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Phase Homogeneity and Crystal Structure of Sb_(88)Te_(12) Synthesized by Melt-quench Method
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作者 c.rangasami 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2013年第4期441-446,共6页
Phase homogeneity and crystal structure of SbsaTe12 alloy synthesized by melt-quench method have been analyzed using X-ray diffraction (XRD) and Raman spectroscopy. Rietveld refinement of crystal structure of Sb8sTe... Phase homogeneity and crystal structure of SbsaTe12 alloy synthesized by melt-quench method have been analyzed using X-ray diffraction (XRD) and Raman spectroscopy. Rietveld refinement of crystal structure of Sb8sTe12 has revealed the formation of SbsTe3 and Sb phases respectively with 11R and A7 structures (space group is R3m). Phase fractions of the phases SbsTe3 and Sb have been determined to be 44.44% and 55.56% respectively. Raman spectrum of SbssTe12 has showed a highest intensity peak at 156 cm-1 and another peak at 151.1 cm-1, which correspond to Alg modes of SbsTe3 and element Sb, respectively. Analysis of Raman spectrum has substantiated the results obtained from structure refinement regarding the presence of two different phases. 展开更多
关键词 SbssTe12 alloy Melt-quench method XRD Rietveld refinement Raman spectroscopy Multiphase formation
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Influence of Sputtering Power on the Structure and Electrical Properties of Bi_2Fe_4O_9 Thin Films
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作者 M.Santhiya K.S.Pugazhvadivu +1 位作者 K.Tamilarasan c.rangasami 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2017年第7期650-658,共9页
Bismuth ferrite(Bi_2Fe_4O_9) thin films were grown on p-type Si(100) substrate by radio-frequency magnetron sputtering at 873 K. X-ray diffraction, field emission scanning electron microscopy and Raman spectroscop... Bismuth ferrite(Bi_2Fe_4O_9) thin films were grown on p-type Si(100) substrate by radio-frequency magnetron sputtering at 873 K. X-ray diffraction, field emission scanning electron microscopy and Raman spectroscopy studies revealed that the grown films have single-phase polycrystalline nature and are crystallized in orthorhombic structure. The grain size of the grown thin films was found to increase(56–130 nm) with sputtering power. Atomic force microscopy images clearly illustrated that the grown thin films have smooth surface. Energy-dispersive X-ray analysis revealed the presence of Bi, Fe and O elements with desired ratio and also the absence of impurities in the grown films. Analysis of ferroelectric hysteresis loops revealed that the remanent polarization and coercive field increase with the increase in sputtering power. Vicker's hardness analysis showed that the hardness of films strongly depends on the grain size and film thickness, which are mainly determined by the sputtering power. The above observations revealed that Bi_2Fe_4O_9 thin film deposited at higher sputtering power has good crystallinity and shows better electrical properties. 展开更多
关键词 Bi_2Fe_4O_9 Thin films Ferroelectric Sputtering X-ray diffraction Hardness
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