Electric and magnetic fields play an important role in both chemical and physical reactions.However,since the coupling efficiency between magnetic fields and electrons is low in comparison with that between electric f...Electric and magnetic fields play an important role in both chemical and physical reactions.However,since the coupling efficiency between magnetic fields and electrons is low in comparison with that between electric fields and electrons in the visible wavelength region,the magnetic field is negligible in photo-induced reactions.Here,we performed photo-etching of ZrO_(2) nano-stripe structures,and identified an etching-property polarisation dependence.Specifically,the etching rate and etched profiles depend on the structure width.To evaluate this polarisation-dependent etching,we performed numerical calculations using a finite-difference time-domain method.Remarkably,the numerical results revealed that the polarisation-dependent etching properties were determined by the magnetic field distributions,rather than the electric field distributions.As nano-scale structures induce a localised magnetic field,the discovery of this etching dependence on the magnetic field is expected to introduce a new perspective on advanced nano-scale structure fabrication.展开更多
基金supported by a MEXT Grant-in-Aid for Scientific Research(B)(No.26286022,25288012)a MEXT Grant-in-Aid for Exploratory Research Program(No.26630122)+5 种基金aMEXT Grant-in-Aid for Scientific Research on Innovative Areas(No.15H00866)aMEXTNanotechnology Platform(No.12024046)the JSPS Core-to-Core Program(A.Advanced Research Networks)the Yazaki Memorial Foundationthe Research Foundation for Opto-Science and Technologythe RIKEN AICS through the HPCI System Research project(ID:hp150218).
文摘Electric and magnetic fields play an important role in both chemical and physical reactions.However,since the coupling efficiency between magnetic fields and electrons is low in comparison with that between electric fields and electrons in the visible wavelength region,the magnetic field is negligible in photo-induced reactions.Here,we performed photo-etching of ZrO_(2) nano-stripe structures,and identified an etching-property polarisation dependence.Specifically,the etching rate and etched profiles depend on the structure width.To evaluate this polarisation-dependent etching,we performed numerical calculations using a finite-difference time-domain method.Remarkably,the numerical results revealed that the polarisation-dependent etching properties were determined by the magnetic field distributions,rather than the electric field distributions.As nano-scale structures induce a localised magnetic field,the discovery of this etching dependence on the magnetic field is expected to introduce a new perspective on advanced nano-scale structure fabrication.
