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Total ionizing dose effects in pinned photodiode complementary metal-oxide-semiconductor transistor active pixel sensor 被引量:4
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作者 lin-dong ma Yu-Dong Li +6 位作者 Lin Wen Jie Feng Xiang Zhang Tian-Hui Wang Yu-Long Cai Zhi-Ming Wang Qi Guo 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第10期352-356,共5页
A pinned photodiode complementary metal–oxide–semiconductor transistor(CMOS) active pixel sensor is exposed to ^60Co to evaluate the performance for space applications. The sample is irradiated with a dose rate of... A pinned photodiode complementary metal–oxide–semiconductor transistor(CMOS) active pixel sensor is exposed to ^60Co to evaluate the performance for space applications. The sample is irradiated with a dose rate of 50 rad(SiO2)/s and a total dose of 100 krad(SiO2), and the photodiode is kept unbiased. The degradation of dark current, full well capacity,and quantum efficiency induced by the total ionizing dose damage effect are investigated. It is found that the dark current increases mainly from the shallow trench isolation(STI) surrounding the pinned photodiode. Further results suggests that the decreasing of full well capacity due to the increase in the density, is induced by the total ionizing dose(TID) effect, of the trap interface, which also leads to the degradation of quantum efficiency at shorter wavelengths. 展开更多
关键词 CMOS active pixel sensor dark current quantum efficiency
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