Tungsten was exposed to pure Ar or Ne plasmas over 1550 K at several incident ion energies. Even under the irradiation condition that the tungsten nanostructure is formed by He plasma irradiation, holes/bubbles and fi...Tungsten was exposed to pure Ar or Ne plasmas over 1550 K at several incident ion energies. Even under the irradiation condition that the tungsten nanostructure is formed by He plasma irradiation, holes/bubbles and fiberform nanostructures were not formed on the surface by exposure to Ar or Ne plasmas. In addition, the results from energy dispersive X-ray spectroscopy supported the facts that Ar and Ne did not remain in the sample. We will discuss the reason for the differences in the damage to the tungsten surface exposed to noble gas plasmas.展开更多
A fiberform nanostructure was synthesized by exposing high-density helium plasma to a 100 nm thick tungsten thin film in the linear plasma device NAGDIS-II.After helium plasma exposure,the cross-section of samples was...A fiberform nanostructure was synthesized by exposing high-density helium plasma to a 100 nm thick tungsten thin film in the linear plasma device NAGDIS-II.After helium plasma exposure,the cross-section of samples was observed by a scanning electron microscope,transmission electron microscope,and focused ion beam scanning electron microscope.It is shown that the thickness of the nanostructured layer increases significantly for only a short irradiation time.The optical absorptivity remains high,even though it is exposed to helium plasma for a short time.The usage of the thin film can shorten the processing time for nanostructure growth,which will be beneficial for commercial production.展开更多
文摘Tungsten was exposed to pure Ar or Ne plasmas over 1550 K at several incident ion energies. Even under the irradiation condition that the tungsten nanostructure is formed by He plasma irradiation, holes/bubbles and fiberform nanostructures were not formed on the surface by exposure to Ar or Ne plasmas. In addition, the results from energy dispersive X-ray spectroscopy supported the facts that Ar and Ne did not remain in the sample. We will discuss the reason for the differences in the damage to the tungsten surface exposed to noble gas plasmas.
文摘A fiberform nanostructure was synthesized by exposing high-density helium plasma to a 100 nm thick tungsten thin film in the linear plasma device NAGDIS-II.After helium plasma exposure,the cross-section of samples was observed by a scanning electron microscope,transmission electron microscope,and focused ion beam scanning electron microscope.It is shown that the thickness of the nanostructured layer increases significantly for only a short irradiation time.The optical absorptivity remains high,even though it is exposed to helium plasma for a short time.The usage of the thin film can shorten the processing time for nanostructure growth,which will be beneficial for commercial production.
