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氧化镓异质衬底集成技术研究进展
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作者 瞿振宇 徐文慧 +9 位作者 江昊东 梁恒硕 赵天成 谢银飞 孙华锐 邹新波 游天桂 齐红基 韩根全 欧欣 《人工晶体学报》 北大核心 2025年第3期470-490,共21页
超宽禁带氧化镓在高功率和射频器件领域显示出巨大发展潜力。然而,氧化镓固有的极低热导率和p型掺杂困难问题限制了其器件性能和结构设计。异质集成是突破单一材料性能极限,变革提升器件性能的关键技术。本文综述了异质外延、机械剥离... 超宽禁带氧化镓在高功率和射频器件领域显示出巨大发展潜力。然而,氧化镓固有的极低热导率和p型掺杂困难问题限制了其器件性能和结构设计。异质集成是突破单一材料性能极限,变革提升器件性能的关键技术。本文综述了异质外延、机械剥离和离子束剥离转移三种氧化镓异质集成技术的最新研究进展,重点对比分析不同集成技术在材料质量、电学和热学特性及器件性能等方面的优缺点,并针对衬底种类、界面成键方式、过渡层厚度对纵向散热和电子输运的影响进行探讨。同时,本文对当前氧化镓异质集成技术所面临的挑战进行分析,并对氧化镓异质集成技术未来的发展趋势进行展望,旨在唤起国内氧化镓异质集成衬底相关研究,推动氧化镓异质集成器件开发,加快推进氧化镓材料和器件产业化应用。 展开更多
关键词 氧化镓 异质衬底集成 异质外延 机械剥离 离子束剥离转移 热管理
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Superjunction 4H-SiC trench-gate IGBT with an integrated clamping PN diode
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作者 Huang Yi Wang Xuecheng +3 位作者 Gao Sheng Liu Bin Zhang Hongsheng han genquan 《The Journal of China Universities of Posts and Telecommunications》 EI CSCD 2024年第2期3-9,27,共8页
In this paper,a novel superjunction 4H-silicon carbide(4H-SiC)trench-gate insulated-gate bipolar transistor(IGBT)featuring an integrated clamping PN diode between the P-shield and emitter(TSD-IGBT)is designed and theo... In this paper,a novel superjunction 4H-silicon carbide(4H-SiC)trench-gate insulated-gate bipolar transistor(IGBT)featuring an integrated clamping PN diode between the P-shield and emitter(TSD-IGBT)is designed and theoretically studied.The heavily doping superjunction layer contributes to a low specific on-resistance,excellent electric field distribution,and quasi-unipolar drift current.The anode of the clamping diode is in floating contact with the P-shield.In the on-state,the potential of the P-shield is raised to the turn-on voltage of the clamping diode,which prevents the hole extraction below the N-type carrier storage layer(NCSL).Additionally,during the turn-off transient,once the clamping diode is turned on,it also promotes an additional hole extraction path.Furthermore,the potential dropped at the semiconductor near the trench-gate oxide is effectively reduced in the off-state. 展开更多
关键词 4H-silicon carbide(4H-SiC) trench-gate SUPERJUNCTION clamping diode
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Trench gate GaN IGBT with controlled hole injection efficiency
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作者 Huang Yi Li Yueyue +3 位作者 Gao Sheng Wang Qi Liu Bin han genquan 《The Journal of China Universities of Posts and Telecommunications》 EI CSCD 2024年第2期10-16,共7页
In this paper,a novel trench gate gallium nitride(GaN)insulated gate bipolar transistor(GaN IGBT),in which the collector is divided into multiple regions to control the hole injection efficiency,is designed and theore... In this paper,a novel trench gate gallium nitride(GaN)insulated gate bipolar transistor(GaN IGBT),in which the collector is divided into multiple regions to control the hole injection efficiency,is designed and theoretically studied.The incorporation of a P+/P-multi-region alternating structure in the collector region mitigates hole injection within the collector region.When the device is in forward conduction,the conductivity modulation effect results in a reduced storage of carriers in the drift region.As a result,the number of carriers requiring extraction during device turn-off is minimized,leading to a faster turn-off speed.The results illustrate that the GaN IGBT with controlled hole injection efficiency(CEH GaN IGBT)exhibits markedly enhanced performance compared to conventional GaN IGBT,showing a remarkable 42.2%reduction in turn-off time and a notable 28.5%decrease in turn-off loss. 展开更多
关键词 gallium nitride insulated gate bipolar transistor(GaN IGBT) hole injection trench gate turn-off loss
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