Pure Ni nanopowders were successfully prepared by the method of anodic arc disch arged plasma with homemade experimental apparatus. The particle size, mircostruc ture and morphology of the particles by this process we...Pure Ni nanopowders were successfully prepared by the method of anodic arc disch arged plasma with homemade experimental apparatus. The particle size, mircostruc ture and morphology of the particles by this process were characterized via X-ra y powder diffraction (XRD), transmission electron microscopy (TEM) and the corre sponding selected area electron diffraction (SAED); The specific surface area an d pore parameters were investigated by multi-point full analysis of nitrogen ads orption-desorption isotherms at 77K by Brunauer- Emmett-Teller (BET) surface are a analyzer; The chemical composition were determined by X-ray energy dispersive spectrometry (XEDS) equipped in SEM and element analyze instrument. The experime nt results indicate that the samples by this method with high purity,the crystal structure of the particles is as same as the bulk material, is fcc structure, w ith average particle sizes about 47nm, ranging from 20 to 70nm, and distributed uniformly in spherical chain shapes, the specific surface areavis 14.23m2/g, po re volume of pore is 0.09cm3/g and average pore diameter is 23nm.展开更多
The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and m...The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and make the deposition proces s at ambient temperature. In this work, high quality TiN thin films were deposi ted on silicon substrates at low temperature using the improved filtered cathodi c arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the T iN thin films. The effects of the negative substrate bias on the grain size, pre ferred crystalline orientation, surface roughness of TiN thin films were discuss ed.展开更多
基金This work was supported by the Natural Science Foundation of Gansu Province,China(No.3ZS042-B25-017).
文摘Pure Ni nanopowders were successfully prepared by the method of anodic arc disch arged plasma with homemade experimental apparatus. The particle size, mircostruc ture and morphology of the particles by this process were characterized via X-ra y powder diffraction (XRD), transmission electron microscopy (TEM) and the corre sponding selected area electron diffraction (SAED); The specific surface area an d pore parameters were investigated by multi-point full analysis of nitrogen ads orption-desorption isotherms at 77K by Brunauer- Emmett-Teller (BET) surface are a analyzer; The chemical composition were determined by X-ray energy dispersive spectrometry (XEDS) equipped in SEM and element analyze instrument. The experime nt results indicate that the samples by this method with high purity,the crystal structure of the particles is as same as the bulk material, is fcc structure, w ith average particle sizes about 47nm, ranging from 20 to 70nm, and distributed uniformly in spherical chain shapes, the specific surface areavis 14.23m2/g, po re volume of pore is 0.09cm3/g and average pore diameter is 23nm.
基金This work was supported by the National Natural Science Foundation of China(No.10074022)the Excellent Young Teachers Prograom of MOE,China.
文摘The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and make the deposition proces s at ambient temperature. In this work, high quality TiN thin films were deposi ted on silicon substrates at low temperature using the improved filtered cathodi c arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the T iN thin films. The effects of the negative substrate bias on the grain size, pre ferred crystalline orientation, surface roughness of TiN thin films were discuss ed.
