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Atom probe tomographic observation of hydrogen trapping at carbides/ferrite interfaces for a high strength steel 被引量:8
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作者 y.f.jiang B.Zhang +3 位作者 Y.Zhou J.Q.Wang E.-H.Han W.Ke 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2018年第8期1344-1348,共5页
A three-dimensional atom probe (3DAP) technique has been used to characterize the hydrogen dis- tribution on carbides for a high strength AISI 4140 steel. Direct evidence of H atoms trapped at the carbide/ferrite in... A three-dimensional atom probe (3DAP) technique has been used to characterize the hydrogen dis- tribution on carbides for a high strength AISI 4140 steel. Direct evidence of H atoms trapped at the carbide/ferrite interfaces has been revealed by 3DAP mapping. Hydrogen is mainly trapped on car- bide/ferrite interfaces along the grain boundaries. Slow strain rate tensile (SSRT) testing shows that the AIS14140 steel is highly sensitive to hydrogen embrittlement. The corresponding ffactographic mor- phologies of hydrogen charged specimen exhibit brittle fracture feature. Combined with these results, it is proposed that the hydrogen trapping sites present in the grain boundaries are responsible for the hydrogen-induced intergranular fracture of AISI 4140. The direct observation of hydrogen distribution contributes to a better understanding of the mechanism of hydrogen embrittlement. 展开更多
关键词 Low alloy steel TEM Interfaces Hydrogen embrittlement
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Enhanced oxidation resistance of Ce by addition of Ga and nanocrystallization
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作者 T.S.Liang y.f.jiang +3 位作者 H.Y.Li W.Wang Q.Zhang B.Zhang 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2023年第16期26-36,共11页
Ce is prone to catastrophic oxidation at room temperature and its oxidation resistance is difficult to be improved by alloying.Herein,we found that the oxidation resistance of active metal Ce can be significantly impr... Ce is prone to catastrophic oxidation at room temperature and its oxidation resistance is difficult to be improved by alloying.Herein,we found that the oxidation resistance of active metal Ce can be significantly improved by the addition of 20 at.%Ga.Focused ion beam lift-out technique and scanning transmission electron microscopy analysis disclosed that a discontinuous Ga-rich layer was generated beneath the oxide layer in the coarse-grained Ce-Ga alloy.The Ga-rich layer formed by selective oxidation of Ce acts as a diffusion barrier for Ce outward diffusion and ceases the O/M interfacial reaction when a critical concentration of Ga(75 at.%)is reached.After nanocrystallization,uniform distribution of Ga was achieved.After oxidation,a relatively continuous Ga-rich layer was formed which further enhanced the oxidation resistance.The introduction of noble elements combining with nanocrystallization may provide a novel strategy for the protection of metals with high activity and poor oxidation resistance. 展开更多
关键词 Ce-Ga alloy Oxidation resistance Diffusion barrier NANOCRYSTALLIZATION
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