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Formation of RF Plasma Transport Channel in External B-Field
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作者 Ping Feng Vitaly Bystritskii +2 位作者 ivan isakov Vasily Matvienko Kurt Walters 《Journal of Energy and Power Engineering》 2012年第5期725-729,共5页
The paper describes experiments on formation of a plasma channel with imbedded B-field for transporting high power ion beam. The plasma was generated with a 5-turn loop inductive antenna driven by an H-bridge type RF ... The paper describes experiments on formation of a plasma channel with imbedded B-field for transporting high power ion beam. The plasma was generated with a 5-turn loop inductive antenna driven by an H-bridge type RF generator. The azimuthal B-field in the channel of 0.5-1.5 kG was formed by a pulsed current from external capacitor bank. Control of the hydrogen gas pressure was provided by an electromagnetic puffvalve. The paper describes experimental devices and results on the generated plasma parameters as function of RF frequency, antenna voltage, pulse duration and puffgas pressure. When operating at-1 kG B-field, ambient gas pressure in the range of few -10 mTorr, and 5 kV antenna voltage at resonant frequency of 150 kHz, the plasma density range was (3-7)×10^12 cm3 with a temperature of a few eV. 展开更多
关键词 PLASMA RF B-field ion beam high power ion beam.
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