The electron stimulated desorption was used to measure the surface diffusivity of atomic deuterium on clean and boron modified Ni 3(Al, Ti)(110) surfaces. Boron dosing was performed using a solid state boron ion sourc...The electron stimulated desorption was used to measure the surface diffusivity of atomic deuterium on clean and boron modified Ni 3(Al, Ti)(110) surfaces. Boron dosing was performed using a solid state boron ion source. Earlier studies showed that boron dissociates water readily at temperatures as low as 130?K and that the resulting atomic hydrogen is bound to the surface strongly. The surface diffusion coefficient of atomic D on 0.05 monolayer boron modified surface was measured to be about 10 times smaller than that on the clean surface. This slower diffusion of atomic hydrogen may explain why boron improves the ductility of polycrystalline Ni 3Al in moist environments.展开更多
文摘The electron stimulated desorption was used to measure the surface diffusivity of atomic deuterium on clean and boron modified Ni 3(Al, Ti)(110) surfaces. Boron dosing was performed using a solid state boron ion source. Earlier studies showed that boron dissociates water readily at temperatures as low as 130?K and that the resulting atomic hydrogen is bound to the surface strongly. The surface diffusion coefficient of atomic D on 0.05 monolayer boron modified surface was measured to be about 10 times smaller than that on the clean surface. This slower diffusion of atomic hydrogen may explain why boron improves the ductility of polycrystalline Ni 3Al in moist environments.
