High-performance, large-area optical gratings for applications like chirped pulse amplification, gravitational wave astronomy, and X-ray optics require sub-nanometer line placement control over several cm^(2). Electro...High-performance, large-area optical gratings for applications like chirped pulse amplification, gravitational wave astronomy, and X-ray optics require sub-nanometer line placement control over several cm^(2). Electron beam lithography with a variable shaped beam(VSB) is well suited but limited by tool-dependent address grid discretization. We adapted address grid interpolation to the VSB method, reducing the effective placement grid to 25 pm, as confirmed by stray light measurements.展开更多
基金Bundesministerium für Bildung und Forschung(03Z1H534, 13N16028)Deutsche Forschungsgemeinschaft(448663633, 455425131)。
文摘High-performance, large-area optical gratings for applications like chirped pulse amplification, gravitational wave astronomy, and X-ray optics require sub-nanometer line placement control over several cm^(2). Electron beam lithography with a variable shaped beam(VSB) is well suited but limited by tool-dependent address grid discretization. We adapted address grid interpolation to the VSB method, reducing the effective placement grid to 25 pm, as confirmed by stray light measurements.
