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Optical Emission Spectroscopic Study During the Evaporation of Aluminium in the Thermal Plasma Reactor
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作者 I.BANERJEE N.V.KULKARNI +3 位作者 S.KARMAKER V.L.MATHE s.v.bhoraskar A.K.DAS 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第1期27-30,共4页
The oxidation of aluminium was studied using optical emission spectroscopy (OES) during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-... The oxidation of aluminium was studied using optical emission spectroscopy (OES) during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-O with that of Al follows the exact trend as of that obtained from the corresponding line intensities in X-ray diffraction spectra of the synthesized samples. In this paper the inherent capacity of emission spectroscopy in evaluating the growth processes under plasma induced reactions is presented. 展开更多
关键词 thermal plasma reactor aluminium OXIDATION optical emission spectroscopy X-ray diffraction
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