CMOS-compatible RF/microwave devices,such as filters and amplifiers,have been widely used in wireless communication systems.However,secondary-electron emission phenomena often occur in RF/microwave devices based on si...CMOS-compatible RF/microwave devices,such as filters and amplifiers,have been widely used in wireless communication systems.However,secondary-electron emission phenomena often occur in RF/microwave devices based on silicon(Si)wafers,especially in the high-frequency range.In this paper,we have studied the major factors that influence the secondary-electron yield(SEY)in commercial Si wafers with different doping concentrations.We show that the SEY is suppressed as the doping concentration increases,corresponding to a relatively short effective escape depthλ.Meanwhile,the reduced narrow band gap is beneficial in suppressing the SEY,in which the absence of a shallow energy band below the conduction band will easily capture electrons,as revealed by first-principles calculations.Thus,the new physical mechanism combined with the effective escape depth and band gap can provide useful guidance for the design of integrated RF/microwave devices based on Si wafers.展开更多
Secondary electron yield(SEY)of air-exposed metals tends to be increased because of air-formed oxide,hydrocarbon,and other contaminants.This enhances the possibility of secondary electron multipacting in high-power mi...Secondary electron yield(SEY)of air-exposed metals tends to be increased because of air-formed oxide,hydrocarbon,and other contaminants.This enhances the possibility of secondary electron multipacting in high-power microwave systems,resulting in undesirable occurrence of discharge damage.Al_(2)O_(3) coatings have been utilized as passive and protective layers on device packages to provide good environmental stability.We employed atomic layer deposition(ALD)to produce a series of uniform Al_(2)O_(3) coatings with appropriate thickness on Ag-plated aluminum alloy.The secondary electron emission characteristics and their variations during air exposure were observed.The escape depth of secondary electron needs to exceed the coating thickness to some extent in order to demonstrate SEY of metallic substrates.Based on experimental and calculated results,the maximum SEY of Ag-plated aluminum alloy had been maintained at 2.45 over 90 days of exposure without obvious degradation by applying 1 nm Al_(2)O_(3) coatings.In comparison,the peak SEY of untreated Ag-plated aluminum alloy grew from an initial 2.33 to 2.53,exceeding that of the 1 nm Al_(2)O_(3) sample.The ultra-thin ALDAl_(2)O_(3) coating substantially enhanced the SEY stability of metal materials,with good implications for the environmental dependability of spacecraft microwave components.展开更多
基金Project supported by the Administration of Science,Technology and Industry of National Defense of China (Grant No.HTKJ2021KL504001)the National Natural Science Foundation of China (Grant Nos.12004297 and 12174364)+3 种基金the China Postdoctoral Science Foundation (Grant No.2022M712507)the Fundamental Research Funds for the Central Universities (Grant No.xzy01202003)the National 111 Project of China (Grant No.B14040)the support from the Instrument Analysis Center of Xi’an Jiaotong University。
文摘CMOS-compatible RF/microwave devices,such as filters and amplifiers,have been widely used in wireless communication systems.However,secondary-electron emission phenomena often occur in RF/microwave devices based on silicon(Si)wafers,especially in the high-frequency range.In this paper,we have studied the major factors that influence the secondary-electron yield(SEY)in commercial Si wafers with different doping concentrations.We show that the SEY is suppressed as the doping concentration increases,corresponding to a relatively short effective escape depthλ.Meanwhile,the reduced narrow band gap is beneficial in suppressing the SEY,in which the absence of a shallow energy band below the conduction band will easily capture electrons,as revealed by first-principles calculations.Thus,the new physical mechanism combined with the effective escape depth and band gap can provide useful guidance for the design of integrated RF/microwave devices based on Si wafers.
基金Project supported by the Sustainedly Supported Foundation by National Key Laboratory of Science and Technology on Space Microwave(Grant No.HTKJ2023KL504001)the National Natural Science Foundation of China(Grant No.62101434).
文摘Secondary electron yield(SEY)of air-exposed metals tends to be increased because of air-formed oxide,hydrocarbon,and other contaminants.This enhances the possibility of secondary electron multipacting in high-power microwave systems,resulting in undesirable occurrence of discharge damage.Al_(2)O_(3) coatings have been utilized as passive and protective layers on device packages to provide good environmental stability.We employed atomic layer deposition(ALD)to produce a series of uniform Al_(2)O_(3) coatings with appropriate thickness on Ag-plated aluminum alloy.The secondary electron emission characteristics and their variations during air exposure were observed.The escape depth of secondary electron needs to exceed the coating thickness to some extent in order to demonstrate SEY of metallic substrates.Based on experimental and calculated results,the maximum SEY of Ag-plated aluminum alloy had been maintained at 2.45 over 90 days of exposure without obvious degradation by applying 1 nm Al_(2)O_(3) coatings.In comparison,the peak SEY of untreated Ag-plated aluminum alloy grew from an initial 2.33 to 2.53,exceeding that of the 1 nm Al_(2)O_(3) sample.The ultra-thin ALDAl_(2)O_(3) coating substantially enhanced the SEY stability of metal materials,with good implications for the environmental dependability of spacecraft microwave components.
