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Tailoring the properties of optical metamaterials
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作者 Christian Helgert Thomas Pertsch +8 位作者 Carsten Rockstuhl Ekaterina Pshenay-Severin Christoph Menzel Ernst-Bernhard Kley Arkadi Chipouline Christoph Etrich Uwe Huebner Andreas Tuennermann falk lederer 《中国光学与应用光学》 2010年第1期1-10,共10页
In this contribution we review our latest achievements of combined experimental and theoretical studies to tailor the properties of optical metamaterials(MMs)at will.We give three examples of metamaterial designs that... In this contribution we review our latest achievements of combined experimental and theoretical studies to tailor the properties of optical metamaterials(MMs)at will.We give three examples of metamaterial designs that have been realized by means of electron-beam lithography and whose spectroscopic characteristics have been comprehensively investigated.In every case,our experiments are complemented by rigorous numerical simulations.Particular emphasis is put on the significance of such tailored effective properties of optical MMs. 展开更多
关键词 optical metamaterials lithography negative-index
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