodes as well as grain boundaries.The ultrahigh dielectric-permittivity material enables high-density integration of extremely scaled logic and memory devices in the future.
基金supported by the National Key R&D Program of China(No.2019YFA0706802)the National Natural Science Foundation of China(Nos.52273085 and 52303113)Key Scientific Research Projects of Colleges and Universities in Henan Province,China(No.24A430045).
文摘The pressing demand for ultrathin and flexible shields to counter electromagnetic interference(EMI)has sparked interest in Ti_(3)C_(2)T_(x)MXene materials due to their exceptional electrical conductivity,tunable surface chemistry,and layered structure.However,pure Ti_(3)C_(2)T_(x)MXene films often lack the mechanical properties required for practical engineering applications,and traditional reinforcement methods tend to reduce electrical conductivity.This work demonstrates an effective strategy to enhance the alignment and densely packed layered structure of Ti_(3)C_(2)T_(x)MXene films by regulating the acidity and alkalinity of Ti_(3)C_(2)T_(x)MXene aqueous solutions.This approach simultaneously improves mechanical strength and electromagnetic interference shielding effectiveness(EMI SE).Compared with original Ti_(3)C_(2)T_(x)MXene films,MXene films modified with ammonia solution(NH_(3)·H_(2)O)via OH-show a significant improvement in tensile strength(27.7±1.9 MPa).Meanwhile,MXene films treated with hydrochloric acid(HCl)via H^(+)reach an even higher tensile strength of 39±1.5 MPa.Moreover,the EMI SE values of the treated MXene films increase significantly,each reaching 66.2 and 58.4 dB.The maximum improvements in EMI SE values for the acid-and alkali-treated samples are 17.9%and 4%,respectively.In conclusion,the simultaneous enhancement of mechanical strength and EMI shielding efficacy highlights the potential of acid-and alkali-treated Ti_(3)C_(2)T_(x)MXene films for applications in ultrathin and flexible EMI shielding materials.
基金Funded by the Youth Backbone Teacher Training Plan in University of Henan Province(No.21220028)Science and Technology Research Project of Henan Province(No.242102321066)+2 种基金Natural Science Foundation of Henan Province(No.232300420312)Henan University of Technology Young Backbone Teacher Training Plan(No.21421260)the Innovation Training Program for College Students in Henan Province(No.202310463046)。
文摘In this work,flexible photothermal PVA/Ti_(2)O_(3) composite films with different amount(0 wt%,5 wt%,10 wt%,15 wt%)of Ti_(2)O_(3) particles modified by steric acid were prepared by a simple solution casting method.The microstructures,XRD patterns,FTIR spectra,UV-Vis-NIR spectra thermo-conductivity,thermo-stability and photothermal effects of these composite films were all characterized.These results indicated that Ti_(2)O_(3) particles were well dispersed throughout the polyvinyl alcohol(PVA)matrix in the PVA/Ti_(2)O_(3) composite films.And Ti_(2)O_(3) particles could also effectively improve the photothermal properties of the composite films which exhibited high light absorption and generated a high temperature(about 57.4℃for film with 15 wt%Ti_(2)O_(3) amount)on the surface when it was irradiated by a simulated sunlight source(1 kW/m^(2)).
基金supported by the National Natural Science Foundation of China(52272235)supported by the Fundamental Research Funds for the Central Universities(WUT:2021III016GX).
文摘The structure–property relationship at interfaces is difficult to probe for thermoelectric materials with a complex interfacial microstructure.Designing thermoelectric materials with a simple,structurally-uniform interface provides a facile way to understand how these interfaces influence the transport properties.Here,we synthesized Bi_(2−x)Sb_(x)Te_(3)(x=0,0.1,0.2,0.4)nanoflakes using a hydrothermal method,and prepared Bi_(2−x)Sb_(x)Te_(3) thin films with predominantly(0001)interfaces by stacking the nanoflakes through spin coating.The influence of the annealing temperature and Sb content on the(0001)interface structure was systematically investigated at atomic scale using aberration-corrected scanning transmission electron microscopy.Annealing and Sb doping facilitate atom diffusion and migration between adjacent nanoflakes along the(0001)interface.As such it enhances interfacial connectivity and improves the electrical transport properties.Interfac reactions create new interfaces that increase the scattering and the Seebeck coefficient.Due to the simultaneous optimization of electrical conductivity and Seebeck coefficient,the maximum power factor of the Bi_(1.8)Sb_(0.2)Te_(3) nanoflake films reaches 1.72 mW m^(−1)K^(−2),which is 43%higher than that of a pure Bi_(2)Te_(3) thin film.
文摘We report the performances of a chalcopyrite Cu(In, Ga)Se<sub>2 </sub>CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the 1D-Solar Cell Capacitance Simulator (1D-SCAPS) software program. The new device structure is based on the CIGS layer as the absorber layer, n-Si as the high conductive layer, i-In<sub>2</sub>S<sub>3</sub>, and i-ZnO as the buffer and window layers, respectively. The optimum CIGS bandgap was determined first and used to simulate and analyze the cell performance throughout the experiment. This analysis revealed that the absorber layer’s optimum bandgap value has to be 1.4 eV to achieve maximum efficiency of 22.57%. Subsequently, output solar cell parameters were analyzed as a function of CIGS layer thickness, defect density, and the operating temperature with an optimized n-Si layer. The newly modeled device has a p-CIGS/n-Si/In<sub>2</sub>S<sub>3</sub>/Al-ZnO structure. The main objective was to improve the overall cell performance while optimizing the thickness of absorber layers, defect density, bandgap, and operating temperature with the newly employed optimized n-Si layer. The increase of absorber layer thickness from 0.2 - 2 µm showed an upward trend in the cell’s performance, while the increase of defect density and operating temperature showed a downward trend in solar cell performance. This study illustrates that the proposed cell structure shows higher cell performances and can be fabricated on the lab-scale and industrial levels.
基金Project(51175212)supported by the National Natural Science Foundation of China
文摘The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction （XRD） analysis shows that the monolayer TiB2 films exhibit （001） preferred orientation, and the preferred orientation of [Ti/TiB2], multilayered films transfers from （001） to （100） with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy （FESEM）. The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.
