It is of great significance to construct organic circularly polarized luminescence systems(CPL) with large luminescence dissymmetry factors(g_(lum)) for practical applications. Here we report organic CPL systems const...It is of great significance to construct organic circularly polarized luminescence systems(CPL) with large luminescence dissymmetry factors(g_(lum)) for practical applications. Here we report organic CPL systems constructed by merging triplet-triplet annihilation upconversion chromophores in cellulose matrices. The chirality of the matrix is transferred to the achiral chromophores of photon upconversion and then the multistep energy transfer processes of upconversion amplify g_(lum). The g_(lum)value of upconversion CPL in the left-handed ethyl cellulose and the right-handed(acetyl) ethyl cellulose are up to +0.1 and -0.15, respectively. The study provides a straightforward approach for constructing solid organic upconversion CPL materials with large g_(lum), which may expand the application potentials of organic chiroptical materials.展开更多
Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries ove...Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries over the past few decades.It is obvious that extreme ultraviolet(EUV)lithography has become the next-generation lithography technology.The development of comprehensive performance EUV resist is one of the most critical issues.However,organic polymeric photoresists are difficult to meet the harsh requirements of EUV lithography.Pure inorganic photoresists such as metal salts,hydrogen silsesquioxane(HSQ)are expected for EUV lithography due to their high resistance and high resolution.But the low sensitivity makes them not suitable for high volume manufacturing(HVM).Organic-inorganic hybrid photoresists,containing both organic and inorganic components,are regarded as one of the most promising EUV resists.They combine both merits of organic and inorganic materials and have significant advantages in machinability,etching resistance,EUV absorption,and chemical/thermal stability.Organic-inorganic hybrid photoresists are considered as ideal materials for realizing industrialgrade patterns below 10 nm.This review mainly focuses on the development of organic-inorganic hybrid photoresists over the past decade.展开更多
Luminescent materials that can be reversibly switched by electric field stimulation are attractive since the potential application for optoelectronic devices.Here we report a triplet-triplet annihilation upconversion(...Luminescent materials that can be reversibly switched by electric field stimulation are attractive since the potential application for optoelectronic devices.Here we report a triplet-triplet annihilation upconversion(TTA-UC)system with electrophoretic response which is developed as the electrophoretic ink.The TTA-UC system consists of an ionic derivative of 9,10-diphenyl anthracene(DPA)as the annihilator and Pt(II)octaethylporphyrin(PtOEP)as the sensitizer.Upon applying an electric field,migration and enrichment of positively charged DPA derivatives towards the cathode results in a 20%enhancement of TTA-UC.A quasi-solid film for electrically writing is made using the electrophoretic TTA system as the ink and a platinum electrode as a pen.The prototype of TTA-UC ink demonstrates unique luminescence functions upon electrically writing and erasing,providing a promising strategy to develop electronic devices for display,information storage and encryption.展开更多
Comprehensive Summary:We developed single-component nonchemically-amplified resists(n-CARs)based on calixarene derivatives for high-resolution nanopatterning with electron beam lithography(EBL)and extreme ultraviolet ...Comprehensive Summary:We developed single-component nonchemically-amplified resists(n-CARs)based on calixarene derivatives for high-resolution nanopatterning with electron beam lithography(EBL)and extreme ultraviolet lithography(EUVL).The calixarene derivatives decorated with 2 and 4 photosensitive sulfonium groups(C2S and C4S,respectively)were synthesized and characterized.Both derivatives exhibit excellent thermal stability and film-forming properties,making them suitable as resist materials.A comparative EBL study reveals that C2S resist exhibits superior lithographic performance.The presence of hydrogen bonds between C2S molecules enhances the mechanical strength and the Young's modulus of the resist film,effectively mitigating pattern collapse.The C2S resist achieved an 18 nm line/space(L/S)pattern and a 14 nm L/2S semi-dense pattern with EBL.Performance studies with EUVL yielded an impressive 14 nm half-pitch(HP)pattern with a remarkably low line-edge roughness(LER)of 1.7 nm.Extensive studies of the EUV exposure mechanism,conducted using in-situ quadrupole mass spectrometry(QMS)and X-ray photoelectron spectroscopy(XPS),demonstrated that the solubility switch of the resist material depends on the decomposition of the sulfonium groups and triflate anions.展开更多
