As standard concepts for precision positioning within a machine reach their limits with increasing measurement volumes,inverse concepts are a promising approach for addressing this problem.The inverse principle entail...As standard concepts for precision positioning within a machine reach their limits with increasing measurement volumes,inverse concepts are a promising approach for addressing this problem.The inverse principle entails other limitations,as for high-precision positioning of a sensor head within a large measurement volume,three four-beam interferometers are required in order to measure all necessary translations and rotations of the sensor head and reconstruct the topography of the reference system consisting of fixed mirrors in the x-,y-,and z-directions.We present the principle of a passive heterodyne laser interferometer with consequently separated beam paths for the individual heterodyne frequencies.The beam path design is illustrated and described,as well as the design of the signal-processing and evaluation algorithm,which is implemented using a System-On-a-Chip with an integrated FPGA,CPU,and A/D converters.A streamlined bench-top optical assembly was set up and measurements were carried out to investigate the remaining non-linearities.Additionally,reference measurements with a commercial homodyne interferometer were executed.展开更多
This paper describes a standing-wave interferometer with two laser sources of different wavelengths,diametrically opposed and emitting towards each other.The resulting standing wave has an intensity profile which is m...This paper describes a standing-wave interferometer with two laser sources of different wavelengths,diametrically opposed and emitting towards each other.The resulting standing wave has an intensity profile which is moving with a constant velocity,and is directly detected inside the laser beam by two thin and transparent photo sensors.The first sensor is at a fixed position,serving as a phase reference for the second one which is moved along the optical axis,resulting in a frequency shift,proportional to the velocity.The phase difference between both sensors is evaluated for the purpose of interferometric length measurements.展开更多
The field of optical lithography is subject to intense research and has gained enormous improvement.However,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventiona...The field of optical lithography is subject to intense research and has gained enormous improvement.However,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies.This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable:custom design and solutions for specific applications will dominate future development(Fritze in:Panning EM,Liddle JA(eds)Novel patterning technologies.International society for optics and photonics.SPIE,Bellingham,2021.https://doi.org/10.1117/12.2593229).For this reason,new aspects arise for future lithography,which is why enormous effort has been directed to the development of alternative fabrication technologies.Yet,the technologies emerging from this process,which are promising for coping with the current resolution and accuracy challenges,are only demonstrated as a proof-of-concept on a lab scale of several square micrometers.Such scale is not adequate for the requirements of modern lithography;therefore,there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies.Similar challenges arise because of the technical progress in various other fields,realizing new and unique functionalities based on nanoscale effects,e.g.,in nanophotonics,quantum computing,energy harvesting,and life sciences.Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks,which are available at the Technische Universitiit Ilmenau in the form of nanopositioning and nanomeasuring(NPM)machines.With this equipment,the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters.展开更多
The semiconductor industry has been following Moore’s law with astonishing continuation for 55 years now.Manufacturing is advancing from precision manufacturing,micromanufacturing,and nanomanufacturing toward atomic ...The semiconductor industry has been following Moore’s law with astonishing continuation for 55 years now.Manufacturing is advancing from precision manufacturing,micromanufacturing,and nanomanufacturing toward atomic and close-to-atomic scale manufacturing(ACSM),which is the core competence in Manufacturing Ⅲ.展开更多
基金funded by the Deutsche Forschungsgemeinschaft(DFG)under contract 279458870.
文摘As standard concepts for precision positioning within a machine reach their limits with increasing measurement volumes,inverse concepts are a promising approach for addressing this problem.The inverse principle entails other limitations,as for high-precision positioning of a sensor head within a large measurement volume,three four-beam interferometers are required in order to measure all necessary translations and rotations of the sensor head and reconstruct the topography of the reference system consisting of fixed mirrors in the x-,y-,and z-directions.We present the principle of a passive heterodyne laser interferometer with consequently separated beam paths for the individual heterodyne frequencies.The beam path design is illustrated and described,as well as the design of the signal-processing and evaluation algorithm,which is implemented using a System-On-a-Chip with an integrated FPGA,CPU,and A/D converters.A streamlined bench-top optical assembly was set up and measurements were carried out to investigate the remaining non-linearities.Additionally,reference measurements with a commercial homodyne interferometer were executed.
基金funded by the German Federal Ministry of Education and Research under contract 03V0235.
文摘This paper describes a standing-wave interferometer with two laser sources of different wavelengths,diametrically opposed and emitting towards each other.The resulting standing wave has an intensity profile which is moving with a constant velocity,and is directly detected inside the laser beam by two thin and transparent photo sensors.The first sensor is at a fixed position,serving as a phase reference for the second one which is moved along the optical axis,resulting in a frequency shift,proportional to the velocity.The phase difference between both sensors is evaluated for the purpose of interferometric length measurements.
基金supported by the Deutsche Forschungsgemeinschaft(DFG)in the framework of the Research Training Group Tip-and Laser-based 3D-Nanofabrication in extended macroscopic working areas(GRK 2182)at the Technische Universitat Ilmenau,Germany.
文摘The field of optical lithography is subject to intense research and has gained enormous improvement.However,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies.This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable:custom design and solutions for specific applications will dominate future development(Fritze in:Panning EM,Liddle JA(eds)Novel patterning technologies.International society for optics and photonics.SPIE,Bellingham,2021.https://doi.org/10.1117/12.2593229).For this reason,new aspects arise for future lithography,which is why enormous effort has been directed to the development of alternative fabrication technologies.Yet,the technologies emerging from this process,which are promising for coping with the current resolution and accuracy challenges,are only demonstrated as a proof-of-concept on a lab scale of several square micrometers.Such scale is not adequate for the requirements of modern lithography;therefore,there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies.Similar challenges arise because of the technical progress in various other fields,realizing new and unique functionalities based on nanoscale effects,e.g.,in nanophotonics,quantum computing,energy harvesting,and life sciences.Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks,which are available at the Technische Universitiit Ilmenau in the form of nanopositioning and nanomeasuring(NPM)machines.With this equipment,the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters.
文摘The semiconductor industry has been following Moore’s law with astonishing continuation for 55 years now.Manufacturing is advancing from precision manufacturing,micromanufacturing,and nanomanufacturing toward atomic and close-to-atomic scale manufacturing(ACSM),which is the core competence in Manufacturing Ⅲ.
