MoS_(2)targets were irradiated by infra-red(IR)pulsed laser in a high vacuum to determine hot plasma parameters,atomic,molecular and ion emission,and angular and charge state distributions.In this way,pulsed laser dep...MoS_(2)targets were irradiated by infra-red(IR)pulsed laser in a high vacuum to determine hot plasma parameters,atomic,molecular and ion emission,and angular and charge state distributions.In this way,pulsed laser deposition(PLD)of thin films on graphene oxide substrates was also realized.An Nd:YAG laser,operating at the 1064 nm wavelength with a 5 ns pulse duration and up to a 1 J pulse energy,in a single pulse or at a 10 Hz repetition rate,was employed.Ablation yield was measured as a function of the laser fluence.Plasma was characterized using different analysis techniques,such as time-of-flight measurements,quadrupole mass spectrometry and fast CCD visible imaging.The so-produced films were characterized by composition,thickness,roughness,wetting ability,and morphology.When compared to the MoS_(2)targets,they show a slight decrease of S with respect to Mo,due to higher ablation yield,low fusion temperature and high sublimation in vacuum.The pulsed IR laser deposited Mo Sx(with 1<x<2)films are uniform,with a thickness of about 130 nm,a roughness of about 50 nm and a higher wettability than the MoS_(2)targets.Some potential applications of the pulsed IR laser-deposited Mo Sx films are also presented and discussed.展开更多
基金supported by OP RDE,MEYS,Czech Republic under the project CANAM OP(No.CZ.02.1.01/0.0/0.0/16_013/0001812)by the Czech Science Foundation GACR(No.23-06702S)。
文摘MoS_(2)targets were irradiated by infra-red(IR)pulsed laser in a high vacuum to determine hot plasma parameters,atomic,molecular and ion emission,and angular and charge state distributions.In this way,pulsed laser deposition(PLD)of thin films on graphene oxide substrates was also realized.An Nd:YAG laser,operating at the 1064 nm wavelength with a 5 ns pulse duration and up to a 1 J pulse energy,in a single pulse or at a 10 Hz repetition rate,was employed.Ablation yield was measured as a function of the laser fluence.Plasma was characterized using different analysis techniques,such as time-of-flight measurements,quadrupole mass spectrometry and fast CCD visible imaging.The so-produced films were characterized by composition,thickness,roughness,wetting ability,and morphology.When compared to the MoS_(2)targets,they show a slight decrease of S with respect to Mo,due to higher ablation yield,low fusion temperature and high sublimation in vacuum.The pulsed IR laser deposited Mo Sx(with 1<x<2)films are uniform,with a thickness of about 130 nm,a roughness of about 50 nm and a higher wettability than the MoS_(2)targets.Some potential applications of the pulsed IR laser-deposited Mo Sx films are also presented and discussed.
