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N-dopedβ-Ga_(2)O_(3)/Si-dopedβ-Ga_(2)O_(3) linearly-graded p-n junction by a one-step integrated approach
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作者 Chenxing Liu Zhengyuan Wu +6 位作者 Hongchao Zhai jason hoo Shiping Guo Jing Wan Junyong Kang Junhao Chu Zhilai Fang 《Journal of Materials Science & Technology》 2025年第6期196-206,共11页
The p-n junction is the foundation building structure for manufacturing various electronic and optoelec-tronic devices.Ultrawide bandgap semiconductors are expected to overcome the limited power capability of Si-based... The p-n junction is the foundation building structure for manufacturing various electronic and optoelec-tronic devices.Ultrawide bandgap semiconductors are expected to overcome the limited power capability of Si-based electronic device,however,it is very difficult to achieve efficient bipolar doping due to the asymmetric doping effect,thereby impeding the development of p-n homojunction and related bipolar devices,especially for the Ga_(2)O_(3)-based materials and devices.Here,we demonstrate a unique one-step integrated growth of p-type N-doped(201)β-Ga_(2)O_(3)/n-type Si-doped(¯201)β-Ga_(2)O_(3)films by phase tran-sition and in-situ pre-doping of dopants,and fabrication of fullβ-Ga_(2)O_(3)linearly-graded p-n homojunc-tion diode from them.The fullβ-Ga_(2)O_(3)p-n homojunction diode possesses a large built-in potential of 4.52 eV,a high operation electric field>2.90 MV/cm in the reverse-bias regime,good longtime-stable rectifying behaviors with a rectification ratio of 104,and a high-speed switching and good surge robust-ness with a weak minority-carrier charge storage.Our work opens the way to the fabrication of Ga_(2)O_(3)-based p-n homojunction,lays the foundation for fullβ-Ga_(2)O_(3)-based bipolar devices,and paves the way for the novel fabrication of p-n homojunction for wide-bandgap oxides. 展开更多
关键词 β-Ga_(2)O_(3)films in-situ pre-doping Linearly-graded p-n junction Forward and reverse characteristics Built-in potential
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Direct demonstration of carrier distribution and recombination within step-bunched UV-LEDs 被引量:3
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作者 HOUQIANG XU JIEAN JIANG +9 位作者 LI CHEN jason hoo LONG YAN SHIPING GUO CAI SHEN YANPING WEI HUA SHAO ZI-HUI ZHANG WEI GUO JICHUN YE 《Photonics Research》 SCIE EI CAS CSCD 2021年第5期764-771,共8页
AlGaN-based solid state UV emitters have many advantages over conventional UV sources. However, UV-LEDs still suffer from numerous challenges, including low quantum efficiency compared to their blue LED counterparts. ... AlGaN-based solid state UV emitters have many advantages over conventional UV sources. However, UV-LEDs still suffer from numerous challenges, including low quantum efficiency compared to their blue LED counterparts. One of the inherent reasons is a lack of carrier localization effect inside fully miscible AlGaN alloys. In the pursuit of phase separation and carrier localization inside the active region of AlGaN UV-LED, utilization of highly misoriented substrates proves to be useful, yet the carrier distribution and recombination mechanism in such structures has seldom been reported. In this paper, a UV-LED with step-bunched surface morphology was designed and fabricated, and the internal mechanism of high internal quantum efficiency was studied in detail. The correlation between microscale current distribution and surface morphology was provided, directly demonstrating that current prefers to flow through the step edges of the epitaxial layers. Experimental results were further supported by numerical simulation. It was found that efficient radiative recombination centers were formed in the inclined quantum well regions. A schematic three-dimensional energy band structure of the multiple quantum wells(MQWs) across the step was proposed and helps in further understanding the luminescence behavior of LEDs grown on misoriented substrates. Finally, a general principle to achieve carrier localization was proposed, which is valid for most ternary Ⅲ-Ⅴ semiconductors exhibiting phase separation. 展开更多
关键词 distribution mechanism QUANTUM
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高质量的AlGaN外延结构和UVC垂直腔面发射激光器的实现 被引量:2
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作者 郑重明 王玉坤 +6 位作者 胡建正 郭世平 梅洋 龙浩 应磊莹 郑志威 张保平 《Science China Materials》 SCIE EI CAS CSCD 2023年第5期1978-1988,共11页
