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Uniform epitaxy and controllable iron doping of centimeter-size bilayer tungsten disulfide with unidirectional alignment
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作者 Xiaohui Li Ruofan Du +12 位作者 quankun luo Wang Feng Junbo Yang Luying Song Xia Wen Yanan Peng Yulin Jiang Hang Sun Ling Huang Hui Li Mengmeng Xiao Jun He Jianping Shi 《Nano Research》 2025年第9期704-712,共9页
Bilayer transition-metal dichalcogenides(TMDCs)are promising channel materials for state-of-the-art transistors,due to their smaller bandgap,higher carrier mobility,and better electrostatic control than those of the m... Bilayer transition-metal dichalcogenides(TMDCs)are promising channel materials for state-of-the-art transistors,due to their smaller bandgap,higher carrier mobility,and better electrostatic control than those of the monolayer counterparts.Epitaxial growth and controllable doping of wafer-scale bilayer TMDCs single crystals are two pivotal tasks to meet the practical applications of high-performance electronic devices.Despite considerable efforts have been made,addressing such fundamental issues simultaneously has yet to be realized.Here we design an ingenious Fe-assisted epitaxial strategy to synthesize centimeter-size uniform bilayer tungsten disulfide(WS_(2))with unidirectional alignment on industry-compatible c-plane sapphire.The introduction of Fe promotes the formation of parallel steps on sapphire surfaces to induce the edge-nucleation of unidirectionally aligned bilayer WS_(2)and the evolution of centimeter-size uniform films.The ionic liquid gated transistors with ultrahigh electron mobility(169 cm^(2)·V^(-1)·s^(-1))and remarkable on/off current ratio(10^(8))are constructed based on the centimeter-size bilayer Fe-WS_(2),due to the reduction of Schottky barrier width induced by Fe doping.This work provides a simple and general approach for synthesizing and doping of wafer-scale bilayer TMDCs,which should accelerate the further device downscaling to extend Moore’s law. 展开更多
关键词 centimeter-size uniform bilayer tungsten disulfide unidirectional domain orientation Schottky barrier width ultrahigh electron mobility
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