Helium-containing titanium films were prepared on Si substrates with various biases applied by magnetron sputtering under stable He/Ar ambiance.Rutherford backscattering and elastic recoil detection analyses are used ...Helium-containing titanium films were prepared on Si substrates with various biases applied by magnetron sputtering under stable He/Ar ambiance.Rutherford backscattering and elastic recoil detection analyses are used to measure the thickness of the He-Ti films and the helium depth profile,respectively.Experiments of x-ray diffraction and variable energy positron annihilation spectroscopy are carried out to investigate the microstructures of titanium films and the corresponding helium-related defects developed.The behavior of the implanted He,the microstructure of the He-Ti film and the formation of He-related defects all are affected by the substrate biases applied.展开更多
基金by the National Natural Science Foundation of China under Grant Nos 10775102 and 10775101.
文摘Helium-containing titanium films were prepared on Si substrates with various biases applied by magnetron sputtering under stable He/Ar ambiance.Rutherford backscattering and elastic recoil detection analyses are used to measure the thickness of the He-Ti films and the helium depth profile,respectively.Experiments of x-ray diffraction and variable energy positron annihilation spectroscopy are carried out to investigate the microstructures of titanium films and the corresponding helium-related defects developed.The behavior of the implanted He,the microstructure of the He-Ti film and the formation of He-related defects all are affected by the substrate biases applied.
