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Investigation of Surface Free Energy for PTFE Polymer by Bipolar Argon Plasma Treatment
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作者 S. M. Pelagade N. L. Singh +4 位作者 R. S. Rane S. Mukherjee U. P. Deshpande V. Ganesan t. shripathi 《Journal of Surface Engineered Materials and Advanced Technology》 2012年第2期132-136,共5页
The low ion energy argon plasma was used for surface modification of Poly tetra fluoroethylene (PTFE) polymer. The plasma was generated between two plane metal electrode by using 50 kHz bipolar power supply. The plasm... The low ion energy argon plasma was used for surface modification of Poly tetra fluoroethylene (PTFE) polymer. The plasma was generated between two plane metal electrode by using 50 kHz bipolar power supply. The plasma treated surface was characterized by atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The surface free energy (SFE) of plasma treated surface was calculated from contact angle measurement. SFE increases from 33.39 mJ/m2 to 41.40 mJ/m2 with the increase in plasma treatment time and the corresponding contact angle changed from 76? to 60?. XPS study shows that F/C ratio change from 1.8 (untreated) to 1.3 (treated) and O/C ratio changes from 0.094 (untreated) to 0.148 (treated). The XPS analysis shows that both F1s and the C1s spectra for PTFE are marginally modified by plasma treatment. AFM study shows that the average surface roughness (Ra) increased from 8.5 nm to 22.8 nm after plasma treatment. Vicker’s micro hardness of the film increases upon plasma treatment. The increase in SFE after plasma treatment is attributed to the functionalization of the polymer surface with hydrophilic groups as supported from the above observations. 展开更多
关键词 PTFE Surface Energy XPS AFM MICROHARDNESS
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Study of Sputtered Fe/t<sub>Si</sub>/Fe Trilayer Films: Magnetic and Electronic Properties
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作者 Ranjeet Brajpuriya Ram K. Sharma +1 位作者 Ankush Vij t. shripathi 《Journal of Modern Physics》 2011年第8期864-874,共11页
A series of trilayers of sputtered Fe/Si/Fe were grown to study the interface characteristics and magnetic coupling between ferromagnetic Fe layers (30 ? thick) for Si spacer thickness (tSi) ranging from 15 ? to 40 ?.... A series of trilayers of sputtered Fe/Si/Fe were grown to study the interface characteristics and magnetic coupling between ferromagnetic Fe layers (30 ? thick) for Si spacer thickness (tSi) ranging from 15 ? to 40 ?. Grazing incidence x-ray diffraction, AFM, resistivity and x-ray photoelectron spectroscopy (XPS) meas-urements show substantial intermixing between the layers during deposition which results in trilayers of complicated structures for different sub-layer thicknesses. A systematic variation in silicide concentration across the interface is observed by XPS measurements. The Fe layers in the trilayers were observed to con-sist of Fe layers doped with Si, ferromagnetic Fe-Si silicide layers and nonmagnetic Fe-Si silicide interface layer, while the Si spacer was found to be Fe-Si compound layers with an additional amorphous Si (α-Si) sublayer for tSi≥ 30 ?. A strong anti-ferromagnetic (AF) coupling was observed in trilayers with iron silicide spacers, which disappeared if α-Si layers present in the spacers. The observed magnetization behaviour in each case is interpreted in terms of changes in interfacial structural and electronic properties due to variation in film thickness. 展开更多
关键词 MAGNETIC Multilayer SILICIDE Formation Interlayer Coupling MOKE XPS
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