A discrete model of the Differential Evanescent Light Intensity (DELI) technique was developed to calculate and map 3D nanolayers thicknesses from the evanescent light intensity captured from optical waveguides. The m...A discrete model of the Differential Evanescent Light Intensity (DELI) technique was developed to calculate and map 3D nanolayers thicknesses from the evanescent light intensity captured from optical waveguides. The model was used for ultra-thin Pd nanometric layers sputtered on glass substrates. The layers thickness profiles were displayed in 3D and 1D profiles plots. The total thickness profiles of the ultra-thin Pd films obtained in the range of 1-10 nm were validated using AFM measurements. Based on the model developed the evanescent photon extraction parameter of the material was estimated.展开更多
文摘A discrete model of the Differential Evanescent Light Intensity (DELI) technique was developed to calculate and map 3D nanolayers thicknesses from the evanescent light intensity captured from optical waveguides. The model was used for ultra-thin Pd nanometric layers sputtered on glass substrates. The layers thickness profiles were displayed in 3D and 1D profiles plots. The total thickness profiles of the ultra-thin Pd films obtained in the range of 1-10 nm were validated using AFM measurements. Based on the model developed the evanescent photon extraction parameter of the material was estimated.
