Solid-state nanopores(SSNPs)have emerged as a transformative platform in nanotechnology and biotechnology,yet their application is limited by the lack of cost-effective,reproducible fabrication technology.Here,we intr...Solid-state nanopores(SSNPs)have emerged as a transformative platform in nanotechnology and biotechnology,yet their application is limited by the lack of cost-effective,reproducible fabrication technology.Here,we introduce a novel SpacerX process for wafer-scale fabrication of well-ordered nanopore arrays inspired by spacer patterning used in the standard semiconductor manufacturing process.This technique is intrinsically scalable and features tunable nanopore dimensions,with an open-pore rate exceeding 99.9%,even in an academic cleanroom.We successfully demonstrated a silicon nitride(Si_(3)N_(4))nanopore array with a diameter of~30 nm,non-uniformity below 10%,and spacing of 10μm.By further reducing the spacer size,the nanopore diameter can be minimized to 10 nm.We fabricated multi-pore devices and showed that dual-pore devices offer higher detection throughput for DNA molecules.The SpacerX process only involves two ultraviolet lithography steps with one mask,and can be readily adopted by commercial foundries,thus opening the possibility of mass-producing sub-10 nm SSNPs at extremely low cost.展开更多
基金jointly supported by the National Natural Science Foundation of China under grant No.62188102the National Key R&D Program of China No.2022YFF1202002the National Natural Science Foundation of China under grant No.62174107.
文摘Solid-state nanopores(SSNPs)have emerged as a transformative platform in nanotechnology and biotechnology,yet their application is limited by the lack of cost-effective,reproducible fabrication technology.Here,we introduce a novel SpacerX process for wafer-scale fabrication of well-ordered nanopore arrays inspired by spacer patterning used in the standard semiconductor manufacturing process.This technique is intrinsically scalable and features tunable nanopore dimensions,with an open-pore rate exceeding 99.9%,even in an academic cleanroom.We successfully demonstrated a silicon nitride(Si_(3)N_(4))nanopore array with a diameter of~30 nm,non-uniformity below 10%,and spacing of 10μm.By further reducing the spacer size,the nanopore diameter can be minimized to 10 nm.We fabricated multi-pore devices and showed that dual-pore devices offer higher detection throughput for DNA molecules.The SpacerX process only involves two ultraviolet lithography steps with one mask,and can be readily adopted by commercial foundries,thus opening the possibility of mass-producing sub-10 nm SSNPs at extremely low cost.