Aryl sulfonate ester modified polystyrenes with different substituents(X–SEPS,X=H–,MeO–,and CN–)were synthesized by reversible addition-fragmentation chain transfer(RAFT)polymerization.The excellent thermal stabil...Aryl sulfonate ester modified polystyrenes with different substituents(X–SEPS,X=H–,MeO–,and CN–)were synthesized by reversible addition-fragmentation chain transfer(RAFT)polymerization.The excellent thermal stability and film-forming capability of these three polymers suggest that they can satisfy the lithography process and are candidates for resist materials.Comparative electron beam lithography(EBL)demonstrates that the three resists(H–SEPS,MeO–SEPS and CN–SEPS)exhibit different EBL performances.Calculation of bond energies for the model compounds suggests that the influence of substituent groups on the bond energy is not the reason for the differences in sensitivity.Results obtained using a fully automated dissipative quartz crystal microbalance(QCM)analyzer confirm that the influence of substituent groups on the solubility behavior of resist films in developers leads to different photolithographic performances.The H–SEPS resist exhibits better comprehensive performance than the MeO–SEPS and CN–SEPS resists,achieving an 18 nm line/space(L/S)pattern and a 10 nm line/4 space(L/4S)semi-dense pattern by EBL at doses of 3200 and 2800μC cm^(−2),respectively.Further extreme ultraviolet lithography(EUVL)demonstrates the capability of H–SEPS resist to form 22 nm half-pitch(HP)patterns.The detailed study of the photochemical reaction and patterning mechanism suggests that the decomposition of sulfonate ester groups into polar sulfonic acid groups,along with a rearrangement,leads to a solubility switch of resist films in the developer.展开更多
A composite proton-reducing catalyst Hy@MCM-41 was created by using a hydrophobic[Fe-Fe]-hydrogenase mimic(Hy)incorporated into the K^(+)-exchanged molecular sieve MCM-41.Hy acts as the active site to generate H_(2) b...A composite proton-reducing catalyst Hy@MCM-41 was created by using a hydrophobic[Fe-Fe]-hydrogenase mimic(Hy)incorporated into the K^(+)-exchanged molecular sieve MCM-41.Hy acts as the active site to generate H_(2) by reducing H^(+),and MCM-41 provide a large surface area to maintain the dispersion of Hy and to prevent aggrega-tion and precipitation.Hy@MCM-41 was successfully applied to the light-induced hydrogen production in pure water with an iridium compound[Ir(ppy)_(2)bpy]Cl and triethylamine(TEA)as the photosensitizer and the sacrificial electron donor,respectively,exhibiting good stability and catalytic activity.The present study provides a general strategy for the application of water-insoluble catalysts in pure water by using mesoporous molecular sieves.展开更多
Dendrimers are well-defined tree-like macromolecules possessing numerous chain ends emanating from a single core, which makes them attractive candidates for mimicking light-harvesting systems and hydrogenases. Photoin...Dendrimers are well-defined tree-like macromolecules possessing numerous chain ends emanating from a single core, which makes them attractive candidates for mimicking light-harvesting systems and hydrogenases. Photoinduced electron and energy transfers are main processes involved in light-harvesting and photocatalysis. In this review, the general concepts of design strategies and recent developments of photofunctional dendrimers in biomimics of light-harvesting systems and hydrogenases are discussed. The energy transfer and electron transfer processes in light-harvesting dendrimers and the effect of dendritic structures in photochemical hydrogen production are illustrated.展开更多
基金financial support from the National Natural Science Foundation of China(Nos.21673264,21573266,21672226 and 22090012)the Youth Innovation Promotion Association of the Chinese Academy of Sciences(Nos.2017032 and 2020035)。
文摘It is of great significance to construct organic circularly polarized luminescence systems(CPL) with large luminescence dissymmetry factors(g_(lum)) for practical applications. Here we report organic CPL systems constructed by merging triplet-triplet annihilation upconversion chromophores in cellulose matrices. The chirality of the matrix is transferred to the achiral chromophores of photon upconversion and then the multistep energy transfer processes of upconversion amplify g_(lum). The g_(lum)value of upconversion CPL in the left-handed ethyl cellulose and the right-handed(acetyl) ethyl cellulose are up to +0.1 and -0.15, respectively. The study provides a straightforward approach for constructing solid organic upconversion CPL materials with large g_(lum), which may expand the application potentials of organic chiroptical materials.
