Organosilicone thin films have been deposited by plasma polymerization(pp)in a plasma enhanced chemical vapor deposition(PECVD)system using hexamethyldisilazane(HMDSN:C_(6)H_(19)Si_(2)N)as a monomer precursor,at diffe...Organosilicone thin films have been deposited by plasma polymerization(pp)in a plasma enhanced chemical vapor deposition(PECVD)system using hexamethyldisilazane(HMDSN:C_(6)H_(19)Si_(2)N)as a monomer precursor,at different biases of the stainless-steel substrate holder.The substrate bias affected film thickness,surface morphology,chemical composition and photoluminescence(PL)emission.For a negatively biased substrate,it is found that the film thickness is the minimum,while the porosity and PL emission are the maximum.For a positively biased substrate,the thickness and the ratio of Si/N are the maximum which correspond to a blue shift of the PL emission in comparison with the case of non-biased grounded substrate.In addition,the characterization of the plasma using a single cylindrical Langmuir probe has been performed to obtain information about both the electron density and the positive ion energy,where it can be concluded that the ion energy plays a major role in determining film thickness.展开更多
文摘Organosilicone thin films have been deposited by plasma polymerization(pp)in a plasma enhanced chemical vapor deposition(PECVD)system using hexamethyldisilazane(HMDSN:C_(6)H_(19)Si_(2)N)as a monomer precursor,at different biases of the stainless-steel substrate holder.The substrate bias affected film thickness,surface morphology,chemical composition and photoluminescence(PL)emission.For a negatively biased substrate,it is found that the film thickness is the minimum,while the porosity and PL emission are the maximum.For a positively biased substrate,the thickness and the ratio of Si/N are the maximum which correspond to a blue shift of the PL emission in comparison with the case of non-biased grounded substrate.In addition,the characterization of the plasma using a single cylindrical Langmuir probe has been performed to obtain information about both the electron density and the positive ion energy,where it can be concluded that the ion energy plays a major role in determining film thickness.
