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Visible-to-near-infrared photodetectors based on SnS/SnSe_(2)and SnSe/SnSe_(2)p−n heterostructures with a fast response speed and high normalized detectivity 被引量:1
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作者 xinfa zhu Weishuai Duan +6 位作者 Xiancheng Meng Xiyu Jia Yonghui Zhang Pengyu Zhou Mengjun Wang Hongxing Zheng Chao Fan 《Journal of Semiconductors》 EI CAS CSCD 2024年第3期76-83,共8页
The emergent two-dimensional(2D)material,tin diselenide(SnSe_(2)),has garnered significant consideration for its potential in image capturing systems,optical communication,and optoelectronic memory.Nevertheless,SnSe_(... The emergent two-dimensional(2D)material,tin diselenide(SnSe_(2)),has garnered significant consideration for its potential in image capturing systems,optical communication,and optoelectronic memory.Nevertheless,SnSe_(2)-based photodetection faces obstacles,including slow response speed and low normalized detectivity.In this work,photodetectors based on SnS/SnSe_(2)and SnSe/SnSe_(2)p−n heterostructures have been implemented through a polydimethylsiloxane(PDMS)−assisted transfer method.These photodetectors demonstrate broad-spectrum photoresponse within the 405 to 850 nm wavelength range.The photodetector based on the SnS/SnSe_(2)heterostructure exhibits a significant responsivity of 4.99×10^(3)A∙W^(−1),normalized detectivity of 5.80×10^(12)cm∙Hz^(1/2)∙W^(−1),and fast response time of 3.13 ms,respectively,owing to the built-in electric field.Meanwhile,the highest values of responsivity,normalized detectivity,and response time for the photodetector based on the SnSe/SnSe_(2)heterostructure are 5.91×10^(3)A∙W^(−1),7.03×10^(12)cm∙Hz^(1/2)∙W−1,and 4.74 ms,respectively.And their photodetection performances transcend those of photodetectors based on individual SnSe_(2),SnS,SnSe,and other commonly used 2D materials.Our work has demonstrated an effective strategy to improve the performance of SnSe_(2)-based photodetectors and paves the way for their future commercialization. 展开更多
关键词 two-dimensional materials tin diselenide HETEROSTRUCTURES broad-spectrum photodetectors
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Thermal damage suppression performances in ELID-assisted profile grinding of superalloys using CBN wheels
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作者 Youkang YIN Jinyang XU +6 位作者 Lanyu SHI Guoqiang GUO xinfa zhu Yi MENG Jinming ZHOU Weiwei MING Ming CHEN 《Science China(Technological Sciences)》 2025年第4期144-165,共22页
Nickel-based superalloy(GH4169)is an ideal material for preparing turbine blades.Profile grinding of the fir-treeshaped turbine blade root can easily cause thermal damage to the workpiece specimen.This study aims to e... Nickel-based superalloy(GH4169)is an ideal material for preparing turbine blades.Profile grinding of the fir-treeshaped turbine blade root can easily cause thermal damage to the workpiece specimen.This study aims to enhance the suppression of alloy thermal damage by regulating the thickness of the oxide film on the cubic boron nitride(CBN)grinding wheel during the electrolytic in-process dressing(ELID)-assisted grinding process.A theoretical model for calculating the thickness of oxide film in ELID-assisted grinding was developed.Finite element simulation was conducted using the electrolytic film-forming process of the grinding wheel.The effects of electrical/nonelectrical parameters on the oxide film characteristics and grinding responses were addressed.The optimal matching scheme of process parameters was established.The results showed that the film layer of the grinding wheel at the blade root cam is more seriously damaged,and the workpiece surface is rougher.Further optimization of the electrode is demanded to achieve different dressing effects at various positions of the grinding wheel based on the workpiece profile.By reducing the interelectrode gap(h_(e)),increasing the power supply voltage(E_(o)),and controlling the electrolysis time(△t)at 10-15 min,the preferred film-forming efficiency and grinding quality can be achieved.By increasing the grinding wheel speed(V_(s))or decreasing the workpiece feed rate(V_(f))and grinding depth(a_(p)),the grinding thermal damage can be suppressed.A larger value of V_(f)or apcan be selected to acquire a compromise between grinding quality and film-forming efficiency after increasing the value of Vs.The optimal combination of electrical and nonelectrical parameters during this test is E_(o)=120 V,△t=15 min,h_(e)=0.1 mm,V_f=50 mm min^(-1),V_s=30 m s^(-1),and a_(p)=0.4 mm. 展开更多
关键词 SUPERALLOY profile grinding ELID thermal damage suppression oxide film
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