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Imprint Lithography at Room Temperature with Novolak Resin and Its Application
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作者 t.numai 《复旦学报(自然科学版)》 CAS CSCD 北大核心 2007年第5期625-,共1页
1 Results Imprint lithography[1] has attracted considerable attention from the viewpoint of low cost fabrication,because light exposure systems are not required. Up to now,polymethylmethacrylate (PMMA) films and hard ... 1 Results Imprint lithography[1] has attracted considerable attention from the viewpoint of low cost fabrication,because light exposure systems are not required. Up to now,polymethylmethacrylate (PMMA) films and hard molds were often used in imprint lithography.In this paper,we report on the successful demonstration of imprint lithography using novolak resin (OFPR-800),which is more suitable than PMMA for dry etching,and a soft mold such as a soft polyester sheet,which has a two-dimensional (2D) square ... 展开更多
关键词 imprint lithography room temperature novolak resin GRAPHOEPITAXY
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