基金Financial support from the National Natural Science Foundation of China(22090012,U20A20144,21873106,22073108 and 21903085)the Ministry of Science and Technology of China Major Project(2018ZX02102005,2011ZX02701)is gratefully acknowledged.
文摘Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries over the past few decades.It is obvious that extreme ultraviolet(EUV)lithography has become the next-generation lithography technology.The development of comprehensive performance EUV resist is one of the most critical issues.However,organic polymeric photoresists are difficult to meet the harsh requirements of EUV lithography.Pure inorganic photoresists such as metal salts,hydrogen silsesquioxane(HSQ)are expected for EUV lithography due to their high resistance and high resolution.But the low sensitivity makes them not suitable for high volume manufacturing(HVM).Organic-inorganic hybrid photoresists,containing both organic and inorganic components,are regarded as one of the most promising EUV resists.They combine both merits of organic and inorganic materials and have significant advantages in machinability,etching resistance,EUV absorption,and chemical/thermal stability.Organic-inorganic hybrid photoresists are considered as ideal materials for realizing industrialgrade patterns below 10 nm.This review mainly focuses on the development of organic-inorganic hybrid photoresists over the past decade.
基金the financial support from the National Natural Science Foundation of China(Nos.22273117,22273110 and 22090012)。
文摘Luminescent materials that can be reversibly switched by electric field stimulation are attractive since the potential application for optoelectronic devices.Here we report a triplet-triplet annihilation upconversion(TTA-UC)system with electrophoretic response which is developed as the electrophoretic ink.The TTA-UC system consists of an ionic derivative of 9,10-diphenyl anthracene(DPA)as the annihilator and Pt(II)octaethylporphyrin(PtOEP)as the sensitizer.Upon applying an electric field,migration and enrichment of positively charged DPA derivatives towards the cathode results in a 20%enhancement of TTA-UC.A quasi-solid film for electrically writing is made using the electrophoretic TTA system as the ink and a platinum electrode as a pen.The prototype of TTA-UC ink demonstrates unique luminescence functions upon electrically writing and erasing,providing a promising strategy to develop electronic devices for display,information storage and encryption.
基金supported by the National Natural Science Foundation of China(22090012,22475224,U20A20144)Chinese Academy of Sciences(CAS)is gratefully acknowledged。
文摘Comprehensive Summary:We developed single-component nonchemically-amplified resists(n-CARs)based on calixarene derivatives for high-resolution nanopatterning with electron beam lithography(EBL)and extreme ultraviolet lithography(EUVL).The calixarene derivatives decorated with 2 and 4 photosensitive sulfonium groups(C2S and C4S,respectively)were synthesized and characterized.Both derivatives exhibit excellent thermal stability and film-forming properties,making them suitable as resist materials.A comparative EBL study reveals that C2S resist exhibits superior lithographic performance.The presence of hydrogen bonds between C2S molecules enhances the mechanical strength and the Young's modulus of the resist film,effectively mitigating pattern collapse.The C2S resist achieved an 18 nm line/space(L/S)pattern and a 14 nm L/2S semi-dense pattern with EBL.Performance studies with EUVL yielded an impressive 14 nm half-pitch(HP)pattern with a remarkably low line-edge roughness(LER)of 1.7 nm.Extensive studies of the EUV exposure mechanism,conducted using in-situ quadrupole mass spectrometry(QMS)and X-ray photoelectron spectroscopy(XPS),demonstrated that the solubility switch of the resist material depends on the decomposition of the sulfonium groups and triflate anions.
