Indium-tin-oxide(ITO)films with different sputtering time have been prepared by dc magnetron sputtering method on PET substrate at room temperature.The film structure,thickness,electrical and optical properties are in...Indium-tin-oxide(ITO)films with different sputtering time have been prepared by dc magnetron sputtering method on PET substrate at room temperature.The film structure,thickness,electrical and optical properties are investigated through XRD,SEM,van der Pauw method and FTIR,respectively.The XRD results indicate that all the films are amorphous structure.With the increase of sputtering time,resistivity and transmittance decrease simultaneously.However the absorption gets stronger,especially in near-infrared light region.Through Drude model the plasma frequency is calculated and the calculation result is pretty consistent with films deposited at 60 and 90 min.展开更多
基金National Natural Science Foundations of China(51071038)Program for New Century Excellent Talents in University(NCET-09-0265)+1 种基金SichuanProvince Science Foundation for Youths(2010JQ0002)State Key Laboratory for Mechanical Behavior of Materials(201011005)
文摘Indium-tin-oxide(ITO)films with different sputtering time have been prepared by dc magnetron sputtering method on PET substrate at room temperature.The film structure,thickness,electrical and optical properties are investigated through XRD,SEM,van der Pauw method and FTIR,respectively.The XRD results indicate that all the films are amorphous structure.With the increase of sputtering time,resistivity and transmittance decrease simultaneously.However the absorption gets stronger,especially in near-infrared light region.Through Drude model the plasma frequency is calculated and the calculation result is pretty consistent with films deposited at 60 and 90 min.
