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Shedding new light on the dislocation-mediated plasticity in wurtzite ZnO single crystals by photoindentation
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作者 Yan Li xufei fang +8 位作者 Eita Tochigi Yu Oshima Sena Hoshino Takazumi Tanaka Hiroto Oguri Shigenobu Ogata Yuichi Ikuhara Katsuyuki Matsunaga Atsutomo Nakamura 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2023年第25期206-216,共11页
Dislocation-mediated plasticity in inorganic semiconductors and oxides has attracted increasing research interest because of the promising mechanical and functional properties tuned by dislocations.In this study,we in... Dislocation-mediated plasticity in inorganic semiconductors and oxides has attracted increasing research interest because of the promising mechanical and functional properties tuned by dislocations.In this study,we investigated the effects of light illumination on the dislocation-mediated plasticity in hexagonal wurtzite ZnO,a representative third-generation semiconductor material.A(0001)45o off sample was specially designed to preferentially activate the basal slip on(0001)plane.Three types of nanoindentation tests were performed under four different light conditions(550 nm,334 nm,405 nm,and darkness),including low-load(60μN)pop-in tests,high-load(500μN)nanoindentation tests,and nanoindentation creep tests.The maximum shear stresses at pop-in were found to approximate the theoretical shear strength regardless of the light conditions.The activation volume at pop-ins was calculated to be larger in light than in darkness.Cross-sectional transmission electron microscope images taken from beneath the indentation imprints showed that all indentation-induced dislocations were located beneath the indentation imprint in a thin-plate shape along one basal slip plane.These indentation-induced dislocations could spread much deeper in darkness than in light,revealing the suppressive effect of light on dislocation behavior.An analytical model was adopted to estimate the elastoplastic stress field beneath the indenter.It was found that dislocation glide ceased at a higher stress level in light,indicating the increase in the Peierls barrier under light illumination.Furthermore,nanoindentation creep tests showed the suppression of both indentation depth and creep rate by light.Nanoindentation creep also yielded a larger activation volume in light than in darkness. 展开更多
关键词 Photoindentation Compound semiconductors OXIDES Crystal plasticity Dislocations
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裂纹前应力辅助晶界氧化机理的修正
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作者 xufei fang 《钢铁译文集》 2019年第1期24-27,共4页
在这项研究中,我们考虑了氧化过程中不同金属元素的扩散机制,并扩展了裂纹前应力辅助晶界氧化的应力一扩散耦合模型(Evans等,ScrMater69:79-182,2013)至更一般的情况,包括氧化过程中裂纹尖端处的向外和向内扩散。分析表明,裂纹尖端附近... 在这项研究中,我们考虑了氧化过程中不同金属元素的扩散机制,并扩展了裂纹前应力辅助晶界氧化的应力一扩散耦合模型(Evans等,ScrMater69:79-182,2013)至更一般的情况,包括氧化过程中裂纹尖端处的向外和向内扩散。分析表明,裂纹尖端附近的氧化物成形而产生的相变应力原则上可以促进Cr2O3氧化物在入侵方向裂纹尖端的生长,但对NiO氧化物没有增强作用。 展开更多
关键词 氧化 应力扩散 晶界扩散 断裂 应力一扩散耦合
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