基金supported by the National Natural Science Foundation of China(22090012,22475224).
文摘Aryl sulfonate ester modified polystyrenes with different substituents(X–SEPS,X=H–,MeO–,and CN–)were synthesized by reversible addition-fragmentation chain transfer(RAFT)polymerization.The excellent thermal stability and film-forming capability of these three polymers suggest that they can satisfy the lithography process and are candidates for resist materials.Comparative electron beam lithography(EBL)demonstrates that the three resists(H–SEPS,MeO–SEPS and CN–SEPS)exhibit different EBL performances.Calculation of bond energies for the model compounds suggests that the influence of substituent groups on the bond energy is not the reason for the differences in sensitivity.Results obtained using a fully automated dissipative quartz crystal microbalance(QCM)analyzer confirm that the influence of substituent groups on the solubility behavior of resist films in developers leads to different photolithographic performances.The H–SEPS resist exhibits better comprehensive performance than the MeO–SEPS and CN–SEPS resists,achieving an 18 nm line/space(L/S)pattern and a 10 nm line/4 space(L/4S)semi-dense pattern by EBL at doses of 3200 and 2800μC cm^(−2),respectively.Further extreme ultraviolet lithography(EUVL)demonstrates the capability of H–SEPS resist to form 22 nm half-pitch(HP)patterns.The detailed study of the photochemical reaction and patterning mechanism suggests that the decomposition of sulfonate ester groups into polar sulfonic acid groups,along with a rearrangement,leads to a solubility switch of resist films in the developer.
基金Financial support from the National Natural Science Foundation of China(Nos.21302196,21173245,21233011,21004072,and 21273258)973 Program(Nos.2013CB834703,2013CB834505,2010CB934500)the Solar Energy Initiative of the Chinese Academy of Sciences is gratefully acknowledged.
文摘A composite proton-reducing catalyst Hy@MCM-41 was created by using a hydrophobic[Fe-Fe]-hydrogenase mimic(Hy)incorporated into the K^(+)-exchanged molecular sieve MCM-41.Hy acts as the active site to generate H_(2) by reducing H^(+),and MCM-41 provide a large surface area to maintain the dispersion of Hy and to prevent aggrega-tion and precipitation.Hy@MCM-41 was successfully applied to the light-induced hydrogen production in pure water with an iridium compound[Ir(ppy)_(2)bpy]Cl and triethylamine(TEA)as the photosensitizer and the sacrificial electron donor,respectively,exhibiting good stability and catalytic activity.The present study provides a general strategy for the application of water-insoluble catalysts in pure water by using mesoporous molecular sieves.
基金supported by the National Basic Research Program of China(2013CB834703,2013CB834505)the National Natural Science Foundation of China(21173245,21273258,21233011,21472201,21302196)
文摘Dendrimers are well-defined tree-like macromolecules possessing numerous chain ends emanating from a single core, which makes them attractive candidates for mimicking light-harvesting systems and hydrogenases. Photoinduced electron and energy transfers are main processes involved in light-harvesting and photocatalysis. In this review, the general concepts of design strategies and recent developments of photofunctional dendrimers in biomimics of light-harvesting systems and hydrogenases are discussed. The energy transfer and electron transfer processes in light-harvesting dendrimers and the effect of dendritic structures in photochemical hydrogen production are illustrated.
