A new all permanent ECR (Electron Cyclotron Resonance) ion source LAPECR2 (Lanzhou All Permanent ECRIS No. 2) is now under developing in IMP. This source will be used to set up on thc IMP 400 HV (High Voltage) platfor...A new all permanent ECR (Electron Cyclotron Resonance) ion source LAPECR2 (Lanzhou All Permanent ECRIS No. 2) is now under developing in IMP. This source will be used to set up on thc IMP 400 HV (High Voltage) platform. This HV platform aims to deliver high ion beams from low charge state to very high charge state, so the rigorous requirement to this ECRIS is obvious. To satisfy this requirement, the ion source is designed to be a very large one, which has very large volumc plasma chamber, larger ECR length and mirror length, and very strong 3 -dimension magnetic field. The detail parameters, are shown in Table 1 listed below.展开更多
The design of each component of the Multipurpose Superconducting ECR Ion Source(MS-ECRIS) has been completed and some items are ready.The magnets and the cryostat are under construction at ACCEL and the commissioning ...The design of each component of the Multipurpose Superconducting ECR Ion Source(MS-ECRIS) has been completed and some items are ready.The magnets and the cryostat are under construction at ACCEL and the commissioning is scheduled for March 2007.The mechanical have been optimized and their construction is under way;the microwave system is under refurbishment and the 65kV power supply is available and upgraded for afterglow operations.Pumping and extraction system were adapted to the EIS testbench of GSI Darmstadt.The description of each part will be given in the paper along with a schedule of the forthcoming development and experiments.展开更多
The GTS-LHC ion source,designed and build by CEA Grenoble,was installed and commissioned at CERN in 2005.Since than the source has delivered oxygen and lead ion beams(O^(4+) and Pb^(27+) from the source,Pb^(54+) from ...The GTS-LHC ion source,designed and build by CEA Grenoble,was installed and commissioned at CERN in 2005.Since than the source has delivered oxygen and lead ion beams(O^(4+) and Pb^(27+) from the source,Pb^(54+) from the linac)for the commissioning of the Low Energy Ion Ring(LEIR).Results of this operation and attempts to improve the source performance and reliability,and the linac performance will be presented in this paper.展开更多
As they are first optimized for their ion losses,ECRISs are always under a fundamental compromise: having high losses and strong confinement at the same time.To help ECR ion source developers in the design or improvem...As they are first optimized for their ion losses,ECRISs are always under a fundamental compromise: having high losses and strong confinement at the same time.To help ECR ion source developers in the design or improvement of existing machines,general comments are presented in a review article being soon published. In this 160 pages contribution,fundamental aspects of ECRISs are presented,with a discussion of electron temperature and confinement and ion confinement.Then,as microwaves play a key role in these machines, a chapter presents major guidelines for microwave launching and coupling to ECR plasma.Moreover,once ECR plasma is created,understanding this plasma is important in ion sourcery;and a section is dedicated to plasma diagnostics with an emphasis on the determination of electron and ion density and temperature by vacuum ultraviolet(VUV)spectroscopy.Another chapter deals with the role of magnetic confinement and presents updated scaling laws.Next chapter presents different types of ECRISs designed according to the main parameters previously described.Finally,some industrial applications of ECRISs and ECR plasmas in general are presented like ion implantation and photon lithography.Some hints taken from this review article are presented in the following article.展开更多
文摘A new all permanent ECR (Electron Cyclotron Resonance) ion source LAPECR2 (Lanzhou All Permanent ECRIS No. 2) is now under developing in IMP. This source will be used to set up on thc IMP 400 HV (High Voltage) platform. This HV platform aims to deliver high ion beams from low charge state to very high charge state, so the rigorous requirement to this ECRIS is obvious. To satisfy this requirement, the ion source is designed to be a very large one, which has very large volumc plasma chamber, larger ECR length and mirror length, and very strong 3 -dimension magnetic field. The detail parameters, are shown in Table 1 listed below.
基金Supported through EURONS (European Commission Contract no.506065)
文摘The design of each component of the Multipurpose Superconducting ECR Ion Source(MS-ECRIS) has been completed and some items are ready.The magnets and the cryostat are under construction at ACCEL and the commissioning is scheduled for March 2007.The mechanical have been optimized and their construction is under way;the microwave system is under refurbishment and the 65kV power supply is available and upgraded for afterglow operations.Pumping and extraction system were adapted to the EIS testbench of GSI Darmstadt.The description of each part will be given in the paper along with a schedule of the forthcoming development and experiments.
文摘The GTS-LHC ion source,designed and build by CEA Grenoble,was installed and commissioned at CERN in 2005.Since than the source has delivered oxygen and lead ion beams(O^(4+) and Pb^(27+) from the source,Pb^(54+) from the linac)for the commissioning of the Low Energy Ion Ring(LEIR).Results of this operation and attempts to improve the source performance and reliability,and the linac performance will be presented in this paper.
文摘As they are first optimized for their ion losses,ECRISs are always under a fundamental compromise: having high losses and strong confinement at the same time.To help ECR ion source developers in the design or improvement of existing machines,general comments are presented in a review article being soon published. In this 160 pages contribution,fundamental aspects of ECRISs are presented,with a discussion of electron temperature and confinement and ion confinement.Then,as microwaves play a key role in these machines, a chapter presents major guidelines for microwave launching and coupling to ECR plasma.Moreover,once ECR plasma is created,understanding this plasma is important in ion sourcery;and a section is dedicated to plasma diagnostics with an emphasis on the determination of electron and ion density and temperature by vacuum ultraviolet(VUV)spectroscopy.Another chapter deals with the role of magnetic confinement and presents updated scaling laws.Next chapter presents different types of ECRISs designed according to the main parameters previously described.Finally,some industrial applications of ECRISs and ECR plasmas in general are presented like ion implantation and photon lithography.Some hints taken from this review article are presented in the following article.
