A new all permanent ECR (Electron Cyclotron Resonance) ion source LAPECR2 (Lanzhou All Permanent ECRIS No. 2) is now under developing in IMP. This source will be used to set up on thc IMP 400 HV (High Voltage) platfor...A new all permanent ECR (Electron Cyclotron Resonance) ion source LAPECR2 (Lanzhou All Permanent ECRIS No. 2) is now under developing in IMP. This source will be used to set up on thc IMP 400 HV (High Voltage) platform. This HV platform aims to deliver high ion beams from low charge state to very high charge state, so the rigorous requirement to this ECRIS is obvious. To satisfy this requirement, the ion source is designed to be a very large one, which has very large volumc plasma chamber, larger ECR length and mirror length, and very strong 3 -dimension magnetic field. The detail parameters, are shown in Table 1 listed below.展开更多
文摘A new all permanent ECR (Electron Cyclotron Resonance) ion source LAPECR2 (Lanzhou All Permanent ECRIS No. 2) is now under developing in IMP. This source will be used to set up on thc IMP 400 HV (High Voltage) platform. This HV platform aims to deliver high ion beams from low charge state to very high charge state, so the rigorous requirement to this ECRIS is obvious. To satisfy this requirement, the ion source is designed to be a very large one, which has very large volumc plasma chamber, larger ECR length and mirror length, and very strong 3 -dimension magnetic field. The detail parameters, are shown in Table 1 listed below.
