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Determination of band alignment between GaO_(x)and boron doped diamond for a selective-area-doped termination structure
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作者 Qi-Liang Wang Shi-Yang Fu +4 位作者 si-han he Hai-Bo Zhang Shao-Heng Cheng Liu-An Li Hong-Dong Li 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第8期670-674,共5页
An n-GaO_(x)thin film is deposited on a single-crystal boron-doped diamond by RF magnetron sputtering to form the pn heterojunction.The n-Ga Ox thin film presents a small surface roughness and a large optical band gap... An n-GaO_(x)thin film is deposited on a single-crystal boron-doped diamond by RF magnetron sputtering to form the pn heterojunction.The n-Ga Ox thin film presents a small surface roughness and a large optical band gap of 4.85 e V.In addition,the band alignment is measured using x-ray photoelectron spectroscopy to evaluate the heterojunction properties.The GaO_(x)/diamond heterojunction shows a type-Ⅱstaggered band configuration,where the valence and conduction band offsets are 1.28 e V and 1.93 e V,respectively.These results confirm the feasibility of the use of n-GaO_(x)as a termination structure for diamond power devices. 展开更多
关键词 GaO_(x) boron-doped diamond edge termination band alignment
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