AlGaN基垂直腔面发射激光器(VCSEL)因其优越的材料性质和器件优点吸引了很多关注.然而,由于材料外延生长和器件制备工艺的局限,AlGaN基VCSEL制备很困难.本工作通过侧向外延生长技术制备了高质量的AlGaN多量子阱(MQWs)结构的外延片,并通... AlGaN基垂直腔面发射激光器(VCSEL)因其优越的材料性质和器件优点吸引了很多关注.然而,由于材料外延生长和器件制备工艺的局限,AlGaN基VCSEL制备很困难.本工作通过侧向外延生长技术制备了高质量的AlGaN多量子阱(MQWs)结构的外延片,并通过X射线衍射(XRD)和光致发光(PL)实验对外延片进行了分析.XRD测量显示,外延片中的AlN模板层几乎是弛豫的,刃位错密度为10^(9)cm^(-2).随后,生长的AlGaN/AlN超晶格(SL)层被用来减少刃位错密度,使得量子阱中的位错密度为10^(8)cm^(-2).根据PL测试结果,MQWs的内量子效率(IQE)为62%,且在室温下的发光以辐射复合为主.通过激光剥离(LLO)和化学机械抛光(CMP)技术,将这些外延片制备成UVC VCSEL.经过这些工艺,MQWs的晶体质量没有受到影响,还在抛光之后的表面观察到了UVC波段的受激辐射.这些AlGaN基UVC VCSEL在275.91,276.28和277.64 nm实现了激射,最小激射阈值为0.79 MW cm^(-2). 展开更多
关键词 ALGAN vertical-cavity surface-emitting lasers epitaxial lateral overgrowth laser lift-off UVC
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Revealing the surface electronic structures of AIGaN deep-ultraviolet multiple quantum wells with lateral polarity domains 被引量:2
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作者 WEI GUO LI CHEN +11 位作者 HOUQIANG XU YINGDA QIAN MOHEB SHEIKHI jason hoo SHIPING GUO LIANG XU JIANZHE LU FERAS ALQATARI XIAOHANG LI KAIYAN HE ZHE CHUAN FENG JICHUN YE 《Photonics Research》 SCIE EI CSCD 2020年第6期812-818,共7页
We report on the carrier dynamic and electronic structure investigations on AlGaN-based deep-ultraviolet multiple quantum wells (MQWs)with lateral polarity domains.The localized potential maximum is predicted near the... We report on the carrier dynamic and electronic structure investigations on AlGaN-based deep-ultraviolet multiple quantum wells (MQWs)with lateral polarity domains.The localized potential maximum is predicted near the domain boundaries by first-principle calculation,suggesting carrier localization and efficient radiative recombination.More importantly,lateral band diagrams of the MQWs are proposed based on electron affinities and valance band levels calculated from ultraviolet(UV)photoelectron spectroscopy.The proposed lateral band diagram is further demonstrated by surface potential distribution collected by Kelvin probe microscopy and the density-of-state calculation of energy bands.This work illustrates that lateral polarity structures are playing essential roles in the electronic properties of II nitride photonic devices and may provide novel perspective in the realization of high-efficiency UV emitters. 展开更多
关键词 ULTRAVIOLET electronic QUANTUM
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Multi-step in situ interface modification method for emission enhancement in semipolar deep-ultraviolet light emitting diodes
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作者 LI CHEN JIE SUN +8 位作者 WEI GUO jason hoo WEI LIN HANGYANG CHEN HOUQIANG XU LONG YAN SHIPING GUO JUNYONG KANG JICHUN YE 《Photonics Research》 SCIE EI CAS CSCD 2022年第12期2778-2785,共8页
SemipolarⅢ-nitrides have attracted increasing attention in applications of optoelectronic devices due to the much reduced polarization field.A high-quality semipolar AlN template is the building block of semipolar Al... SemipolarⅢ-nitrides have attracted increasing attention in applications of optoelectronic devices due to the much reduced polarization field.A high-quality semipolar AlN template is the building block of semipolar AlGaN-based deep-ultraviolet light emitting diodes(DUV LEDs),and thus deserves special attention.In this work,a multi-step in situ interface modification technique is developed for the first time,to our knowledge,to achieve high-quality semipolar AlN templates.The stacking faults were efficiently blocked due to the modification of atomic configurations at the related interfaces.Coherently regrown AlGaN layers were obtained on the in situ treated AlN template,and stacking faults were eliminated in the post-grown AlGaN layers.The strains between AlGaN layers were relaxed through a dislocation glide in the basal plane and misfit dislocations at the heterointerfaces.In contrast,high-temperature ex situ annealing shows great improvement in defect annihilation,yet suffers from severe lattice distortion with strong compressive strain in the AlN template,which is unfavorable to the post-grown AlGaN layers.The strong enhancement of luminous intensity is achieved in in situ treated AlGaN DUV LEDs.The in situ interface modification technique proposed in this work is proven to be an efficient method for the preparation of high-quality semipolar Al N,showing great potential towards the realization of high-efficiency optoelectronic devices. 展开更多
关键词 DIODES polarization INTERFACE
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