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Improved Photovoltaic Properties of Heterojunction Carbon Based Solar Cell 被引量:1
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作者 Sudip Adhikari m. S. Kayastha +8 位作者 D. C. Ghimire H. R. Aryal S. Adhikary T. Takeuchi K. murakami Y. Kawashimo H. Uchida K. Wakita m. umeno 《Journal of Surface Engineered Materials and Advanced Technology》 2013年第3期178-183,共6页
Amorphous carbon (a-C) thin films have been synthesized by microwave (MW) surface wave plasma (SWP) chemical vapor deposition (CVD) on n-type silicon and quartz substrates, aiming at the application of the films for p... Amorphous carbon (a-C) thin films have been synthesized by microwave (MW) surface wave plasma (SWP) chemical vapor deposition (CVD) on n-type silicon and quartz substrates, aiming at the application of the films for photovoltaic solar cells. Argon, acetylene and trimethylboron were used as a carrier, source and dopant gases. Analytical methods such as X-ray photoelectron spectroscopy (XPS), Hall Effect measurement, JASCO V-570 UV/VIS/NIR spectroscopy, Raman spectroscopy, Transmission electron microscopy (TEM) and Solar simulator were employed to investigate chemical, optical, structural and electrical properties of the a-C films. Two types of solar cells of configuration p-C/n-Si and p-C/i-C/n-Si have been fabricated and their current-voltage characteristics under dark and illumination (AM 1.5, 100 mW/cm2) have been studied. The two solar cells showed rectifying curves under the dark condition confirming the heterojunction carbon based solar cell between p-C and n-Si. When illuminated by the solar simulator light the devices showed photovoltaic behavior. The heterojunction device (p-C/i-C/n-Si) having inserted intrinsic carbon film between p-C and n-Si exhibited significant enhancement of the conversation efficiency (0.167% to 2.349%) over the device (p-C/n-Si). 展开更多
关键词 CARBON PHOTOVOLTAIC Properties HETEROJUNCTION SOLAR CELL
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Nitrogen Plasma Treatment Effect on Graphene Sheeted Vertically Aligned Carbon Nanofibers
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作者 Dilip Chandra Ghimire m. matsushima m. umeno 《Journal of Chemistry and Chemical Engineering》 2013年第9期842-846,共5页
Nitrogen plasma treatment effect on GS-CNFs (graphene seeted vertically aligned carbon nanofibers) has been studied. GS-CNFs were grown on nickel coated cupper substrates by DC-plasma CVD (chemical vapor deposition... Nitrogen plasma treatment effect on GS-CNFs (graphene seeted vertically aligned carbon nanofibers) has been studied. GS-CNFs were grown on nickel coated cupper substrates by DC-plasma CVD (chemical vapor deposition) at relatively low temperature. GS-CNFs were studied by SEM (scanning electron microscopy), HR-TEM (high-resolution transmission electron microscopy), XPS and Raman measurements. GS-CNFs are composed of cylindrical shaped having pure graphite sheets with about 5 μm length and nanometer size tips and roots diameter. Nitrogen plasma treatment causes nitrogen chemical etching on the graphene seeted carbon nanofibers were disordered its fine shape and increase the graphetization due to nitrogen incorporation. 展开更多
关键词 DC-plasma CVD graphene seeted carbon nanofibers nitrogen plasma treatment effect.
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